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Class Information
Number: 156/345.29
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter)
Description: Apparatus including a structurally defined means located outside an etching chamber for the supply or removal of an etchant gas to the chamber.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8679253 Deposition apparatus and method for depositing film Mar. 25, 2014
8679287 Method and apparatus for preventing ALD reactants from damaging vacuum pumps Mar. 25, 2014
8671965 Methods for enhanced fluid delivery on bevel etch applications Mar. 18, 2014
8657958 CVD-Siemens monosilane reactor process with complete utilization of feed gases and total recycle Feb. 25, 2014
8652258 Substrate treatment device Feb. 18, 2014
8623141 Piping system and control for semiconductor processing Jan. 7, 2014
8608851 Plasma confinement apparatus, and method for confining a plasma Dec. 17, 2013
8591699 Method and system for supplying a cleaning gas into a process chamber Nov. 26, 2013
8590484 Semiconductor device manufacturing method and substrate processing apparatus Nov. 26, 2013
8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith Nov. 12, 2013
8573154 Plasma film forming apparatus Nov. 5, 2013
8518181 Film forming apparatus and film forming method Aug. 27, 2013
8519724 Electrode for use in measuring dielectric properties of parts Aug. 27, 2013
8506713 Film deposition apparatus and film deposition method Aug. 13, 2013
8506710 Apparatus for fabricating semiconductor device Aug. 13, 2013
8506714 Substrate processing system Aug. 13, 2013
8480847 Processing system Jul. 9, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8475622 Method of reusing a consumable part for use in a plasma processing apparatus Jul. 2, 2013
8465593 Substrate processing apparatus and gas supply method Jun. 18, 2013
8460466 Exhaust for CVD reactor Jun. 11, 2013
8459291 Source gas concentration control system Jun. 11, 2013
8459290 Material gas concentration control system Jun. 11, 2013
8444766 System and method for recycling a gas used to deposit a semiconductor layer May. 21, 2013
8440048 Load lock having secondary isolation chamber May. 14, 2013
8402845 Dual path gas distribution device Mar. 26, 2013
8397668 Plasma processing apparatus Mar. 19, 2013
8398770 Deposition system for thin film formation Mar. 19, 2013
8387559 Semiconductor manufacturing plant Mar. 5, 2013
8382939 Plasma processing chamber with enhanced gas delivery Feb. 26, 2013
8377253 Pulsed etching cooling Feb. 19, 2013
8367566 Method for manufacturing semiconductor device and method for processing substrate Feb. 5, 2013
8361274 Etching apparatus and etching method Jan. 29, 2013
8343277 Substrate processing apparatus Jan. 1, 2013
8337619 Polymeric coating of substrate processing system components for contamination control Dec. 25, 2012
8328980 Apparatus and methods for enhanced fluid delivery on bevel etch applications Dec. 11, 2012
8317921 In situ growth of oxide and silicon layers Nov. 27, 2012
8308962 Etching processes used in MEMS production Nov. 13, 2012
8293013 Dual path gas distribution device Oct. 23, 2012
8277888 Dual path gas distribution device Oct. 2, 2012
8277560 CVD apparatus and method of cleaning the CVD apparatus Oct. 2, 2012
8267042 Plasma processing apparatus and plasma processing method Sep. 18, 2012
8262798 Shower head, device and method for manufacturing thin films Sep. 11, 2012
8257497 Insitu post atomic layer deposition destruction of active species Sep. 4, 2012
8252116 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems Aug. 28, 2012
8236105 Apparatus for controlling gas flow in a semiconductor substrate processing chamber Aug. 7, 2012
8235001 Substrate processing apparatus and method for manufacturing semiconductor device Aug. 7, 2012
8221579 Method of reusing a consumable part for use in a plasma processing apparatus Jul. 17, 2012
8216376 Method and apparatus for variable conductance Jul. 10, 2012
8202393 Alternate gas delivery and evacuation system for plasma processing apparatuses Jun. 19, 2012

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