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Class Information
Number: 156/345.29
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter)
Description: Apparatus including a structurally defined means located outside an etching chamber for the supply or removal of an etchant gas to the chamber.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7628931 |
Processing method for conservation of processing gases |
Dec. 8, 2009 |
| 7628863 |
Heated gas box for PECVD applications |
Dec. 8, 2009 |
| 7612348 |
Transverse magnetic field voltage isolator |
Nov. 3, 2009 |
| 7601225 |
System for controlling the sublimation of reactants |
Oct. 13, 2009 |
| 7591907 |
Apparatus for hybrid chemical processing |
Sep. 22, 2009 |
| 7552521 |
Method and apparatus for improved baffle plate |
Jun. 30, 2009 |
| 7537673 |
Plasma processing apparatus |
May. 26, 2009 |
| 7531061 |
Gas temperature control for a plasma process |
May. 12, 2009 |
| 7522974 |
Interface for operating and monitoring abatement systems |
Apr. 21, 2009 |
| 7517429 |
Plasma treatment apparatus |
Apr. 14, 2009 |
| 7504643 |
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
Mar. 17, 2009 |
| 7495239 |
Method for cleaning a lithographic apparatus module, a cleaning arrangement and a lithographic apparatus comprising the cleaning arrangement |
Feb. 24, 2009 |
| 7494560 |
Non-plasma reaction apparatus and method |
Feb. 24, 2009 |
| 7491291 |
Apparatus for trapping residual products in semiconductor device fabrication equipment |
Feb. 17, 2009 |
| 7491292 |
Apparatus for catching byproducts in semiconductor device fabrication equipment |
Feb. 17, 2009 |
| 7481902 |
Substrate processing apparatus and method, high speed rotary valve and cleaning method |
Jan. 27, 2009 |
| 7468494 |
Reaction enhancing gas feed for injecting gas into a plasma chamber |
Dec. 23, 2008 |
| 7431773 |
Atomic layer deposition apparatus and method |
Oct. 7, 2008 |
| 7402210 |
Apparatus and method for hybrid chemical processing |
Jul. 22, 2008 |
| 7383841 |
Method of cleaning substrate-processing device and substrate-processing device |
Jun. 10, 2008 |
| 7374620 |
Substrate processing apparatus |
May. 20, 2008 |
| 7371332 |
Uniform etch system |
May. 13, 2008 |
| 7351291 |
Semiconductor processing system |
Apr. 1, 2008 |
| 7332038 |
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
Feb. 19, 2008 |
| 7300558 |
Rapid cycle time gas burster |
Nov. 27, 2007 |
| 7296532 |
Bypass gas feed system and method to improve reactant gas flow and film deposition |
Nov. 20, 2007 |
| 7294207 |
Gas-admission element for CVD processes, and device |
Nov. 13, 2007 |
| 7282112 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Oct. 16, 2007 |
| 7276122 |
Multi-workpiece processing chamber |
Oct. 2, 2007 |
| 7262409 |
Chemical etch solution and technique for imaging a device's shallow junction profile |
Aug. 28, 2007 |
| 7255773 |
Plasma processing apparatus and evacuation ring |
Aug. 14, 2007 |
| 7252716 |
Gas injection apparatus for semiconductor processing system |
Aug. 7, 2007 |
| 7244335 |
Substrate processing system and substrate processing method |
Jul. 17, 2007 |
| 7225820 |
High-pressure processing chamber for a semiconductor wafer |
Jun. 5, 2007 |
| 7204886 |
Apparatus and method for hybrid chemical processing |
Apr. 17, 2007 |
| 7192487 |
Semiconductor substrate processing chamber and accessory attachment interfacial structure |
Mar. 20, 2007 |
| 7175713 |
Apparatus for cyclical deposition of thin films |
Feb. 13, 2007 |
| 7169231 |
Gas distribution system with tuning gas |
Jan. 30, 2007 |
| 7169253 |
Process sequence for photoresist stripping and/or cleaning of photomasks for integrated circuit manufacturing |
Jan. 30, 2007 |
| 7166165 |
Barrier coating for vitreous materials |
Jan. 23, 2007 |
| 7156921 |
Method and apparatus for chemical vapor deposition capable of preventing contamination and enhancing film growth rate |
Jan. 2, 2007 |
| 7156922 |
Multi-chamber installation for treating objects under vacuum, method for evacuating said installation and evacuation system therefor |
Jan. 2, 2007 |
| 7087119 |
Atomic layer deposition with point of use generated reactive gas species |
Aug. 8, 2006 |
| 7070657 |
Method and apparatus for depositing antireflective coating |
Jul. 4, 2006 |
| 7045465 |
Particle-removing method for a semiconductor device manufacturing apparatus |
May. 16, 2006 |
| 7037376 |
Backflush chamber clean |
May. 2, 2006 |
| 7025855 |
Insulation-film etching system |
Apr. 11, 2006 |
| RE39020 |
Plasma process apparatus |
Mar. 21, 2006 |
| 6991701 |
Plasma treatment method and apparatus |
Jan. 31, 2006 |
| 6984267 |
Manufacture system for semiconductor device with thin gate insulating film |
Jan. 10, 2006 |
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