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Class Information
Number: 156/345.29
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter)
Description: Apparatus including a structurally defined means located outside an etching chamber for the supply or removal of an etchant gas to the chamber.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 8679253 |
Deposition apparatus and method for depositing film |
Mar. 25, 2014 |
| 8679287 |
Method and apparatus for preventing ALD reactants from damaging vacuum pumps |
Mar. 25, 2014 |
| 8671965 |
Methods for enhanced fluid delivery on bevel etch applications |
Mar. 18, 2014 |
| 8657958 |
CVD-Siemens monosilane reactor process with complete utilization of feed gases and total recycle |
Feb. 25, 2014 |
| 8652258 |
Substrate treatment device |
Feb. 18, 2014 |
| 8623141 |
Piping system and control for semiconductor processing |
Jan. 7, 2014 |
| 8608851 |
Plasma confinement apparatus, and method for confining a plasma |
Dec. 17, 2013 |
| 8591699 |
Method and system for supplying a cleaning gas into a process chamber |
Nov. 26, 2013 |
| 8590484 |
Semiconductor device manufacturing method and substrate processing apparatus |
Nov. 26, 2013 |
| 8580076 |
Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith |
Nov. 12, 2013 |
| 8573154 |
Plasma film forming apparatus |
Nov. 5, 2013 |
| 8518181 |
Film forming apparatus and film forming method |
Aug. 27, 2013 |
| 8519724 |
Electrode for use in measuring dielectric properties of parts |
Aug. 27, 2013 |
| 8506713 |
Film deposition apparatus and film deposition method |
Aug. 13, 2013 |
| 8506710 |
Apparatus for fabricating semiconductor device |
Aug. 13, 2013 |
| 8506714 |
Substrate processing system |
Aug. 13, 2013 |
| 8480847 |
Processing system |
Jul. 9, 2013 |
| 8481434 |
Method of manufacturing a semiconductor device and processing apparatus |
Jul. 9, 2013 |
| 8475622 |
Method of reusing a consumable part for use in a plasma processing apparatus |
Jul. 2, 2013 |
| 8465593 |
Substrate processing apparatus and gas supply method |
Jun. 18, 2013 |
| 8460466 |
Exhaust for CVD reactor |
Jun. 11, 2013 |
| 8459291 |
Source gas concentration control system |
Jun. 11, 2013 |
| 8459290 |
Material gas concentration control system |
Jun. 11, 2013 |
| 8444766 |
System and method for recycling a gas used to deposit a semiconductor layer |
May. 21, 2013 |
| 8440048 |
Load lock having secondary isolation chamber |
May. 14, 2013 |
| 8402845 |
Dual path gas distribution device |
Mar. 26, 2013 |
| 8397668 |
Plasma processing apparatus |
Mar. 19, 2013 |
| 8398770 |
Deposition system for thin film formation |
Mar. 19, 2013 |
| 8387559 |
Semiconductor manufacturing plant |
Mar. 5, 2013 |
| 8382939 |
Plasma processing chamber with enhanced gas delivery |
Feb. 26, 2013 |
| 8377253 |
Pulsed etching cooling |
Feb. 19, 2013 |
| 8367566 |
Method for manufacturing semiconductor device and method for processing substrate |
Feb. 5, 2013 |
| 8361274 |
Etching apparatus and etching method |
Jan. 29, 2013 |
| 8343277 |
Substrate processing apparatus |
Jan. 1, 2013 |
| 8337619 |
Polymeric coating of substrate processing system components for contamination control |
Dec. 25, 2012 |
| 8328980 |
Apparatus and methods for enhanced fluid delivery on bevel etch applications |
Dec. 11, 2012 |
| 8317921 |
In situ growth of oxide and silicon layers |
Nov. 27, 2012 |
| 8308962 |
Etching processes used in MEMS production |
Nov. 13, 2012 |
| 8293013 |
Dual path gas distribution device |
Oct. 23, 2012 |
| 8277888 |
Dual path gas distribution device |
Oct. 2, 2012 |
| 8277560 |
CVD apparatus and method of cleaning the CVD apparatus |
Oct. 2, 2012 |
| 8267042 |
Plasma processing apparatus and plasma processing method |
Sep. 18, 2012 |
| 8262798 |
Shower head, device and method for manufacturing thin films |
Sep. 11, 2012 |
| 8257497 |
Insitu post atomic layer deposition destruction of active species |
Sep. 4, 2012 |
| 8252116 |
Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems |
Aug. 28, 2012 |
| 8236105 |
Apparatus for controlling gas flow in a semiconductor substrate processing chamber |
Aug. 7, 2012 |
| 8235001 |
Substrate processing apparatus and method for manufacturing semiconductor device |
Aug. 7, 2012 |
| 8221579 |
Method of reusing a consumable part for use in a plasma processing apparatus |
Jul. 17, 2012 |
| 8216376 |
Method and apparatus for variable conductance |
Jul. 10, 2012 |
| 8202393 |
Alternate gas delivery and evacuation system for plasma processing apparatuses |
Jun. 19, 2012 |
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