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Class Information
Number: 156/345.28
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With measuring, sensing, detection or process control means > For detection or control of electrical parameter (e.g., current, voltage, resistance, power, etc.)
Description: Apparatus wherein the means is for measuring, sensing, detecting, or controlling an electrical parameter within the apparatus or within some portion thereof.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8704607 Pulse modulated RF power control method and pulse modulated RF power supply device Apr. 22, 2014
8689733 Plasma processor Apr. 8, 2014
8686711 High-frequency measuring device and high-frequency measuring device calibration method Apr. 1, 2014
8668836 Plasma processing device and method of monitoring plasma discharge state in plasma processing device Mar. 11, 2014
8585862 Plasma processing device and plasma discharge state monitoring device Nov. 19, 2013
8581597 Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events Nov. 12, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8506753 Capacitive coupling plasma processing apparatus and method for using the same Aug. 13, 2013
8480913 Plasma processing method and apparatus with control of plasma excitation power Jul. 9, 2013
8475673 Method and apparatus for high aspect ratio dielectric etch Jul. 2, 2013
8460508 Synchronous pulse plasma etching equipment and method of fabricating a semiconductor device Jun. 11, 2013
8440050 Plasma processing apparatus and method, and storage medium May. 14, 2013
8431035 Plasma processing apparatus and method Apr. 30, 2013
8426317 Plasma processing apparatus and plasma processing method Apr. 23, 2013
8419892 Plasma process detecting sensor Apr. 16, 2013
8409398 Control of ion angular distribution function at wafer surface Apr. 2, 2013
8394229 Susceptor ring Mar. 12, 2013
8394230 Plasma processing apparatus Mar. 12, 2013
8366833 Plasma processing apparatus and plasma processing method Feb. 5, 2013
8366870 Method and apparatus for plasma processing Feb. 5, 2013
8357263 Apparatus and methods for electrical measurements in a plasma etcher Jan. 22, 2013
8357264 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator Jan. 22, 2013
8343306 Plasma processing apparatus and method of plasma distribution correction Jan. 1, 2013
8337661 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator Dec. 25, 2012
8334700 Arc detection Dec. 18, 2012
8303763 Measuring and controlling wafer potential in pulsed RF bias processing Nov. 6, 2012
8297224 Substrate processing apparatus Oct. 30, 2012
8287689 Plasma processing apparatus and feeder rod used therein Oct. 16, 2012
8289029 Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events Oct. 16, 2012
8282767 Plasma processing apparatus Oct. 9, 2012
8277603 Move mechanism for moving target object and charged particle beam writing apparatus Oct. 2, 2012
8262847 Plasma-enhanced substrate processing method and apparatus Sep. 11, 2012
8264237 Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events Sep. 11, 2012
8251011 Plasma processing apparatus Aug. 28, 2012
8241457 Plasma processing system, plasma measurement system, plasma measurement method, and plasma control system Aug. 14, 2012
8222161 Substrate processing apparatus and semiconductor devices manufacturing method Jul. 17, 2012
8192576 Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing Jun. 5, 2012
8186300 Plasma processing apparatus May. 29, 2012
8114245 Plasma etching device Feb. 14, 2012
8092638 Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution Jan. 10, 2012
8073646 Plasma processing apparatus, radio frequency generator and correction method therefor Dec. 6, 2011
8038833 Plasma processing apparatus Oct. 18, 2011
8033246 Arc suppression Oct. 11, 2011
8018164 Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources Sep. 13, 2011
8012305 Exhaust assembly for a plasma processing system Sep. 6, 2011
8007641 Method of detecting arc discharges in a plasma process Aug. 30, 2011
8002945 Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator Aug. 23, 2011
7993487 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma Aug. 9, 2011
7967944 Method of plasma load impedance tuning by modulation of an unmatched low power RF generator Jun. 28, 2011
7955986 Capacitively coupled plasma reactor with magnetic plasma control Jun. 7, 2011

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