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Class Information
Number: 156/345.26
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With measuring, sensing, detection or process control means > For detection or control of pressure or flow of etchant gas
Description: Apparatus wherein the means is for measuring, sensing, detecting, or controlling pressure or flow rate of an etchant gas.










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8668805 Line end shortening reduction during etch Mar. 11, 2014
8651135 Mass flow controller, mass flow controller system, substrate processing device, and gas flow rate adjusting method Feb. 18, 2014
8652258 Substrate treatment device Feb. 18, 2014
8627783 Combined wafer area pressure control and plasma confinement assembly Jan. 14, 2014
8617347 Vacuum processing chambers incorporating a moveable flow equalizer Dec. 31, 2013
8601976 Gas supply system for semiconductor manufacturing facilities Dec. 10, 2013
8590484 Semiconductor device manufacturing method and substrate processing apparatus Nov. 26, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8545711 Processing method Oct. 1, 2013
8545669 Sensor array for measuring plasma characteristics in plasma processing environments Oct. 1, 2013
8529728 System and method for critical dimension reduction and pitch reduction Sep. 10, 2013
8505478 Apparatus for high-efficiency synthesis of carbon nanostructure Aug. 13, 2013
8500951 Low-K damage avoidance during bevel etch processing Aug. 6, 2013
8491750 Adjustable confinement ring assembly Jul. 23, 2013
8480912 Plasma processing apparatus and plasma processing method Jul. 9, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8465593 Substrate processing apparatus and gas supply method Jun. 18, 2013
8461062 Substrate processing apparatus and method for manufacturing semiconductor device Jun. 11, 2013
8459202 Substrate processing apparatus Jun. 11, 2013
8440019 Lower liner with integrated flow equalizer and improved conductance May. 14, 2013
8420168 Delivery device for deposition Apr. 16, 2013
8402845 Dual path gas distribution device Mar. 26, 2013
8397667 Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters Mar. 19, 2013
8366828 Shower head and substrate processing apparatus Feb. 5, 2013
8367566 Method for manufacturing semiconductor device and method for processing substrate Feb. 5, 2013
8366868 Substrate processing apparatus Feb. 5, 2013
8366869 Processing apparatus and processing method Feb. 5, 2013
8317921 In situ growth of oxide and silicon layers Nov. 27, 2012
8303763 Measuring and controlling wafer potential in pulsed RF bias processing Nov. 6, 2012
8293013 Dual path gas distribution device Oct. 23, 2012
8282736 Lower liner with integrated flow equalizer and improved conductance Oct. 9, 2012
8277888 Dual path gas distribution device Oct. 2, 2012
8262798 Shower head, device and method for manufacturing thin films Sep. 11, 2012
8257546 Method and system for monitoring an etch process Sep. 4, 2012
8252116 Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems Aug. 28, 2012
8235001 Substrate processing apparatus and method for manufacturing semiconductor device Aug. 7, 2012
8236380 Gas supply system, substrate processing apparatus and gas supply method Aug. 7, 2012
8236106 Shower head and substrate processing apparatus Aug. 7, 2012
8211802 Substrate processing apparatus Jul. 3, 2012
8211231 Delivery device for deposition Jul. 3, 2012
8202393 Alternate gas delivery and evacuation system for plasma processing apparatuses Jun. 19, 2012
8192576 Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing Jun. 5, 2012
8187412 Apparatus for providing device with gaps for capacitance reduction May. 29, 2012
8173451 Etch stage measurement system May. 8, 2012
8172980 Device with self aligned gaps for capacitance reduction May. 8, 2012
8152925 Baffle plate and substrate processing apparatus Apr. 10, 2012
8142567 Vacuum processing apparatus Mar. 27, 2012
8123860 Apparatus for cyclical depositing of thin films Feb. 28, 2012
8118938 Lower liner with integrated flow equalizer and improved conductance Feb. 21, 2012
8088248 Gas switching section including valves having different flow coefficients for gas distribution system Jan. 3, 2012

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