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Class Information
Number: 156/345.25
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > With measuring, sensing, detection or process control means > For endpoint detection
Description: Apparatus wherein the means is for detecting when a desired end of the etching has been reached.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8685265 Manufacturing method of semiconductor device and semiconductor manufacturing apparatus Apr. 1, 2014
8591698 Peak-based endpointing for chemical mechanical polishing Nov. 26, 2013
8580076 Plasma apparatus, gas distribution assembly for a plasma apparatus and processes therewith Nov. 12, 2013
8580077 Plasma processing apparatus for performing accurate end point detection Nov. 12, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8545669 Sensor array for measuring plasma characteristics in plasma processing environments Oct. 1, 2013
8518209 Apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing system Aug. 27, 2013
8467895 Processing system and method for operating the same Jun. 18, 2013
8377253 Pulsed etching cooling Feb. 19, 2013
8343305 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment Jan. 1, 2013
8343306 Plasma processing apparatus and method of plasma distribution correction Jan. 1, 2013
8303763 Measuring and controlling wafer potential in pulsed RF bias processing Nov. 6, 2012
8287689 Plasma processing apparatus and feeder rod used therein Oct. 16, 2012
8277670 Plasma process with photoresist mask pretreatment Oct. 2, 2012
8257546 Method and system for monitoring an etch process Sep. 4, 2012
8197634 Plasma processing apparatus Jun. 12, 2012
8192576 Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing Jun. 5, 2012
8173451 Etch stage measurement system May. 8, 2012
8088247 Plasma processing apparatus Jan. 3, 2012
8083888 Plasma processing apparatus Dec. 27, 2011
8083889 Apparatus and method for plasma etching Dec. 27, 2011
8049872 Endpoint detection device for realizing real-time control of plasma reactor, plasma reactor with endpoint detection device, and endpoint detection method Nov. 1, 2011
8043438 Device for cleaning CVD device and method of cleaning CVD device Oct. 25, 2011
8025759 Polishing apparatus and polishing method Sep. 27, 2011
7993487 Plasma processing apparatus and method of measuring amount of radio-frequency current in plasma Aug. 9, 2011
7867355 Adjustable height PIF probe Jan. 11, 2011
7862736 Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus Jan. 4, 2011
7850818 Method of manufacturing semiconductor device and cleaning apparatus Dec. 14, 2010
7833381 Optical emission interferometry for PECVD using a gas injection hole Nov. 16, 2010
7815813 End point detection method, end point detection device, and gas phase reaction processing apparatus equipped with end point detection device Oct. 19, 2010
7811428 Method and apparatus for an improved optical window deposition shield in a plasma processing system Oct. 12, 2010
7794563 Etching depth measuring device, etching apparatus, and etching depth measuring method Sep. 14, 2010
7691226 Electron temperature measurement method, electron temperature measurement program for implementing the method, and storage medium storing the electron temperature measurement program Apr. 6, 2010
7686917 Plasma processing system and apparatus and a sample processing method Mar. 30, 2010
7655110 Plasma processing apparatus Feb. 2, 2010
7604010 Film formation apparatus and method of using the same Oct. 20, 2009
7601240 Disturbance-free, recipe-controlled plasma processing system and method Oct. 13, 2009
7582183 Apparatus for detection of thin films during chemical/mechanical polishing planarization Sep. 1, 2009
7569119 In-situ real-time monitoring technique and apparatus for detection of thin films during chemical/mechanical polishing planarization Aug. 4, 2009
7566368 Method and apparatus for an improved upper electrode plate in a plasma processing system Jul. 28, 2009
7534469 Semiconductor-processing apparatus provided with self-cleaning device May. 19, 2009
7498236 Silicon wafer thinning end point method Mar. 3, 2009
7485189 Thin film deposition device using an FTIR gas analyzer for mixed gas supply Feb. 3, 2009
7481887 Apparatus for controlling gas pulsing in processes for depositing materials onto micro-device workpieces Jan. 27, 2009
7473332 Method for processing semiconductor Jan. 6, 2009
7446048 Dry etching apparatus and dry etching method Nov. 4, 2008
7377992 Method and apparatus for detecting end point May. 27, 2008
7341644 Method for predicting consumption of consumable part, method for predicting deposited-film thickness, and plasma processor Mar. 11, 2008
7329328 Method for etch processing with end point detection thereof Feb. 12, 2008
7314401 Methods and systems for conditioning planarizing pads used in planarizing substrates Jan. 1, 2008

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