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Class Information
Number: 156/345.23
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus > For liquid etchant > With specified workpiece support
Description: Apparatus including a means to hold the workpiece to be etched; to be "specified" , the means must be heated, cooled, moveable, or structurally defined.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8662008 Edge coating apparatus for solar cell substrates Mar. 4, 2014
8580585 Method and system for controlled isotropic etching on a plurality of etch systems Nov. 12, 2013
8435380 Substrate chucking member, substrate processing apparatus having the member, and method of processing substrate using the member May. 7, 2013
8425718 Wet metal-etching method and apparatus for MEMS device fabrication Apr. 23, 2013
8394234 Spin head and method of chucking substrate using the same Mar. 12, 2013
8342119 Self aligning non contact shadow ring process kit Jan. 1, 2013
8343305 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment Jan. 1, 2013
8333842 Apparatus for etching semiconductor wafers Dec. 18, 2012
8317925 Method and system for mask handling in high productivity chamber Nov. 27, 2012
8308894 Substrate etching apparatus Nov. 13, 2012
8293065 Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same Oct. 23, 2012
8293071 Spin head Oct. 23, 2012
8276604 Peripherally engaging electrode carriers and assemblies incorporating the same Oct. 2, 2012
8262799 Substrate processing apparatus and substrate transferring method Sep. 11, 2012
8257547 Surface activation device Sep. 4, 2012
8257549 Spin head, chuck pin used in the spin head, and method for treating a substrate with the spin head Sep. 4, 2012
8123900 Substrate supporting unit and apparatus for treating substrate using the substrate supporting unit Feb. 28, 2012
8123901 Etching apparatus Feb. 28, 2012
8029641 Device and method for liquid treatment of wafer-shaped articles Oct. 4, 2011
7993461 Method and system for mask handling in high productivity chamber Aug. 9, 2011
7938907 Device for fabricating a mask by plasma etching a semiconductor substrate May. 10, 2011
7871470 Substrate support lift mechanism Jan. 18, 2011
7869062 Apparatus for supporting substrate, apparatus for measuring surface potential, apparatus for measuring film thickness, and apparatus for inspecting substrate Jan. 11, 2011
7823595 Apparatus for etching substrate and method of fabricating thin-glass substrate Nov. 2, 2010
7807018 Etching apparatus for use in manufacture of flat panel display device and manufacturing method using the same Oct. 5, 2010
7758717 Wafer treating apparatus Jul. 20, 2010
7748395 Wash-target holder and method for washing wash-target using the same Jul. 6, 2010
7736461 Cassette for preventing breakage of glass substrate Jun. 15, 2010
7730898 Semiconductor wafer lifter Jun. 8, 2010
7695233 Substrate processing apparatus Apr. 13, 2010
7578945 Method and apparatus for tuning a set of plasma processing steps Aug. 25, 2009
7566378 Arrangement of electronic semiconductor components on a carrier system for treating said semiconductor components with a liquid medium Jul. 28, 2009
7567421 Bipolar electrostatic chuck Jul. 28, 2009
7527694 Substrate gripping apparatus May. 5, 2009
7332056 Thin film removing device and thin film removing method Feb. 19, 2008
7267132 Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Sep. 11, 2007
7255114 Ion sampling system for wafer Aug. 14, 2007
7253117 Methods for use of pulsed voltage in a plasma reactor Aug. 7, 2007
7250084 Downward mechanism for support pins Jul. 31, 2007
7198677 Low temperature wafer backside cleaning Apr. 3, 2007
7176403 Method and apparatus for the compensation of edge ring wear in a plasma processing chamber Feb. 13, 2007
7172674 Device for liquid treatment of wafer-shaped articles Feb. 6, 2007
7160416 Substrate treating apparatus Jan. 9, 2007
7160392 Method for dechucking a substrate Jan. 9, 2007
7153388 Chamber for high-pressure wafer processing and method for making the same Dec. 26, 2006
7138067 Methods and apparatus for tuning a set of plasma processing steps Nov. 21, 2006
7105100 System and method for gas distribution in a dry etch process Sep. 12, 2006
7105074 Substrate treating method and apparatus Sep. 12, 2006
7087122 Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same Aug. 8, 2006
7067033 Chemical liquid processing apparatus for processing a substrate Jun. 27, 2006

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