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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.

Sub-classes under this class:

Class Number Class Name Patents
156/345.11 For liquid etchant 163
156/345.43 Having glow discharge electrode gas energizing means 459
156/345.29 With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) 336
156/345.33 With gas inlet structure (e.g., inlet nozzle, gas distributor) 538
156/345.37 With heating or cooling means for apparatus part other than workpiece support 232
156/345.31 With means for passing discrete workpiece through plural chambers (e.g., loadlock) 359
156/345.5 With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation 108
156/345.4 With means to direct electron beam or ion beam to a gas to energize the gas 36
156/345.39 With means to generate and to direct a reactive ion etchant beam at a workpiece 117
156/345.24 With measuring, sensing, detection or process control means 486
156/345.3 With mechanical mask, shield or shutter for shielding workpiece 137
156/345.41 With microwave gas energizing means 276
156/345.38 With multiple gas energizing means associated with one workpiece etching 106
156/345.35 With plasma generation means remote from processing chamber 197
156/345.48 With radio frequency (rf) antenna or inductive coil gas energizing means 620
156/345.51 With workpiece support 647

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
5895586 Plasma processing apparatus and plasma processing method in which a part of the processing chamber is formed using a pre-fluorinated material of aluminum Apr. 20, 1999
5891348 Process gas focusing apparatus and method Apr. 6, 1999
5879523 Ceramic coated metallic insulator particularly useful in a plasma sputter reactor Mar. 9, 1999
5871609 Electrode plate and jig for use in plasma etching Feb. 16, 1999
5855679 Semiconductor manufacturing apparatus Jan. 5, 1999
5762748 Lid and door for a vacuum chamber and pretreatment therefor Jun. 9, 1998
5705018 Micromachined peristaltic pump Jan. 6, 1998
5698063 Intermediate workpiece employing a mask for etching an aperture aligned with the crystal planes in the workpiece substrate Dec. 16, 1997
5693173 Thermal gas cracking source technology Dec. 2, 1997
5690784 Ion milling end point detection method and apparatus Nov. 25, 1997
5641375 Plasma etching reactor with surface protection means against erosion of walls Jun. 24, 1997
5639341 Dry etching with less particles Jun. 17, 1997
5628883 Method for generating and activating plasma process of treatment using same, and apparatus therefor May. 13, 1997
5567329 Method and system for fabricating a multilayer laminate for a printed wiring board, and a printed wiring board formed thereby Oct. 22, 1996
5565058 Lid and door for a vacuum chamber and pretreatment therefor Oct. 15, 1996
5552124 Stationary focus ring for plasma reactor Sep. 3, 1996
5480052 Domed extension for process chamber electrode Jan. 2, 1996
5472550 Method and apparatus for protecting a substrate surface from contamination using the photophoretic effect Dec. 5, 1995
5468326 Apparatus for polishing a diamond or carbon nitride film by reaction with oxygen transported to the film through a superionic conductor in contact with the film Nov. 21, 1995
5410122 Use of electrostatic forces to reduce particle contamination in semiconductor plasma processing chambers Apr. 25, 1995
5397421 Powder beam etching machine Mar. 14, 1995
5362353 Faraday cage for barrel-style plasma etchers Nov. 8, 1994
5352293 Tube apparatus for manufacturing semiconductor device Oct. 4, 1994
5330607 Sacrificial metal etchback system Jul. 19, 1994
5254202 Fabrication of laser ablation masks by wet etching Oct. 19, 1993
5240555 Method and apparatus for cleaning semiconductor etching machines Aug. 31, 1993
5145547 Apparatus for self-induced repair of circuit short and near-shorts Sep. 8, 1992
5022955 Apparatus and method for self-induced repair of circuit shorts and near-shorts Jun. 11, 1991
5017262 Material-web marking by means of bar code May. 21, 1991
5015323 Multi-tipped field-emission tool for nanostructure fabrication May. 14, 1991
4749436 Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer Jun. 7, 1988
4611110 Method and apparatus for connecting a plasma generator to a reactor Sep. 9, 1986
4588468 Apparatus for changing and repairing printed circuit boards May. 13, 1986
4526644 Treatment device utilizing plasma Jul. 2, 1985
4451327 Process and structure for etching copper May. 29, 1984
4427516 Apparatus and method for plasma-assisted etching of wafers Jan. 24, 1984
4397724 Apparatus and method for plasma-assisted etching of wafers Aug. 9, 1983

1 2 3 4 5 6

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