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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.

Sub-classes under this class:

Class Number Class Name Patents
156/345.11 For liquid etchant 163
156/345.43 Having glow discharge electrode gas energizing means 459
156/345.29 With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) 336
156/345.33 With gas inlet structure (e.g., inlet nozzle, gas distributor) 538
156/345.37 With heating or cooling means for apparatus part other than workpiece support 232
156/345.31 With means for passing discrete workpiece through plural chambers (e.g., loadlock) 359
156/345.5 With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation 108
156/345.4 With means to direct electron beam or ion beam to a gas to energize the gas 36
156/345.39 With means to generate and to direct a reactive ion etchant beam at a workpiece 117
156/345.24 With measuring, sensing, detection or process control means 486
156/345.3 With mechanical mask, shield or shutter for shielding workpiece 137
156/345.41 With microwave gas energizing means 276
156/345.38 With multiple gas energizing means associated with one workpiece etching 106
156/345.35 With plasma generation means remote from processing chamber 197
156/345.48 With radio frequency (rf) antenna or inductive coil gas energizing means 620
156/345.51 With workpiece support 647

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
6432256 Implanatation process for improving ceramic resistance to corrosion Aug. 13, 2002
6431113 Plasma vacuum substrate treatment process and system Aug. 13, 2002
6419752 Structuring device for processing a substrate Jul. 16, 2002
6408786 Semiconductor processing equipment having tiled ceramic liner Jun. 25, 2002
6399510 Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates Jun. 4, 2002
6395128 RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition May. 28, 2002
6394026 Low contamination high density plasma etch chambers and methods for making the same May. 28, 2002
6383330 Quartz wafer processing chamber May. 7, 2002
6383331 Device for discharging two or more media with media nozzles May. 7, 2002
6383333 Protective member for inner surface of chamber and plasma processing apparatus May. 7, 2002
6379492 Corrosion resistant coating Apr. 30, 2002
6379491 Plasma chamber with erosion resistive securement screws Apr. 30, 2002
6372082 Method and apparatus for semiconductor device fabrication Apr. 16, 2002
6372084 Plasma processing apparatus with a dielectric plate having a thickness based on a wavelength of a microwave introduced into a process chamber through the dielectric plate Apr. 16, 2002
6368450 Processing apparatus Apr. 9, 2002
6364995 Dome-shaped inductive coupling wall having a plurality of radii for an inductively coupled plasma reactor Apr. 2, 2002
6361644 Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode Mar. 26, 2002
6361646 Method and apparatus for endpoint detection for chemical mechanical polishing Mar. 26, 2002
6361647 Method and apparatus for chemical mechanical polishing Mar. 26, 2002
6361648 Wafer transfer station for a chemical mechanical polisher Mar. 26, 2002
6358361 Plasma processor Mar. 19, 2002
6316369 Corrosion-resistant system and method for a plasma etching apparatus Nov. 13, 2001
6277237 Chamber liner for semiconductor process chambers Aug. 21, 2001
6257168 Elevated stationary uniformity ring design Jul. 10, 2001
6254719 Method for controlled removal of material from a solid surface Jul. 3, 2001
6251216 Apparatus and method for plasma processing Jun. 26, 2001
6228208 Plasma density and etch rate enhancing semiconductor processing chamber May. 8, 2001
6210594 Near substrate reactant homogenization apparatus Apr. 3, 2001
6202589 Grounding mechanism which maintains a low resistance electrical ground path between a plate electrode and an etch chamber Mar. 20, 2001
6170429 Chamber liner for semiconductor process chambers Jan. 9, 2001
6159333 Substrate processing system configurable for deposition or cleaning Dec. 12, 2000
6148765 Electrode for plasma processes and method for manufacture and use thereof Nov. 21, 2000
6132553 Substrate processing apparatus Oct. 17, 2000
6129808 Low contamination high density plasma etch chambers and methods for making the same Oct. 10, 2000
6120640 Boron carbide parts and coatings in a plasma reactor Sep. 19, 2000
6113734 Apparatus for opening/closing a process chamber door of ovens used for manufacturing semiconductor devices Sep. 5, 2000
6082292 Sealing roller system for surface treatment gas reactors Jul. 4, 2000
6071824 Method and system for patterning to enhance performance of a metal layer of a semiconductor device Jun. 6, 2000
6068728 Laser texturing with reverse lens focusing system May. 30, 2000
6054018 Outside chamber sealing roller system for surface treatment gas reactors Apr. 25, 2000
6039836 Focus rings Mar. 21, 2000
6008130 Polymer adhesive plasma confinement ring Dec. 28, 1999
6007673 Apparatus and method of producing an electronic device Dec. 28, 1999
5997685 Corrosion-resistant apparatus Dec. 7, 1999
5976310 Plasma etch system Nov. 2, 1999
5951814 Electrode for plasma etching Sep. 14, 1999
5942454 Highly corrosion-resistant silicon carbide product Aug. 24, 1999
5904800 Semiconductor wafer processing chamber for reducing particles deposited onto the semiconductor wafer May. 18, 1999
5904778 Silicon carbide composite article particularly useful for plasma reactors May. 18, 1999
5900064 Plasma process chamber May. 4, 1999

1 2 3 4 5 6

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