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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.

Sub-classes under this class:

Class Number Class Name Patents
156/345.11 For liquid etchant 163
156/345.43 Having glow discharge electrode gas energizing means 459
156/345.29 With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) 336
156/345.33 With gas inlet structure (e.g., inlet nozzle, gas distributor) 538
156/345.37 With heating or cooling means for apparatus part other than workpiece support 232
156/345.31 With means for passing discrete workpiece through plural chambers (e.g., loadlock) 359
156/345.5 With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation 108
156/345.4 With means to direct electron beam or ion beam to a gas to energize the gas 36
156/345.39 With means to generate and to direct a reactive ion etchant beam at a workpiece 117
156/345.24 With measuring, sensing, detection or process control means 486
156/345.3 With mechanical mask, shield or shutter for shielding workpiece 137
156/345.41 With microwave gas energizing means 276
156/345.38 With multiple gas energizing means associated with one workpiece etching 106
156/345.35 With plasma generation means remote from processing chamber 197
156/345.48 With radio frequency (rf) antenna or inductive coil gas energizing means 620
156/345.51 With workpiece support 647

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
7267741 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon Sep. 11, 2007
7267742 Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device Sep. 11, 2007
7255772 High pressure processing chamber for semiconductor substrate Aug. 14, 2007
7244625 Plasma processing method and plasma processing device Jul. 17, 2007
7235153 System for removal of a spacer Jun. 26, 2007
7225819 Apparatus process and method for mounting and treating a substrate Jun. 5, 2007
7202176 Enhanced stripping of low-k films using downstream gas mixing Apr. 10, 2007
7186651 Chemical mechanical polishing method and apparatus Mar. 6, 2007
7166170 Cylinder-based plasma processing system Jan. 23, 2007
7160812 Method for preventing electrode deterioration in etching apparatus Jan. 9, 2007
7146248 Automated mineral processing systems and methods Dec. 5, 2006
7071114 Method and apparatus for dry etching Jul. 4, 2006
7066107 Shielding system for plasma chamber Jun. 27, 2006
7056388 Reaction chamber with at least one HF feedthrough Jun. 6, 2006
7048824 Device for treating silicon wafers May. 23, 2006
7035696 Method and apparatus for poly gate CD control Apr. 25, 2006
7024267 Automobile gauge faces made of stainless steel and other metals Apr. 4, 2006
7017652 Method and apparatus for transferring heat from a substrate to a chuck Mar. 28, 2006
6951821 Processing system and method for chemically treating a substrate Oct. 4, 2005
6949147 In situ module for particle removal from solid-state surfaces Sep. 27, 2005
6893325 Method and apparatus for increasing chemical-mechanical-polishing selectivity May. 17, 2005
6887337 Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto May. 3, 2005
6868800 Branching RF antennas and plasma processing apparatus Mar. 22, 2005
6863835 Magnetic barrier for plasma in chamber exhaust Mar. 8, 2005
6863769 Configuration and method for making contact with the back surface of a semiconductor substrate Mar. 8, 2005
6858988 Electrodeless excimer UV lamp Feb. 22, 2005
6849857 Beam processing apparatus Feb. 1, 2005
6838011 Method of processing PFC and apparatus for processing PFC Jan. 4, 2005
6838405 Plasma-resistant member for semiconductor manufacturing apparatus and method for manufacturing the same Jan. 4, 2005
6833312 Plate member separating apparatus and method Dec. 21, 2004
6827816 In situ module for particle removal from solid-state surfaces Dec. 7, 2004
6818094 Reciprocating gas valve for pulsing a gas Nov. 16, 2004
6806194 Apparatus and methods for processing a workpiece Oct. 19, 2004
6796883 Controlled lubricated finishing Sep. 28, 2004
6789498 Elements having erosion resistance Sep. 14, 2004
6786996 Apparatus and method for edge bead removal Sep. 7, 2004
6776094 Kit For Microcontact Printing Aug. 17, 2004
6773544 Magnetic barrier for plasma in chamber exhaust Aug. 10, 2004
6764572 Apparatus and method for semiconductor wafer etching Jul. 20, 2004
6756737 Plasma processing apparatus and method Jun. 29, 2004
6753498 Automated electrode replacement apparatus for a plasma processing system Jun. 22, 2004
6746503 Precision gap particle separator Jun. 8, 2004
6744211 Plasma density information measuring method, probe used for measuring plasma density information, and plasma density information measuring apparatus Jun. 1, 2004
6736987 Silicon etching apparatus using XeF2 May. 18, 2004
6736928 Exposure apparatus and semiconductor device manufacturing method May. 18, 2004
6723664 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction Apr. 20, 2004
6723202 Worktable device and plasma processing apparatus for semiconductor process Apr. 20, 2004
6719873 Method and apparatus for preventing plasma formation Apr. 13, 2004
6716762 Plasma confinement by use of preferred RF return path Apr. 6, 2004

1 2 3 4 5 6

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