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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.

Sub-classes under this class:

Class Number Class Name Patents
156/345.11 For liquid etchant 163
156/345.43 Having glow discharge electrode gas energizing means 459
156/345.29 With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) 336
156/345.33 With gas inlet structure (e.g., inlet nozzle, gas distributor) 538
156/345.37 With heating or cooling means for apparatus part other than workpiece support 232
156/345.31 With means for passing discrete workpiece through plural chambers (e.g., loadlock) 359
156/345.5 With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation 108
156/345.4 With means to direct electron beam or ion beam to a gas to energize the gas 36
156/345.39 With means to generate and to direct a reactive ion etchant beam at a workpiece 117
156/345.24 With measuring, sensing, detection or process control means 486
156/345.3 With mechanical mask, shield or shutter for shielding workpiece 137
156/345.41 With microwave gas energizing means 276
156/345.38 With multiple gas energizing means associated with one workpiece etching 106
156/345.35 With plasma generation means remote from processing chamber 197
156/345.48 With radio frequency (rf) antenna or inductive coil gas energizing means 620
156/345.51 With workpiece support 647

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8216422 Substrate support bushing Jul. 10, 2012
8187384 Vacuum processing apparatus May. 29, 2012
8182660 Power supply apparatus and deposition method using the power supply apparatus May. 22, 2012
8171877 Backside mounted electrode carriers and assemblies incorporating the same May. 8, 2012
8152926 Vacuum processing apparatus Apr. 10, 2012
8123860 Apparatus for cyclical depositing of thin films Feb. 28, 2012
8082878 Thermal evaporation apparatus, use and method of depositing a material Dec. 27, 2011
8075691 Vacuum processing apparatus Dec. 13, 2011
8017197 Plasma processing method and plasma processing apparatus Sep. 13, 2011
8012772 Substrate treating apparatus, substrate treating method, and method for manufacturing high-voltage device Sep. 6, 2011
8002896 Shadow frame with cross beam for semiconductor equipment Aug. 23, 2011
8002894 Processing apparatus and processing method Aug. 23, 2011
7993462 Substrate-supporting device having continuous concavity Aug. 9, 2011
7993461 Method and system for mask handling in high productivity chamber Aug. 9, 2011
7987814 Lower liner with integrated flow equalizer and improved conductance Aug. 2, 2011
7976634 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems Jul. 12, 2011
7972486 Machine for coating a substrate, and module Jul. 5, 2011
7972467 Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor Jul. 5, 2011
7967911 Apparatus and methods for chemical vapor deposition Jun. 28, 2011
7959816 Wet-processing apparatus and method of fabricating display panel Jun. 14, 2011
7958898 Substrate processing apparatus Jun. 14, 2011
7942968 Catalyst enhanced chemical vapor deposition apparatus May. 17, 2011
7922818 Method and system for binding halide-based contaminants Apr. 12, 2011
7892357 Gas distribution plate assembly for plasma reactors Feb. 22, 2011
7894059 Film formation processing apparatus and method for determining an end-point of a cleaning process Feb. 22, 2011
7887669 Vacuum processing apparatus Feb. 15, 2011
7887323 Method and apparatus for manufacturing semiconductor device Feb. 15, 2011
7884028 Method of removing material layer and remnant metal Feb. 8, 2011
7879179 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film Feb. 1, 2011
7846310 Encapsulated and water cooled electromagnet array Dec. 7, 2010
7846291 Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film Dec. 7, 2010
7824519 Variable volume plasma processing chamber and associated methods Nov. 2, 2010
7821655 In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction Oct. 26, 2010
7771535 Semiconductor manufacturing apparatus Aug. 10, 2010
7758717 Wafer treating apparatus Jul. 20, 2010
7740736 Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber Jun. 22, 2010
7696117 Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas Apr. 13, 2010
7662302 Lifting and supporting device Feb. 16, 2010
7632375 Electrically enhancing the confinement of plasma Dec. 15, 2009
7632376 Method and apparatus for atomic layer deposition (ALD) in a proximity system Dec. 15, 2009
7618514 Photo-etched EDM electrode Nov. 17, 2009
7601223 Showerhead assembly and ALD methods Oct. 13, 2009
7586099 Vacuum plasma generator Sep. 8, 2009
7556711 Semiconductor device manufacturing apparatus and operating method thereof Jul. 7, 2009
7531059 Cleaning of semiconductor wafers by contaminate encapsulation May. 12, 2009
7524395 Plasma chamber having plasma source coil and method for etching the wafer using the same Apr. 28, 2009
7479204 Method of manufacturing semiconductor substrate and method of evaluating quality of semiconductor substrate Jan. 20, 2009
7416632 Substrate processing apparatus and substrate processing method Aug. 26, 2008
7377991 Ultrasonic assisted etch using corrosive liquids May. 27, 2008
7297286 Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants Nov. 20, 2007

1 2 3 4 5 6

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