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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.

Sub-classes under this class:

Class Number Class Name Patents
156/345.11 For liquid etchant 163
156/345.43 Having glow discharge electrode gas energizing means 459
156/345.29 With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) 336
156/345.33 With gas inlet structure (e.g., inlet nozzle, gas distributor) 538
156/345.37 With heating or cooling means for apparatus part other than workpiece support 232
156/345.31 With means for passing discrete workpiece through plural chambers (e.g., loadlock) 359
156/345.5 With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation 108
156/345.4 With means to direct electron beam or ion beam to a gas to energize the gas 36
156/345.39 With means to generate and to direct a reactive ion etchant beam at a workpiece 117
156/345.24 With measuring, sensing, detection or process control means 486
156/345.3 With mechanical mask, shield or shutter for shielding workpiece 137
156/345.41 With microwave gas energizing means 276
156/345.38 With multiple gas energizing means associated with one workpiece etching 106
156/345.35 With plasma generation means remote from processing chamber 197
156/345.48 With radio frequency (rf) antenna or inductive coil gas energizing means 620
156/345.51 With workpiece support 647

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8691015 Method and system for binding halide-based contaminants Apr. 8, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8663390 Independent radiant gas preheating for precursor disassociation control and gas reaction kinetics in low temperature CVD systems Mar. 4, 2014
8623172 Gas flow path structure and substrate processing apparatus Jan. 7, 2014
8623142 Coating apparatus Jan. 7, 2014
8623765 Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus Jan. 7, 2014
8617352 Electrode assembly for the removal of surface oxides by electron attachment Dec. 31, 2013
8614140 Semiconductor device manufacturing apparatus Dec. 24, 2013
8603292 Quartz window for a degas chamber Dec. 10, 2013
8580075 Method and system for introduction of an active material to a chemical process Nov. 12, 2013
8578879 Apparatus for VHF impedance match tuning Nov. 12, 2013
8567339 Liquid processing apparatus Oct. 29, 2013
8562745 Stable wafer-carrier system Oct. 22, 2013
8562746 Sectional wafer carrier Oct. 22, 2013
8518827 Spectrum based endpointing for chemical mechanical polishing Aug. 27, 2013
8506711 Apparatus for manufacturing flat-panel display Aug. 13, 2013
8500907 Masking system for the masking of a cylinder bore Aug. 6, 2013
8486222 Substrate processing apparatus and method of manufacturing a semiconductor device Jul. 16, 2013
8486291 Plasma processing method Jul. 16, 2013
8486798 Variable capacitance chamber component incorporating a semiconductor junction and methods of manufacturing and using thereof Jul. 16, 2013
8475622 Method of reusing a consumable part for use in a plasma processing apparatus Jul. 2, 2013
8440048 Load lock having secondary isolation chamber May. 14, 2013
8398777 System and method for pedestal adjustment Mar. 19, 2013
8398775 Electrode and arrangement with movable shield Mar. 19, 2013
8388755 Thermalization of gaseous precursors in CVD reactors Mar. 5, 2013
8381677 Prevention of film deposition on PECVD process chamber wall Feb. 26, 2013
8383001 Plasma etching method, plasma etching apparatus and storage medium Feb. 26, 2013
8366827 Chamber inserts and apparatuses for processing a substrate Feb. 5, 2013
8357262 Corrosion-resistant member, treatment apparatus and sample treatment method using the member, and method for manufacture of corrosion-resistant member Jan. 22, 2013
8349082 Vacuum processing apparatus Jan. 8, 2013
8343305 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment Jan. 1, 2013
8337619 Polymeric coating of substrate processing system components for contamination control Dec. 25, 2012
8336489 Thermal evaporation apparatus, use and method of depositing a material Dec. 25, 2012
8313578 Etching chamber having flow equalizer and lower liner Nov. 20, 2012
8309465 System and method for producing devices including a semiconductor part and a non-semiconductor part Nov. 13, 2012
8308962 Etching processes used in MEMS production Nov. 13, 2012
8310054 Semiconductor device manufacturing method and target substrate processing system Nov. 13, 2012
8287650 Low sloped edge ring for plasma processing chamber Oct. 16, 2012
8282844 Method for etching metal nitride with high selectivity to other materials Oct. 9, 2012
8276604 Peripherally engaging electrode carriers and assemblies incorporating the same Oct. 2, 2012
8277567 Method of cleaning turbo pump and chamber/turbo pump clean process Oct. 2, 2012
8273178 Thin film deposition apparatus and method of maintaining the same Sep. 25, 2012
8270141 Electrostatic chuck with reduced arcing Sep. 18, 2012
8262844 Plasma processing apparatus, plasma processing method and storage medium Sep. 11, 2012
8262846 Plasma processing apparatus and method thereof Sep. 11, 2012
8236380 Gas supply system, substrate processing apparatus and gas supply method Aug. 7, 2012
8227052 Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body Jul. 24, 2012
8225745 Chemical vaporizer for material deposition systems and associated methods Jul. 24, 2012
8221579 Method of reusing a consumable part for use in a plasma processing apparatus Jul. 17, 2012
8216374 Gas coupler for substrate processing chamber Jul. 10, 2012

1 2 3 4 5 6

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