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Class Information
Number: 156/345.1
Name: Adhesive bonding and miscellaneous chemical manufacture > Differential fluid etching apparatus
Description: . Apparatus under the class definition for contacting a workpiece with a reactive fluid to chemically erode different portions of the workpiece at different rates.
Sub-classes under this class:
| Class Number |
Class Name |
Patents |
| 156/345.11 |
For liquid etchant |
141 |
| 156/345.43 |
Having glow discharge electrode gas energizing means |
258 |
| 156/345.29 |
With etchant gas supply or exhaust structure located outside of etching chamber (e.g., supply tank, pipe network, exhaust pump, particle filter) |
253 |
| 156/345.33 |
With gas inlet structure (e.g., inlet nozzle, gas distributor) |
276 |
| 156/345.37 |
With heating or cooling means for apparatus part other than workpiece support |
166 |
| 156/345.31 |
With means for passing discrete workpiece through plural chambers (e.g., loadlock) |
250 |
| 156/345.5 |
With means for photochemical energization of a gas using ultraviolet, visible, or x-ray radiation |
96 |
| 156/345.4 |
With means to direct electron beam or ion beam to a gas to energize the gas |
25 |
| 156/345.39 |
With means to generate and to direct a reactive ion etchant beam at a workpiece |
98 |
| 156/345.24 |
With measuring, sensing, detection or process control means |
329 |
| 156/345.3 |
With mechanical mask, shield or shutter for shielding workpiece |
93 |
| 156/345.41 |
With microwave gas energizing means |
200 |
| 156/345.38 |
With multiple gas energizing means associated with one workpiece etching |
92 |
| 156/345.35 |
With plasma generation means remote from processing chamber |
144 |
| 156/345.48 |
With radio frequency (rf) antenna or inductive coil gas energizing means |
467 |
| 156/345.51 |
With workpiece support |
419 |
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618514 |
Photo-etched EDM electrode |
Nov. 17, 2009 |
| 7601223 |
Showerhead assembly and ALD methods |
Oct. 13, 2009 |
| 7586099 |
Vacuum plasma generator |
Sep. 8, 2009 |
| 7556711 |
Semiconductor device manufacturing apparatus and operating method thereof |
Jul. 7, 2009 |
| 7531059 |
Cleaning of semiconductor wafers by contaminate encapsulation |
May. 12, 2009 |
| 7524395 |
Plasma chamber having plasma source coil and method for etching the wafer using the same |
Apr. 28, 2009 |
| 7479204 |
Method of manufacturing semiconductor substrate and method of evaluating quality of semiconductor substrate |
Jan. 20, 2009 |
| 7416632 |
Substrate processing apparatus and substrate processing method |
Aug. 26, 2008 |
| 7377991 |
Ultrasonic assisted etch using corrosive liquids |
May. 27, 2008 |
| 7297286 |
Methods for resist stripping and other processes for cleaning surfaces substantially free of contaminants |
Nov. 20, 2007 |
| 7267741 |
Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
Sep. 11, 2007 |
| 7267742 |
Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device |
Sep. 11, 2007 |
| 7255772 |
High pressure processing chamber for semiconductor substrate |
Aug. 14, 2007 |
| 7244625 |
Plasma processing method and plasma processing device |
Jul. 17, 2007 |
| 7235153 |
System for removal of a spacer |
Jun. 26, 2007 |
| 7225819 |
Apparatus process and method for mounting and treating a substrate |
Jun. 5, 2007 |
| 7202176 |
Enhanced stripping of low-k films using downstream gas mixing |
Apr. 10, 2007 |
| 7186651 |
Chemical mechanical polishing method and apparatus |
Mar. 6, 2007 |
| 7166170 |
Cylinder-based plasma processing system |
Jan. 23, 2007 |
| 7160812 |
Method for preventing electrode deterioration in etching apparatus |
Jan. 9, 2007 |
| 7146248 |
Automated mineral processing systems and methods |
Dec. 5, 2006 |
| 7071114 |
Method and apparatus for dry etching |
Jul. 4, 2006 |
| 7066107 |
Shielding system for plasma chamber |
Jun. 27, 2006 |
| 7056388 |
Reaction chamber with at least one HF feedthrough |
Jun. 6, 2006 |
| 7048824 |
Device for treating silicon wafers |
May. 23, 2006 |
| 7035696 |
Method and apparatus for poly gate CD control |
Apr. 25, 2006 |
| 7024267 |
Automobile gauge faces made of stainless steel and other metals |
Apr. 4, 2006 |
| 7017652 |
Method and apparatus for transferring heat from a substrate to a chuck |
Mar. 28, 2006 |
| 6951821 |
Processing system and method for chemically treating a substrate |
Oct. 4, 2005 |
| 6949147 |
In situ module for particle removal from solid-state surfaces |
Sep. 27, 2005 |
| 6893325 |
Method and apparatus for increasing chemical-mechanical-polishing selectivity |
May. 17, 2005 |
| 6887337 |
Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto |
May. 3, 2005 |
| 6868800 |
Branching RF antennas and plasma processing apparatus |
Mar. 22, 2005 |
| 6863835 |
Magnetic barrier for plasma in chamber exhaust |
Mar. 8, 2005 |
| 6863769 |
Configuration and method for making contact with the back surface of a semiconductor substrate |
Mar. 8, 2005 |
| 6858988 |
Electrodeless excimer UV lamp |
Feb. 22, 2005 |
| 6849857 |
Beam processing apparatus |
Feb. 1, 2005 |
| 6838011 |
Method of processing PFC and apparatus for processing PFC |
Jan. 4, 2005 |
| 6838405 |
Plasma-resistant member for semiconductor manufacturing apparatus and method for manufacturing the same |
Jan. 4, 2005 |
| 6833312 |
Plate member separating apparatus and method |
Dec. 21, 2004 |
| 6827816 |
In situ module for particle removal from solid-state surfaces |
Dec. 7, 2004 |
| 6818094 |
Reciprocating gas valve for pulsing a gas |
Nov. 16, 2004 |
| 6806194 |
Apparatus and methods for processing a workpiece |
Oct. 19, 2004 |
| 6796883 |
Controlled lubricated finishing |
Sep. 28, 2004 |
| 6789498 |
Elements having erosion resistance |
Sep. 14, 2004 |
| 6786996 |
Apparatus and method for edge bead removal |
Sep. 7, 2004 |
| 6776094 |
Kit For Microcontact Printing |
Aug. 17, 2004 |
| 6773544 |
Magnetic barrier for plasma in chamber exhaust |
Aug. 10, 2004 |
| 6764572 |
Apparatus and method for semiconductor wafer etching |
Jul. 20, 2004 |
| 6756737 |
Plasma processing apparatus and method |
Jun. 29, 2004 |
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