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Class Information
Number: 148/DIG.90
Name: Metal treatment > Laser anneal

Patents under this class:
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Patent Number Title Of Patent Date Issued
6432756 Semiconductor device and fabricating method thereof Aug. 13, 2002
6174790 Method of crystallizing amorphous silicon layer Jan. 16, 2001
5804471 Method of fabricating thin film transistor Sep. 8, 1998
5773309 Method for producing silicon thin-film transistors with enhanced forward current drive Jun. 30, 1998
5766989 Method for forming polycrystalline thin film and method for fabricating thin-film transistor Jun. 16, 1998
5756364 Laser processing method of semiconductor device using a catalyst May. 26, 1998
5750443 Method of manufacturing semiconductor device May. 12, 1998
5688715 Excimer laser dopant activation of backside illuminated CCD's Nov. 18, 1997
5643801 Laser processing method and alignment Jul. 1, 1997
5593918 Techniques for forming superconductive lines Jan. 14, 1997
5591668 Laser annealing method for a semiconductor thin film Jan. 7, 1997
5587330 Method for manufacturing semiconductor device Dec. 24, 1996
5580801 Method for processing a thin film using an energy beam Dec. 3, 1996
5569624 Method for shallow junction formation Oct. 29, 1996
5529630 Apparatus for manufacturing a liquid crystal display substrate, and apparatus for evaluating semiconductor crystals Jun. 25, 1996
5529951 Method of forming polycrystalline silicon layer on substrate by large area excimer laser irradiation Jun. 25, 1996
5496768 Method of manufacturing polycrystalline silicon thin film Mar. 5, 1996
5424230 Method of manufacturing a polysilicon thin film transistor Jun. 13, 1995
5413958 Method for manufacturing a liquid crystal display substrate May. 9, 1995
5409857 Process for production of an integrated circuit Apr. 25, 1995
5387546 Method for manufacturing a semiconductor device Feb. 7, 1995
5382548 Method for making polystalline silicon thin film Jan. 17, 1995
5366926 Low temperature process for laser dehydrogenation and crystallization of amorphous silicon Nov. 22, 1994
5328861 Method for forming thin film transistor Jul. 12, 1994
5304357 Apparatus for zone melting recrystallization of thin semiconductor film Apr. 19, 1994
5296405 Method for photo annealing non-single crystalline semiconductor films Mar. 22, 1994
5229322 Method of making low resistance substrate or buried layer contact Jul. 20, 1993
5221365 Photovoltaic cell and method of manufacturing polycrystalline semiconductive film Jun. 22, 1993
5215939 Method of manufacturing a planar buried heterojunction laser Jun. 1, 1993
5171710 Method for photo annealing non-single crystalline semiconductor films Dec. 15, 1992
5122223 Graphoepitaxy using energy beams Jun. 16, 1992
5094977 Stress reduction in metal films by laser annealing Mar. 10, 1992
5077233 Method for recrystallizing specified portions of a non-crystalline semiconductor material to fabricate a semiconductor device therein Dec. 31, 1991
5008211 Method for forming FET with a super lattice channel Apr. 16, 1991
4992393 Method for producing semiconductor thin film by melt and recrystallization process Feb. 12, 1991
4988634 Method for forming FET with a super lattice channel Jan. 29, 1991
4963503 Method of manufacturing liquid crystal display device Oct. 16, 1990
4957880 Method for producing semiconductor device including a refractory metal pattern Sep. 18, 1990
4931353 Structure and method for selectively producing a conductive region on a substrate Jun. 5, 1990
4915980 Method for producing amorphous metal layer Apr. 10, 1990
4871690 Semiconductor structures utilizing semiconductor support means selectively pretreated with migratory defects Oct. 3, 1989
4870031 Method of manufacturing a semiconductor device Sep. 26, 1989
4843032 Process for producing a DFB laser with a diffraction grating superlattice Jun. 27, 1989
4837182 Method of producing sheets of crystalline material Jun. 6, 1989
4834809 Three dimensional semiconductor on insulator substrate May. 30, 1989
4822752 Process for producing single crystal semiconductor layer and semiconductor device produced by said process Apr. 18, 1989
4808546 SOI process for forming a thin film transistor using solid phase epitaxy Feb. 28, 1989
4764476 Method of making photoelectric conversion device Aug. 16, 1988
4755487 Method for making bipolar transistors using rapid thermal annealing Jul. 5, 1988
4706376 Method of making semiconductor photoelectric conversion device Nov. 17, 1987

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