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Class Information
Number: 148/DIG.53
Name: Metal treatment > Field effect transistors fets

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
6087205 Method of fabricating staggered thin film transistor with an improved ohmic contact structure Jul. 11, 2000
6087209 Formation of low resistance, ultra shallow LDD junctions employing a sub-surface, non-amorphous implant Jul. 11, 2000
6037195 Process of producing thin film transistor Mar. 14, 2000
5851602 Deposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistors Dec. 22, 1998
5589405 Method for fabricating VDMOS transistor with improved breakdown characteristics Dec. 31, 1996
5427976 Method of producing a semiconductor on insulating substrate, and a method of forming a transistor thereon Jun. 27, 1995
5411903 Self-aligned complementary HFETS May. 2, 1995
5330923 Manufacturing process for a micro MIS type FET Jul. 19, 1994
5298445 Method for fabricating a field effect transistor Mar. 29, 1994
5266506 Method of making substantially linear field-effect transistor Nov. 30, 1993
5238871 Method of manufacturing a semiconductor device Aug. 24, 1993
5219772 Method for making field effect devices with ultra-short gates Jun. 15, 1993
5213990 Method for forming a stacked semiconductor structure May. 25, 1993
5166091 Fabrication method in vertical integration Nov. 24, 1992
5158901 Field effect transistor having control and current electrodes positioned at a planar elevated surface and method of formation Oct. 27, 1992
5145796 Method for manufacturing a semiconductor apparatus Sep. 8, 1992
5130264 Method of making a thin film transistor Jul. 14, 1992
5116774 Heterojunction method and structure May. 26, 1992
5108937 Method of making a recessed gate MOSFET device structure Apr. 28, 1992
5093273 Method of manufacturing a semiconductor device Mar. 3, 1992
5032538 Semiconductor embedded layer technology utilizing selective epitaxial growth methods Jul. 16, 1991
5021361 Method for making a field effect transistor integrated with an opto-electronic device Jun. 4, 1991
5006477 Method of making a latch up free, high voltage, CMOS bulk process for sub-half micron devices Apr. 9, 1991
4975382 Method of making a self-aligned field-effect transistor by the use of a dummy-gate Dec. 4, 1990
4950618 Masking scheme for silicon dioxide mesa formation Aug. 21, 1990
4902641 Process for making an inverted silicon-on-insulator semiconductor device having a pedestal structure Feb. 20, 1990
4878956 Single crystal films of cubic group II fluorides on semiconductor compounds Nov. 7, 1989
4876212 Process for fabricating complimentary semiconductor devices having pedestal structures Oct. 24, 1989
4868137 Method of making insulated-gate field effect transistor Sep. 19, 1989
4833095 Method for buried channel field effect transistor for microwave and millimeter frequencies utilizing ion implantation May. 23, 1989
4784965 Source drain doping technique Nov. 15, 1988
4745082 Method of making a self-aligned MESFET using a substitutional gate with side walls May. 17, 1988
4728617 Method of fabricating a MOSFET with graded source and drain regions Mar. 1, 1988
4724220 Method for fabricating buried channel field-effect transistor for microwave and millimeter frequencies Feb. 9, 1988
4698653 Semiconductor devices controlled by depletion regions Oct. 6, 1987
4698652 FET with Fermi level pinning between channel and heavily doped semiconductor gate Oct. 6, 1987
4644637 Method of making an insulated-gate semiconductor device with improved shorting region Feb. 24, 1987
4601096 Method for fabricating buried channel field effect transistor for microwave and millimeter frequencies utilizing molecular beam epitaxy Jul. 22, 1986
4597159 Method of manufacturing SiO.sub.2 -Si interface for floating gate semiconductor device Jul. 1, 1986
4592130 Method of fabricating a CCD read only memory utilizing dual-level junction formation Jun. 3, 1986
4559694 Method of manufacturing a reference voltage generator device Dec. 24, 1985
4558508 Process of making dual well CMOS semiconductor structure with aligned field-dopings using single masking step Dec. 17, 1985
4554726 CMOS Integrated circuit technology utilizing dual implantation of slow and fast diffusing donor ions to form the n-well Nov. 26, 1985
4468851 Process for making a heterojunction source-drain insulated gate field-effect transistors utilizing diffusion to form the lattice Sep. 4, 1984
4459739 Thin film transistors Jul. 17, 1984
4459741 Method for producing VLSI complementary MOS field effect transistor circuits Jul. 17, 1984
4455740 Method of manufacturing a self-aligned U-MOS semiconductor device Jun. 26, 1984
4333224 Method of fabricating polysilicon/silicon junction field effect transistors Jun. 8, 1982
4333099 Use of silicide to bridge unwanted polycrystalline silicon P-N junction Jun. 1, 1982
4326330 Process for producing a self-aligned grid field-effect transistor Apr. 27, 1982

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