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Class Information
Number:
148/DIG.44
Name:
Metal treatment
> Edge diffusion under mask
Description:
Patents under this class:
Patent Number
Title Of Patent
Date Issued
5882981
Mesa isolation Refill Process for Silicon on Insulator Technology Using Flowage Oxides as the Refill Material
Mar. 16, 1999
5672528
Method for making semiconductor device having field limiting ring
Sep. 30, 1997
5650344
Method of making non-uniformly nitrided gate oxide
Jul. 22, 1997
5053345
Method of edge doping SOI islands
Oct. 1, 1991
5039623
Method of manufacturing a semiconductor device
Aug. 13, 1991
5028564
Edge doping processes for mesa structures in SOS and SOI devices
Jul. 2, 1991
4755479
Manufacturing method of insulated gate field effect transistor using reflowable sidewall spacers
Jul. 5, 1988
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