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Class Information
Number: 148/DIG.18
Name: Metal treatment > Compensation doping
Description:


Patents under this class:

Patent Number Title Of Patent Date Issued
5814546 Method for producing a bipolar semiconductor device having SiC-based epitaxial layer Sep. 29, 1998
5496744 Method of fabricating complementary poly emitter transistors Mar. 5, 1996
5409848 Angled lateral pocket implants on p-type semiconductor devices Apr. 25, 1995
5283203 Self-aligned contact process for complementary field-effect integrated circuits Feb. 1, 1994
5210043 Process for producing semiconductor device May. 11, 1993
5091335 MBE growth technology for high quality strained III-V layers Feb. 25, 1992
5047360 Method of manufacture thin film transistors Sep. 10, 1991
5024961 Blanket punchthrough and field-isolation implant for sub-micron N-channel CMOS devices Jun. 18, 1991
4987098 Method of producing a metal-oxide semiconductor device Jan. 22, 1991
4798794 Method for manufacturing dynamic memory cell Jan. 17, 1989
4692558 Counteraction of semiconductor impurity effects Sep. 8, 1987
4646427 Method of electrically adjusting the zener knee of a lateral polysilicon zener diode Mar. 3, 1987
4629514 Method of producing II-V compound semiconductors Dec. 16, 1986
4596068 Process for minimizing boron depletion in N-channel FET at the silicon-silicon oxide interface Jun. 24, 1986
4366338 Compensating semiconductor materials Dec. 28, 1982
4358891 Method of forming a metal semiconductor field effect transistor Nov. 16, 1982
4357183 Heteroepitaxy of germanium silicon on silicon utilizing alloying control Nov. 2, 1982
4321104 Photoetching method Mar. 23, 1982
4312046 Vertical fuse and method of fabrication Jan. 19, 1982
4310362 Method of making Schottky diode with an improved voltage behavior Jan. 12, 1982
4309811 Means and method of reducing the number of masks utilized in fabricating complex multilevel integrated circuits Jan. 12, 1982
4309224 Method for manufacturing a semiconductor device Jan. 5, 1982
4305760 Polysilicon-to-substrate contact processing Dec. 15, 1981
4301592 Method of fabricating semiconductor junction device employing separate metallization Nov. 24, 1981
4292730 Method of fabricating mesa bipolar memory cell utilizing epitaxial deposition, substrate removal and special metallization Oct. 6, 1981
4292728 Method for manufacturing semiconductor integrated circuits utilizing special contact formation Oct. 6, 1981
4287661 Method for making an improved polysilicon conductor structure utilizing reactive-ion etching and thermal oxidation Sep. 8, 1981
4286374 Large scale integrated circuit production Sep. 1, 1981
4283439 Method of manufacturing a semiconductor device by forming a tungsten silicide or molybdenum silicide electrode Aug. 11, 1981
4249968 Method of manufacturing a metal-insulator-semiconductor utilizing a multiple stage deposition of polycrystalline layers Feb. 10, 1981
4246693 Method of fabricating semiconductor device by bonding together silicon substrate and electrode or the like with aluminum Jan. 27, 1981
4188707 Semiconductor devices and method of manufacturing the same Feb. 19, 1980
4186410 Nonalloyed ohmic contacts to n-type Group III(a)-V(a) semiconductors Jan. 29, 1980
4155155 Method of manufacturing power semiconductors with pressed contacts May. 22, 1979
4106044 Field effect transistor having unsaturated characteristics Aug. 8, 1978
4096509 MNOS memory transistor having a redeposited silicon nitride gate dielectric Jun. 20, 1978
4074305 GaAs layers as contacts to thin film semiconductor layers Feb. 14, 1978
4064525 Negative-resistance semiconductor device Dec. 20, 1977
4011583 Ohmics contacts of germanium and palladium alloy from group III-V n-type semiconductors Mar. 8, 1977
3990097 Silicon solar energy cell having improved back contact and method forming same Nov. 2, 1976
3975818 Method of forming closely spaced electrodes onto semiconductor device Aug. 24, 1976
3958265 Semiconductor light-emitting diode and method for producing same May. 18, 1976
3941624 Sn-Doped group III(a)-v(a) Ga-containing layers grown by molecular beam epitaxy Mar. 2, 1976
3931673 Aluminum for bonding Si-Ge alloys to graphite Jan. 13, 1976



 
 
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