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Class Information
Number: 148/DIG.17
Name: Metal treatment > Clean surfaces
Description:










Patents under this class:
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Patent Number Title Of Patent Date Issued
5925574 Method of producing a bipolar transistor Jul. 20, 1999
5637512 Method for fabricating a thin film semiconductor device Jun. 10, 1997
5607878 Contact plug forming method Mar. 4, 1997
5605867 Method of manufacturing insulating film of semiconductor device and apparatus for carrying out the same Feb. 25, 1997
5563100 Fabrication method of semiconductor device with refractory metal silicide formation by removing native oxide in hydrogen Oct. 8, 1996
5500393 Method for fabricating a schottky junction Mar. 19, 1996
5492854 Method of manufacturing semiconductor device Feb. 20, 1996
5492860 Method for growing compound semiconductor layers Feb. 20, 1996
5489553 HF vapor surface treatment for the 03 teos gap filling deposition Feb. 6, 1996
5484748 Method for storage of silicon wafer Jan. 16, 1996
5455198 Method for fabricating tungsten contact plug Oct. 3, 1995
5445999 Advanced technique to improve the bonding arrangement on silicon surfaces to promote uniform nitridation Aug. 29, 1995
5413954 Method of making a silicon-based device comprising surface plasma cleaning May. 9, 1995
5409544 Method of controlling adhesion of fine particles to an object in liquid Apr. 25, 1995
5387545 Impurity diffusion method Feb. 7, 1995
5382544 Manufacturing method of a semiconductor device utilizing thin metal film Jan. 17, 1995
5372953 Method of manufacturing a bipolar transistor included in an integrated circuit having no field oxide film between a p-type region and its electrode Dec. 13, 1994
5352636 In situ method for cleaning silicon surface and forming layer thereon in same chamber Oct. 4, 1994
5348913 Methods for encapsulating electronic devices Sep. 20, 1994
5344793 Formation of silicided junctions in deep sub-micron MOSFETs by defect enhanced CoSi2 formation Sep. 6, 1994
5332692 Method of manufacturing a semiconductor device having a polycide structure Jul. 26, 1994
5330577 Semiconductor fabrication equipment Jul. 19, 1994
5328867 Peroxide clean before buried contact polysilicon deposition Jul. 12, 1994
5328558 Method for etching an SiO.sub.2 film Jul. 12, 1994
5312780 Integrated circuit fabrication method May. 17, 1994
5310711 Method of forming doped shallow electrical junctions May. 10, 1994
5310697 Method for fabricating an AlGaInP semiconductor light emitting device including the step of removing an oxide film by irradiation with plasma beams and an As or P molecular beam May. 10, 1994
5294572 Method and apparatus for depositing a layer on a substrate Mar. 15, 1994
5294568 Method of selective etching native oxide Mar. 15, 1994
5275687 Process for removing surface contaminants from III-V semiconductors Jan. 4, 1994
5244144 Method for brazing aluminum materials Sep. 14, 1993
5238871 Method of manufacturing a semiconductor device Aug. 24, 1993
5238878 Film forming method by spin coating in production of semiconductor device Aug. 24, 1993
5238849 Method of fabricating semiconductor device Aug. 24, 1993
5236544 Process for growing crystal Aug. 17, 1993
5232872 Method for manufacturing semiconductor device Aug. 3, 1993
5198071 Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer Mar. 30, 1993
5196375 Method for manufacturing bonded semiconductor body Mar. 23, 1993
5194397 Method for controlling interfacial oxide at a polycrystalline/monocrystalline silicon interface Mar. 16, 1993
5188987 Method of manufacturing a semiconductor device using a polishing step prior to a selective vapor growth step Feb. 23, 1993
5151135 Method for cleaning surfaces using UV lasers Sep. 29, 1992
5122482 Method for treating surface of silicon Jun. 16, 1992
5120394 Epitaxial growth process and growing apparatus Jun. 9, 1992
5104828 Method of planarizing a dielectric formed over a semiconductor substrate Apr. 14, 1992
5100839 Method of manufacturing wafers used for electronic device Mar. 31, 1992
5089441 Low-temperature in-situ dry cleaning process for semiconductor wafers Feb. 18, 1992
5087590 Method of manufacturing semiconductor devices Feb. 11, 1992
5078801 Post-polish cleaning of oxidized substrates by reverse colloidation Jan. 7, 1992
5037774 Process for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous silicon Aug. 6, 1991
5028560 Method for forming a thin layer on a semiconductor substrate Jul. 2, 1991

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