| Patent Number |
Title Of Patent |
Date Issued |
| 5925574 |
Method of producing a bipolar transistor |
Jul. 20, 1999 |
| 5637512 |
Method for fabricating a thin film semiconductor device |
Jun. 10, 1997 |
| 5607878 |
Contact plug forming method |
Mar. 4, 1997 |
| 5605867 |
Method of manufacturing insulating film of semiconductor device and apparatus for carrying out the same |
Feb. 25, 1997 |
| 5563100 |
Fabrication method of semiconductor device with refractory metal silicide formation by removing native oxide in hydrogen |
Oct. 8, 1996 |
| 5500393 |
Method for fabricating a schottky junction |
Mar. 19, 1996 |
| 5492854 |
Method of manufacturing semiconductor device |
Feb. 20, 1996 |
| 5492860 |
Method for growing compound semiconductor layers |
Feb. 20, 1996 |
| 5489553 |
HF vapor surface treatment for the 03 teos gap filling deposition |
Feb. 6, 1996 |
| 5484748 |
Method for storage of silicon wafer |
Jan. 16, 1996 |
| 5455198 |
Method for fabricating tungsten contact plug |
Oct. 3, 1995 |
| 5445999 |
Advanced technique to improve the bonding arrangement on silicon surfaces to promote uniform nitridation |
Aug. 29, 1995 |
| 5413954 |
Method of making a silicon-based device comprising surface plasma cleaning |
May. 9, 1995 |
| 5409544 |
Method of controlling adhesion of fine particles to an object in liquid |
Apr. 25, 1995 |
| 5387545 |
Impurity diffusion method |
Feb. 7, 1995 |
| 5382544 |
Manufacturing method of a semiconductor device utilizing thin metal film |
Jan. 17, 1995 |
| 5372953 |
Method of manufacturing a bipolar transistor included in an integrated circuit having no field oxide film between a p-type region and its electrode |
Dec. 13, 1994 |
| 5352636 |
In situ method for cleaning silicon surface and forming layer thereon in same chamber |
Oct. 4, 1994 |
| 5348913 |
Methods for encapsulating electronic devices |
Sep. 20, 1994 |
| 5344793 |
Formation of silicided junctions in deep sub-micron MOSFETs by defect enhanced CoSi2 formation |
Sep. 6, 1994 |
| 5332692 |
Method of manufacturing a semiconductor device having a polycide structure |
Jul. 26, 1994 |
| 5330577 |
Semiconductor fabrication equipment |
Jul. 19, 1994 |
| 5328867 |
Peroxide clean before buried contact polysilicon deposition |
Jul. 12, 1994 |
| 5328558 |
Method for etching an SiO.sub.2 film |
Jul. 12, 1994 |
| 5312780 |
Integrated circuit fabrication method |
May. 17, 1994 |
| 5310711 |
Method of forming doped shallow electrical junctions |
May. 10, 1994 |
| 5310697 |
Method for fabricating an AlGaInP semiconductor light emitting device including the step of removing an oxide film by irradiation with plasma beams and an As or P molecular beam |
May. 10, 1994 |
| 5294572 |
Method and apparatus for depositing a layer on a substrate |
Mar. 15, 1994 |
| 5294568 |
Method of selective etching native oxide |
Mar. 15, 1994 |
| 5275687 |
Process for removing surface contaminants from III-V semiconductors |
Jan. 4, 1994 |
| 5244144 |
Method for brazing aluminum materials |
Sep. 14, 1993 |
| 5238871 |
Method of manufacturing a semiconductor device |
Aug. 24, 1993 |
| 5238878 |
Film forming method by spin coating in production of semiconductor device |
Aug. 24, 1993 |
| 5238849 |
Method of fabricating semiconductor device |
Aug. 24, 1993 |
| 5236544 |
Process for growing crystal |
Aug. 17, 1993 |
| 5232872 |
Method for manufacturing semiconductor device |
Aug. 3, 1993 |
| 5198071 |
Process for inhibiting slip and microcracking while forming epitaxial layer on semiconductor wafer |
Mar. 30, 1993 |
| 5196375 |
Method for manufacturing bonded semiconductor body |
Mar. 23, 1993 |
| 5194397 |
Method for controlling interfacial oxide at a polycrystalline/monocrystalline silicon interface |
Mar. 16, 1993 |
| 5188987 |
Method of manufacturing a semiconductor device using a polishing step prior to a selective vapor growth step |
Feb. 23, 1993 |
| 5151135 |
Method for cleaning surfaces using UV lasers |
Sep. 29, 1992 |
| 5122482 |
Method for treating surface of silicon |
Jun. 16, 1992 |
| 5120394 |
Epitaxial growth process and growing apparatus |
Jun. 9, 1992 |
| 5104828 |
Method of planarizing a dielectric formed over a semiconductor substrate |
Apr. 14, 1992 |
| 5100839 |
Method of manufacturing wafers used for electronic device |
Mar. 31, 1992 |
| 5089441 |
Low-temperature in-situ dry cleaning process for semiconductor wafers |
Feb. 18, 1992 |
| 5087590 |
Method of manufacturing semiconductor devices |
Feb. 11, 1992 |
| 5078801 |
Post-polish cleaning of oxidized substrates by reverse colloidation |
Jan. 7, 1992 |
| 5037774 |
Process for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous silicon |
Aug. 6, 1991 |
| 5028560 |
Method for forming a thin layer on a semiconductor substrate |
Jul. 2, 1991 |
