| Patent Number |
Title Of Patent |
Date Issued |
| 7030033 |
Method for manufacturing circuit devices |
Apr. 18, 2006 |
| 6432317 |
Method to produce masking |
Aug. 13, 2002 |
| 6171956 |
Method for improving the thermal conductivity of metal lines in integrated circuits |
Jan. 9, 2001 |
| 5963788 |
Method for integrating microelectromechanical devices with electronic circuitry |
Oct. 5, 1999 |
| 5766968 |
Micro mask comprising agglomerated material |
Jun. 16, 1998 |
| 5688703 |
Method of manufacturing a gate structure for a metal semiconductor field effect transistor |
Nov. 18, 1997 |
| 5633183 |
FET having minimized parasitic gate capacitance |
May. 27, 1997 |
| 5576227 |
Process for fabricating a recessed gate MOS device |
Nov. 19, 1996 |
| 5527726 |
Self-aligned thin-film transistor constructed using lift-off technique |
Jun. 18, 1996 |
| 5510294 |
Method of forming vias for multilevel metallization |
Apr. 23, 1996 |
| 5478766 |
Process for formation of thin film transistor liquid crystal display |
Dec. 26, 1995 |
| 5474950 |
Method for manufacturing a capacitor in a semiconductor device |
Dec. 12, 1995 |
| 5466626 |
Micro mask comprising agglomerated material |
Nov. 14, 1995 |
| 5466626 |
Micro mask comprising agglomerated material |
Nov. 14, 1995 |
| 5462887 |
Process for making a matrix of thin layer transistors with memory capacitors |
Oct. 31, 1995 |
| 5462882 |
Masked radiant anneal diffusion method |
Oct. 31, 1995 |
| 5438006 |
Method of fabricating gate stack having a reduced height |
Aug. 1, 1995 |
| 5436182 |
Method of manufacturing thin film transistor panel |
Jul. 25, 1995 |
| 5427983 |
Process for corrosion free multi-layer metal conductors |
Jun. 27, 1995 |
| 5422312 |
Method for forming metal via |
Jun. 6, 1995 |
| 5399526 |
Method of manufacturing semiconductor device by forming barrier metal layer between substrate and wiring layer |
Mar. 21, 1995 |
| 5382544 |
Manufacturing method of a semiconductor device utilizing thin metal film |
Jan. 17, 1995 |
| 5362682 |
Method of producing sheets of crystalline material and devices made therefrom |
Nov. 8, 1994 |
| 5340773 |
Method of fabricating a semiconductor device |
Aug. 23, 1994 |
| 5308440 |
Method of making semiconductor device with air-bridge interconnection |
May. 3, 1994 |
| 5306653 |
Method of making thin film transistors |
Apr. 26, 1994 |
| 5300462 |
Method for forming a sputtered metal film |
Apr. 5, 1994 |
| 5300446 |
Method of making staggered gate MOSTFT |
Apr. 5, 1994 |
| 5294565 |
Crystal growth method of III - V compound semiconductor |
Mar. 15, 1994 |
| 5250452 |
Deposition of germanium thin films on silicon dioxide employing interposed polysilicon layer |
Oct. 5, 1993 |
| 5188974 |
Method of manufacturing semiconductor device |
Feb. 23, 1993 |
| 5185293 |
Method of forming and aligning patterns in deposted overlaying on GaAs |
Feb. 9, 1993 |
| 5173438 |
Method of performing a field implant subsequent to field oxide fabrication by utilizing selective tungsten deposition to produce encroachment-free isolation |
Dec. 22, 1992 |
| 5143856 |
Method of manufacturing MES FET |
Sep. 1, 1992 |
| 5123847 |
Method of manufacturing flat panel backplanes, display transistors |
Jun. 23, 1992 |
| 5114876 |
Selective epitaxy using the gild process |
May. 19, 1992 |
| 5112763 |
Process for forming a Schottky barrier gate |
May. 12, 1992 |
| 5110760 |
Method of nanometer lithography |
May. 5, 1992 |
| 5093280 |
Refractory metal ohmic contacts and method |
Mar. 3, 1992 |
| 5091337 |
Method of manufacturing amorphous-silicon thin-film transistors |
Feb. 25, 1992 |
| 5091342 |
Multilevel resist plated transfer layer process for fine line lithography |
Feb. 25, 1992 |
| 5077236 |
Method of making a pattern of tungsten interconnection |
Dec. 31, 1991 |
| 5070029 |
Semiconductor process using selective deposition |
Dec. 3, 1991 |
| 5047360 |
Method of manufacture thin film transistors |
Sep. 10, 1991 |
| 5030583 |
Method of making single crystal semiconductor substrate articles and semiconductor device |
Jul. 9, 1991 |
| 5028554 |
Process of fabricating an MIS FET |
Jul. 2, 1991 |
| 5024971 |
Method for patterning submicron openings using an image reversal layer of material |
Jun. 18, 1991 |
| 5013682 |
Method for selective epitaxy using a WS.sub.I mask |
May. 7, 1991 |
| 5010030 |
Semiconductor process using selective deposition |
Apr. 23, 1991 |
| 5008218 |
Method for fabricating a thin film transistor using a silicide as an etch mask |
Apr. 16, 1991 |
