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Class Information
Number: 134/902
Name: Cleaning and liquid contact with solids > Semiconductor wafer
Description: Apparatus including means to contact a semiconductor wafer with a liquid.


Patents under this class:

Patent Number Title Of Patent Date Issued
6116254 Cleaning method and system of semiconductor substrate and production method of cleaning solution Sep. 12, 2000
6108928 Vacuum dryer of drying semiconductor device using the same Aug. 29, 2000
6109278 Liquid treatment method and apparatus Aug. 29, 2000
6105592 Gas intake assembly for a wafer processing system Aug. 22, 2000
6106635 Washing method and washing apparatus Aug. 22, 2000
6101737 Apparatus and method for drying a semiconductor member Aug. 15, 2000
6102057 Lifting and rinsing a wafer Aug. 15, 2000
6098641 Motor drive assembly for a semiconductor wafer processing system Aug. 8, 2000
6098643 Bath system for semiconductor wafers with obliquely mounted transducers Aug. 8, 2000
6099686 Wet processing system Aug. 8, 2000
6095167 Rinse/dry apparatus including a chamber with a moveable side wall Aug. 1, 2000
6092538 Method for using high density compressed liquefied gases in cleaning applications Jul. 25, 2000
6092539 In-situ cleaning apparatuses for wafers used in integrated circuit devices and methods of cleaning using the same Jul. 25, 2000
6092542 Cleaning apparatus Jul. 25, 2000
6092937 Linear developer Jul. 25, 2000
6093254 Method of HF-HF Cleaning Jul. 25, 2000
6090220 Method for transferring a wafer after removing a washing solution Jul. 18, 2000
6085762 Apparatus and method for providing pulsed fluids Jul. 11, 2000
6085764 Cleaning apparatus and method Jul. 11, 2000
6086269 Method and apparatus for applying a substance to a surface Jul. 11, 2000
6082377 Vertical wafer cleaning and drying system Jul. 4, 2000
6082381 Treatment apparatus Jul. 4, 2000
6079428 Apparatus for removing coated film from peripheral portion of substrate Jun. 27, 2000
6077359 Procedure and device for the chemical and electrolytic treatment of printed circuit boards and conductor films Jun. 20, 2000
6074515 Apparatus for processing substrates Jun. 13, 2000
6070601 Jet-cleaning device for developing station Jun. 6, 2000
6067728 Supercritical phase wafer drying/cleaning system May. 30, 2000
6068002 Cleaning and drying apparatus, wafer processing system and wafer processing method May. 30, 2000
6068137 Semiconductor wafer carrier May. 30, 2000
6062240 Treatment device May. 16, 2000
6062241 Substrate conveying device and substrate conveying method May. 16, 2000
6063191 Apparatus for the coating of flat-form substrates especially of printed circuit boards May. 16, 2000
6063208 Reticle cleaning without damaging pellicle May. 16, 2000
6063301 Crystal display processing method and crystal wafer manufacturing method May. 16, 2000
6058945 Cleaning methods of porous surface and semiconductor surface May. 9, 2000
6058947 Contamination monitoring system May. 9, 2000
6058950 Pressurized liquid-supply and straightening mechanism in a water-flow washing apparatus May. 9, 2000
6059889 Method for processing a substrate using a system having a roller with treading May. 9, 2000
6059891 Apparatus and method for washing substrate May. 9, 2000
6059893 Method for cleaning a semiconductor wafer May. 9, 2000
6055995 Semiconductor manufacture apparatus May. 2, 2000
6056828 Substrate conveying device and substrate conveying method May. 2, 2000
6053984 Method and apparatus for decomposition of silicon oxide layers for impurity analysis of silicon wafers Apr. 25, 2000
6049996 Device and fluid separator for processing spherical shaped devices Apr. 18, 2000
6050275 Apparatus for and method of cleaning objects to be processed Apr. 18, 2000
6050279 Apparatus and method for immersing an object in a liquid such that a lower surface of the object does not touch a bottom surface of a container holding the liquid Apr. 18, 2000
6047717 Mandrel device and method for hard disks Apr. 11, 2000
6048405 Megasonic cleaning methods and apparatus Apr. 11, 2000
6048409 Washing apparatus and washing method Apr. 11, 2000
6045621 Method for cleaning objects using a fluid charge Apr. 4, 2000



 
 
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