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Class Information
Number: 134/902
Name: Cleaning and liquid contact with solids > Semiconductor wafer
Description: Apparatus including means to contact a semiconductor wafer with a liquid.


Patents under this class:
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Patent Number Title Of Patent Date Issued
6450180 Method and apparatus for the laser processing of substrate surfaces Sep. 17, 2002
6450184 Apparatus for measuring cavitation energy profiles Sep. 17, 2002
6451116 Apparatus for electroless plating a contact pad Sep. 17, 2002
6451124 Process for the chemical treatment of semiconductor wafers Sep. 17, 2002
6446354 Handler system for cutting a semiconductor package device Sep. 10, 2002
6446643 Micro-environment chamber and system for rinsing and drying a semiconductor workpiece Sep. 10, 2002
6446644 Chemical solutions system for processing semiconductor materials Sep. 10, 2002
6446645 Dip cleaning system for a substrate, system for evaluating the amount of particles and method of evaluating the amount of particles adhering to a substrate Sep. 10, 2002
6446646 Substrate processing apparatus Sep. 10, 2002
6446647 Cassette holder for cleaning equipment Sep. 10, 2002
6443168 Plate-like specimen fluid-treating apparatus and plate-like specimen fluid-treating method Sep. 3, 2002
6443171 Exhaust apparatus Sep. 3, 2002
6443814 Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing Sep. 3, 2002
6438781 Washer for cleaning substrates Aug. 27, 2002
6439245 Method for transferring wafers from a conveyor system to a wafer processing station Aug. 27, 2002
6439247 Surface treatment of semiconductor substrates Aug. 27, 2002
6439824 Automated semiconductor immersion processing system Aug. 27, 2002
6440224 Hydrofluoric acid generating composition and method of treating surfaces Aug. 27, 2002
6440320 Substrate processing method and apparatus Aug. 27, 2002
6434775 Nozzle for rinsing the backside of a semiconductor wafer Aug. 20, 2002
6435197 Method of cleaning a semiconductor fabricating apparatus Aug. 20, 2002
6435199 Treatment apparatus Aug. 20, 2002
6430840 Method of and apparatus for drying a wafer using isopropyl alcohol Aug. 13, 2002
6431183 Method for treating semiconductor substrates Aug. 13, 2002
6431184 Apparatus and method for washing substrate Aug. 13, 2002
6431185 Apparatus and method for cleaning a semiconductor substrate Aug. 13, 2002
6431190 Fluid processing apparatus Aug. 13, 2002
6431948 Wafer cleaning apparatus Aug. 13, 2002
6432214 Cleaning apparatus Aug. 13, 2002
6432218 Multi-step flow cleaning method and multi-step flow cleaning apparatus Aug. 13, 2002
6427359 Systems and methods for processing workpieces Aug. 6, 2002
6427705 Simplified method for cleaning silicon wafers after application of laser marks Aug. 6, 2002
6427747 Apparatus and method of separating sample and substrate fabrication method Aug. 6, 2002
6425956 Process for removing chemical mechanical polishing residual slurry Jul. 30, 2002
6422247 Pod and method of cleaning it Jul. 23, 2002
6423146 Method for cleaning a semiconductor substrate Jul. 23, 2002
6423147 Method of cleaning a wafer Jul. 23, 2002
6423148 Substrate-cleaning method and substrate-cleaning solution Jul. 23, 2002
6423149 Apparatus and method for gradient cleaning of semiconductor wafers Jul. 23, 2002
6418945 Dual cassette centrifugal processor Jul. 16, 2002
6415803 Method and apparatus for semiconductor wafer cleaning with reuse of chemicals Jul. 9, 2002
6415804 Bowl for processing semiconductor wafers Jul. 9, 2002
6416391 Method of demounting silicon wafers after polishing Jul. 9, 2002
6416586 Cleaning method Jul. 9, 2002
6416587 Apparatus and method for cleaning wafer Jul. 9, 2002
6412500 Device and method for cleaning semiconductor wafers Jul. 2, 2002
6412501 Drying apparatus and drying method Jul. 2, 2002
6412502 Wafer container cleaning system Jul. 2, 2002
6412503 Magnetically coupled substrate roller Jul. 2, 2002
6412504 Rinsing tank with ultra clean liquid Jul. 2, 2002

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