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Class Information
Number: 134/902
Name: Cleaning and liquid contact with solids > Semiconductor wafer
Description: Apparatus including means to contact a semiconductor wafer with a liquid.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6450180 |
Method and apparatus for the laser processing of substrate surfaces |
Sep. 17, 2002 |
| 6450184 |
Apparatus for measuring cavitation energy profiles |
Sep. 17, 2002 |
| 6451116 |
Apparatus for electroless plating a contact pad |
Sep. 17, 2002 |
| 6451124 |
Process for the chemical treatment of semiconductor wafers |
Sep. 17, 2002 |
| 6446354 |
Handler system for cutting a semiconductor package device |
Sep. 10, 2002 |
| 6446643 |
Micro-environment chamber and system for rinsing and drying a semiconductor workpiece |
Sep. 10, 2002 |
| 6446644 |
Chemical solutions system for processing semiconductor materials |
Sep. 10, 2002 |
| 6446645 |
Dip cleaning system for a substrate, system for evaluating the amount of particles and method of evaluating the amount of particles adhering to a substrate |
Sep. 10, 2002 |
| 6446646 |
Substrate processing apparatus |
Sep. 10, 2002 |
| 6446647 |
Cassette holder for cleaning equipment |
Sep. 10, 2002 |
| 6443168 |
Plate-like specimen fluid-treating apparatus and plate-like specimen fluid-treating method |
Sep. 3, 2002 |
| 6443171 |
Exhaust apparatus |
Sep. 3, 2002 |
| 6443814 |
Method and chemistry for cleaning of oxidized copper during chemical mechanical polishing |
Sep. 3, 2002 |
| 6438781 |
Washer for cleaning substrates |
Aug. 27, 2002 |
| 6439245 |
Method for transferring wafers from a conveyor system to a wafer processing station |
Aug. 27, 2002 |
| 6439247 |
Surface treatment of semiconductor substrates |
Aug. 27, 2002 |
| 6439824 |
Automated semiconductor immersion processing system |
Aug. 27, 2002 |
| 6440224 |
Hydrofluoric acid generating composition and method of treating surfaces |
Aug. 27, 2002 |
| 6440320 |
Substrate processing method and apparatus |
Aug. 27, 2002 |
| 6434775 |
Nozzle for rinsing the backside of a semiconductor wafer |
Aug. 20, 2002 |
| 6435197 |
Method of cleaning a semiconductor fabricating apparatus |
Aug. 20, 2002 |
| 6435199 |
Treatment apparatus |
Aug. 20, 2002 |
| 6430840 |
Method of and apparatus for drying a wafer using isopropyl alcohol |
Aug. 13, 2002 |
| 6431183 |
Method for treating semiconductor substrates |
Aug. 13, 2002 |
| 6431184 |
Apparatus and method for washing substrate |
Aug. 13, 2002 |
| 6431185 |
Apparatus and method for cleaning a semiconductor substrate |
Aug. 13, 2002 |
| 6431190 |
Fluid processing apparatus |
Aug. 13, 2002 |
| 6431948 |
Wafer cleaning apparatus |
Aug. 13, 2002 |
| 6432214 |
Cleaning apparatus |
Aug. 13, 2002 |
| 6432218 |
Multi-step flow cleaning method and multi-step flow cleaning apparatus |
Aug. 13, 2002 |
| 6427359 |
Systems and methods for processing workpieces |
Aug. 6, 2002 |
| 6427705 |
Simplified method for cleaning silicon wafers after application of laser marks |
Aug. 6, 2002 |
| 6427747 |
Apparatus and method of separating sample and substrate fabrication method |
Aug. 6, 2002 |
| 6425956 |
Process for removing chemical mechanical polishing residual slurry |
Jul. 30, 2002 |
| 6422247 |
Pod and method of cleaning it |
Jul. 23, 2002 |
| 6423146 |
Method for cleaning a semiconductor substrate |
Jul. 23, 2002 |
| 6423147 |
Method of cleaning a wafer |
Jul. 23, 2002 |
| 6423148 |
Substrate-cleaning method and substrate-cleaning solution |
Jul. 23, 2002 |
| 6423149 |
Apparatus and method for gradient cleaning of semiconductor wafers |
Jul. 23, 2002 |
| 6418945 |
Dual cassette centrifugal processor |
Jul. 16, 2002 |
| 6415803 |
Method and apparatus for semiconductor wafer cleaning with reuse of chemicals |
Jul. 9, 2002 |
| 6415804 |
Bowl for processing semiconductor wafers |
Jul. 9, 2002 |
| 6416391 |
Method of demounting silicon wafers after polishing |
Jul. 9, 2002 |
| 6416586 |
Cleaning method |
Jul. 9, 2002 |
| 6416587 |
Apparatus and method for cleaning wafer |
Jul. 9, 2002 |
| 6412500 |
Device and method for cleaning semiconductor wafers |
Jul. 2, 2002 |
| 6412501 |
Drying apparatus and drying method |
Jul. 2, 2002 |
| 6412502 |
Wafer container cleaning system |
Jul. 2, 2002 |
| 6412503 |
Magnetically coupled substrate roller |
Jul. 2, 2002 |
| 6412504 |
Rinsing tank with ultra clean liquid |
Jul. 2, 2002 |
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