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Class Information
Number: 134/902
Name: Cleaning and liquid contact with solids > Semiconductor wafer
Description: Apparatus including means to contact a semiconductor wafer with a liquid.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6536452 |
Processing apparatus and processing method |
Mar. 25, 2003 |
| 6536454 |
Device for treating a disc-shaped object |
Mar. 25, 2003 |
| 6536460 |
Process line purge system and method |
Mar. 25, 2003 |
| 6537380 |
Fluorinated solvent compositions containing ozone |
Mar. 25, 2003 |
| 6537381 |
Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing |
Mar. 25, 2003 |
| 6537915 |
Methods of treating surfaces of substrates |
Mar. 25, 2003 |
| 6532974 |
Process tank with pressurized mist generation |
Mar. 18, 2003 |
| 6532975 |
Substrate processing apparatus and substrate processing method |
Mar. 18, 2003 |
| 6532976 |
Semiconductor wafer cleaning apparatus |
Mar. 18, 2003 |
| 6533872 |
Method and arrangement for drying substrates after treatment in a liquid |
Mar. 18, 2003 |
| 6530113 |
Apparatus for selective removal of material from wafer alignment marks |
Mar. 11, 2003 |
| 6530381 |
Process for the wet-chemical surface treatment of a semiconductor wafer |
Mar. 11, 2003 |
| 6530385 |
Apparatus and method for wet cleaning or etching a flat substrate |
Mar. 11, 2003 |
| 6530388 |
Volume efficient cleaning systems |
Mar. 11, 2003 |
| 6531401 |
Method of cleaning a substrate surface using a frozen material |
Mar. 11, 2003 |
| 6526995 |
Brushless multipass silicon wafer cleaning process for post chemical mechanical polishing using immersion |
Mar. 4, 2003 |
| 6526996 |
Dry clean method instead of traditional wet clean after metal etch |
Mar. 4, 2003 |
| 6526997 |
Dry cleaning method for the manufacture of integrated circuits |
Mar. 4, 2003 |
| 6527870 |
Wafer cleaning module and method for cleaning the surface of a substrate |
Mar. 4, 2003 |
| 6527968 |
Two-stage self-cleaning silicon etch process |
Mar. 4, 2003 |
| 6523210 |
Surface charge controlling apparatus for wafer cleaning |
Feb. 25, 2003 |
| 6523552 |
Facility for treating objects in a process tank |
Feb. 25, 2003 |
| 6523553 |
Wafer edge cleaning method and apparatus |
Feb. 25, 2003 |
| 6523557 |
Megasonic bath |
Feb. 25, 2003 |
| 6524394 |
Dry ice cleaning method and dry ice cleaning apparatus |
Feb. 25, 2003 |
| 6520191 |
Carrier for cleaning silicon wafers |
Feb. 18, 2003 |
| 6521049 |
Method for reducing gaseous species of contamination in wet processes |
Feb. 18, 2003 |
| 6516815 |
Edge bead removal/spin rinse dry (EBR/SRD) module |
Feb. 11, 2003 |
| 6516816 |
Spin-rinse-dryer |
Feb. 11, 2003 |
| 6517641 |
Apparatus and process for collecting trace metals from wafers |
Feb. 11, 2003 |
| 6513538 |
Method of removing contaminants from integrated circuit substrates using cleaning solutions |
Feb. 4, 2003 |
| 6514352 |
Cleaning method using an oxidizing agent, chelating agent and fluorine compound |
Feb. 4, 2003 |
| 6514355 |
Method and apparatus for recovery of semiconductor wafers from a chemical tank |
Feb. 4, 2003 |
| RE37972 |
Manufacture of high precision electronic components with ultra-high purity liquids |
Feb. 4, 2003 |
| 6510859 |
Apparatus and method for cleaning and drying object |
Jan. 28, 2003 |
| 6508258 |
Method and apparatus for cleaning flat workpieces within a semiconductor manufacturing system |
Jan. 21, 2003 |
| 6508259 |
Inverted pressure vessel with horizontal through loading |
Jan. 21, 2003 |
| 6505634 |
Semiconductor wafer cleaning apparatus |
Jan. 14, 2003 |
| 6505635 |
Lifting and rinsing a wafer |
Jan. 14, 2003 |
| 6505636 |
Apparatus for wafer carrier in-process clean and rinse |
Jan. 14, 2003 |
| 6506260 |
Method for cleaning photovoltaic module and cleaning apparatus |
Jan. 14, 2003 |
| 6503333 |
Method for cleaning semiconductor wafers with ozone-containing solvent |
Jan. 7, 2003 |
| 6503335 |
Centrifuge and method for centrifuging a semiconductor wafer |
Jan. 7, 2003 |
| 6499229 |
Vacuum processing apparatus |
Dec. 31, 2002 |
| 6500274 |
Apparatus and method for wet cleaning wafers without ammonia vapor damage |
Dec. 31, 2002 |
| 6497055 |
System and method for controlling a vapor dryer process |
Dec. 24, 2002 |
| 6497239 |
Inverted pressure vessel with shielded closure mechanism |
Dec. 24, 2002 |
| 6497240 |
Ultrasound cleaning device and resist-stripping device |
Dec. 24, 2002 |
| 6497241 |
Hollow core spindle and spin, rinse, and dry module including the same |
Dec. 24, 2002 |
| 6497768 |
Process for treating a workpiece with hydrofluoric acid and ozone |
Dec. 24, 2002 |
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