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Class Information
Number: 134/902
Name: Cleaning and liquid contact with solids > Semiconductor wafer
Description: Apparatus including means to contact a semiconductor wafer with a liquid.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7435396 |
High-pressure processing apparatus and high-pressure processing method |
Oct. 14, 2008 |
| 7435302 |
Surface treatment apparatus and method for manufacturing liquid crystal display device |
Oct. 14, 2008 |
| 7435301 |
Cleaning solution of silicon germanium layer and cleaning method using the same |
Oct. 14, 2008 |
| 7431040 |
Method and apparatus for dispensing a rinse solution on a substrate |
Oct. 7, 2008 |
| 7431038 |
Wet processing device and wet processing method |
Oct. 7, 2008 |
| 7428907 |
Substrate processing apparatus |
Sep. 30, 2008 |
| 7427168 |
Developing method and developing unit |
Sep. 23, 2008 |
| 7422681 |
Substrate treating apparatus |
Sep. 9, 2008 |
| 7422641 |
Substrate cleaning apparatus and substrate cleaning method |
Sep. 9, 2008 |
| 7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure |
Sep. 9, 2008 |
| 7422024 |
Ultrasonic shower cleaning apparatus of double-side cleaning type |
Sep. 9, 2008 |
| 7419614 |
Method of etching and cleaning objects |
Sep. 2, 2008 |
| 7418970 |
Substrate processing apparatus for drying substrate |
Sep. 2, 2008 |
| 7417018 |
Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion |
Aug. 26, 2008 |
| 7416611 |
Process and apparatus for treating a workpiece with gases |
Aug. 26, 2008 |
| 7415985 |
Substrate cleaning and drying apparatus |
Aug. 26, 2008 |
| 7412983 |
Pattern forming method and apparatus, and device fabrication method and device |
Aug. 19, 2008 |
| 7412982 |
Cleaning probe and megasonic cleaning apparatus having the same |
Aug. 19, 2008 |
| 7412981 |
Liquid processing apparatus and method |
Aug. 19, 2008 |
| 7410545 |
Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate |
Aug. 12, 2008 |
| 7410543 |
Substrate processing method |
Aug. 12, 2008 |
| 7406972 |
Substrate proximity processing structures |
Aug. 5, 2008 |
| 7404863 |
Methods of thinning a silicon wafer using HF and ozone |
Jul. 29, 2008 |
| 7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces |
Jul. 22, 2008 |
| 7396416 |
Substrate cleaning device |
Jul. 8, 2008 |
| 7395827 |
Apparatus to produce acoustic cavitation in a liquid insonification medium |
Jul. 8, 2008 |
| 7395611 |
System processing a substrate using dynamic liquid meniscus |
Jul. 8, 2008 |
| 7392815 |
Chamber for wafer cleaning and method for making the same |
Jul. 1, 2008 |
| 7392812 |
Substrate processing apparatus and substrate transporting device mounted thereto |
Jul. 1, 2008 |
| 7389783 |
Proximity meniscus manifold |
Jun. 24, 2008 |
| 7387689 |
Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
Jun. 17, 2008 |
| 7387132 |
Apparatus for treating wafer |
Jun. 17, 2008 |
| 7386944 |
Method and apparatus for drying a wafer, and an apparatus for cleaning and drying a wafer |
Jun. 17, 2008 |
| 7384484 |
Substrate processing method, substrate processing apparatus and substrate processing system |
Jun. 10, 2008 |
| 7383844 |
Meniscus, vacuum, IPA vapor, drying manifold |
Jun. 10, 2008 |
| 7383843 |
Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer |
Jun. 10, 2008 |
| 7383601 |
Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same |
Jun. 10, 2008 |
| 7380560 |
Wafer cleaning apparatus with probe cleaning and methods of using the same |
Jun. 3, 2008 |
| 7377053 |
Method and device for drying substrate |
May. 27, 2008 |
| 7374621 |
System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication |
May. 20, 2008 |
| 7373941 |
Wet cleaning cavitation system and method to remove particulate wafer contamination |
May. 20, 2008 |
| 7367345 |
Apparatus and method for providing a confined liquid for immersion lithography |
May. 6, 2008 |
| 7364626 |
Substrate processing apparatus and substrate processing method |
Apr. 29, 2008 |
| 7364625 |
Rinsing processes and equipment |
Apr. 29, 2008 |
| 7363727 |
Method for utilizing a meniscus in substrate processing |
Apr. 29, 2008 |
| 7361231 |
System and method for mid-pressure dense phase gas and ultrasonic cleaning |
Apr. 22, 2008 |
| 7360546 |
Cleaning apparatus for semiconductor wafer |
Apr. 22, 2008 |
| 7360273 |
Substrate cleaning device and substrate processing facility |
Apr. 22, 2008 |
| 7357115 |
Wafer clamping apparatus and method for operating the same |
Apr. 15, 2008 |
| 7354481 |
Substrate holding and rotating apparatus |
Apr. 8, 2008 |
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