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Browse by Category: Main > Material Science
Class Information
Number: 134/31
Name: Cleaning and liquid contact with solids > Processes > Gas or vapor condensation or absorption oowork
Description: Processes in which a gas or a vapor is caused to be condensed upon or absorbed on the work.










Patents under this class:
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Patent Number Title Of Patent Date Issued
7124764 Method for removing impurities from porous materials Oct. 24, 2006
7112652 Solvents useful in the preparation of polymers containing hydrophilic and hydrophobic monomers Sep. 26, 2006
7104268 Megasonic cleaning system with buffered cavitation method Sep. 12, 2006
7087124 Cleaning and sanitizing system Aug. 8, 2006
7087123 Cleaning and sanitizing system Aug. 8, 2006
7060993 Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements Jun. 13, 2006
7052553 Wet cleaning of electrostatic chucks May. 30, 2006
7044662 Developing photoresist with supercritical fluid and developer May. 16, 2006
7022193 Apparatus and method for treating surfaces of semiconductor wafers using ozone Apr. 4, 2006
7001470 Cleaning process for photomasks Feb. 21, 2006
6988327 Methods and systems for processing a substrate using a dynamic liquid meniscus Jan. 24, 2006
6953042 Apparatus and process for supercritical carbon dioxide phase processing Oct. 11, 2005
6949145 Vapor-assisted cryogenic cleaning Sep. 27, 2005
6939409 Cleaning method and etching method Sep. 6, 2005
6936114 Steam cleaning system and method for semiconductor process equipment Aug. 30, 2005
6936112 Heat exchanger cleaning process Aug. 30, 2005
6935351 Method of cleaning CVD device and cleaning device therefor Aug. 30, 2005
6932092 Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy Aug. 23, 2005
6929015 Process for the at least partial elimination of carbon deposits in a heat exchanger Aug. 16, 2005
6923189 Cleaning of CVD chambers using remote source with cxfyoz based chemistry Aug. 2, 2005
6913653 Cleaning and etching methods and their apparatuses Jul. 5, 2005
6913654 Method for the removal of airborne molecular contaminants using water gas mixtures Jul. 5, 2005
6911097 Photoresist stripper using nitrogen bubbler Jun. 28, 2005
6905555 Methods for transferring supercritical fluids in microelectronic and other industrial processes Jun. 14, 2005
6905556 Method and apparatus for using surfactants in supercritical fluid processing of wafers Jun. 14, 2005
6905553 Device for removing residues from surfaces and a method for accomplishing the same Jun. 14, 2005
6902629 Method for cleaning a process chamber Jun. 7, 2005
6899767 Method of cleaning processing chamber of semiconductor processing apparatus May. 31, 2005
6896740 Method of reducing water spotting and oxide growth on a semiconductor structure May. 24, 2005
6896743 Wafer drying methods of Marangoni type and apparatus suitable therefor May. 24, 2005
6893509 Method of cleaning vessels in a refinery May. 17, 2005
6890391 Method of manufacturing semiconductor device and apparatus for cleaning substrate May. 10, 2005
6886573 Plasma cleaning gas with lower global warming potential than SF6 May. 3, 2005
6880561 Fluorine process for cleaning semiconductor process chamber Apr. 19, 2005
6881244 Method and device for preventing deposits in steam systems Apr. 19, 2005
6875289 Semiconductor wafer cleaning systems and methods Apr. 5, 2005
6872263 Cleaning system and method for dynamic devices in a refinery Mar. 29, 2005
6869516 Method for removing electrolyte from electrical contacts and wafer touching areas Mar. 22, 2005
6869487 Process and apparatus for treating a workpiece such as a semiconductor wafer Mar. 22, 2005
6858264 Chemical vapor deposition methods Feb. 22, 2005
6848455 Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species Feb. 1, 2005
6846789 Composition and method for removing photoresist materials from electronic components Jan. 25, 2005
6843857 Methods for cleaning semiconductor surfaces Jan. 18, 2005
6843858 Method of cleaning a semiconductor processing chamber Jan. 18, 2005
6840249 Method for cleaning a semiconductor device Jan. 11, 2005
6824620 Method for removing particles and non-volatile residue from an object Nov. 30, 2004
6803075 Method employing plurality of particles and pressure differentials to deposit film Oct. 12, 2004
6799584 Condensation-based enhancement of particle removal by suction Oct. 5, 2004
6797071 Surface treatment of semiconductor substrates Sep. 28, 2004
6793736 Method of providing high flux of point of use activated reactive species for semiconductor processing Sep. 21, 2004

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