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Class Information
Number: 134/30
Name: Cleaning and liquid contact with solids > Processes > Using sequentially applied treating agents > Including steam, gaseous agent or temperature feature
Description: Processes which include treating the work with steam or gas, or heating or cooling the work or treating it at specified temperatures or with an agent which has a specified temperature or with plural agents at different temperatures.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7628866 |
Method of cleaning wafer after etching process |
Dec. 8, 2009 |
| 7618495 |
Method for pickling a work string using dispersed solvent-in-acid fluid design |
Nov. 17, 2009 |
| 7614407 |
Prime coat, indicia and clear coat removal process for a golf ball |
Nov. 10, 2009 |
| 7611588 |
Methods and compositions for removing metal oxides |
Nov. 3, 2009 |
| 7594971 |
Method of cleaning and sterilizing medical instruments |
Sep. 29, 2009 |
| 7588644 |
Method and apparatus for cleaning pipeline pigs |
Sep. 15, 2009 |
| 7588036 |
Chamber clean method using remote and in situ plasma cleaning systems |
Sep. 15, 2009 |
| 7566369 |
Method of de-coating metallic coated scrap pieces |
Jul. 28, 2009 |
| 7556048 |
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor |
Jul. 7, 2009 |
| 7556696 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys |
Jul. 7, 2009 |
| 7552503 |
Apparatus and method for cleaning a surface with high pressure air |
Jun. 30, 2009 |
| 7534306 |
Steam humidifier and method |
May. 19, 2009 |
| 7534307 |
Methods for processing wafer surfaces using thin, high velocity fluid layer |
May. 19, 2009 |
| 7530359 |
Plasma treatment system and cleaning method of the same |
May. 12, 2009 |
| 7531045 |
Method for removing haze in a photo mask |
May. 12, 2009 |
| 7531047 |
Method of removing residue from a substrate after a DRIE process |
May. 12, 2009 |
| 7527698 |
Method and apparatus for removing a liquid from a surface of a substrate |
May. 5, 2009 |
| 7524383 |
Method and system for passivating a processing chamber |
Apr. 28, 2009 |
| 7517413 |
Remediation of microfloral and biofilm development from laundering devices |
Apr. 14, 2009 |
| 7507297 |
Cleaning method and cleaning apparatus |
Mar. 24, 2009 |
| 7494549 |
Substrate treatment apparatus and substrate treatment method |
Feb. 24, 2009 |
| 7481893 |
Cleaning textiles |
Jan. 27, 2009 |
| 7452426 |
Process solutions containing surfactants used as post-chemical mechanical planarization treatment |
Nov. 18, 2008 |
| 7442319 |
Poly etch without separate oxide decap |
Oct. 28, 2008 |
| 7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure |
Sep. 9, 2008 |
| 7419614 |
Method of etching and cleaning objects |
Sep. 2, 2008 |
| 7416612 |
Process for removal of paint from plastic substrates |
Aug. 26, 2008 |
| 7416611 |
Process and apparatus for treating a workpiece with gases |
Aug. 26, 2008 |
| 7412979 |
Selective removal or application of a coating on a portion of a container |
Aug. 19, 2008 |
| 7413613 |
Method for activating electron source surface of field emission display |
Aug. 19, 2008 |
| 7410543 |
Substrate processing method |
Aug. 12, 2008 |
| 7410545 |
Substrate processing method of and substrate processing apparatus for freezing and cleaning substrate |
Aug. 12, 2008 |
| 7405164 |
Apparatus and method for removing a photoresist structure from a substrate |
Jul. 29, 2008 |
| 7404863 |
Methods of thinning a silicon wafer using HF and ozone |
Jul. 29, 2008 |
| 7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces |
Jul. 22, 2008 |
| 7387689 |
Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
Jun. 17, 2008 |
| 7377982 |
Method for the removal of airborne molecular contaminants using water gas mixtures |
May. 27, 2008 |
| 7377984 |
Method for cleaning a photomask |
May. 27, 2008 |
| 7368020 |
Reduced particle contamination manufacturing and packaging for reticles |
May. 6, 2008 |
| 7364625 |
Rinsing processes and equipment |
Apr. 29, 2008 |
| 7341067 |
Method of managing the cleaning of heat transfer elements of a boiler within a furnace |
Mar. 11, 2008 |
| 7331354 |
Cleaning of tray columns which have been used for rectificatively treating liquids comprising (meth)acrylic acid and/or esters thereof |
Feb. 19, 2008 |
| 7332042 |
Process for treatment and extraction of organic cork compounds by a dense fluid under pressure |
Feb. 19, 2008 |
| 7329321 |
Enhanced wafer cleaning method |
Feb. 12, 2008 |
| 7318870 |
Method of cleaning semiconductor substrate |
Jan. 15, 2008 |
| 7287534 |
Cleaning of apparatus in which meth(acrylic) acid-containing organic solvents have been treated and/or generated |
Oct. 30, 2007 |
| 7288156 |
Methods for cleaning a substrate |
Oct. 30, 2007 |
| 7270717 |
Compositions and methods for cleaning contaminated articles |
Sep. 18, 2007 |
| 7264679 |
Cleaning of chamber components |
Sep. 4, 2007 |
| 7264680 |
Process and apparatus for treating a workpiece using ozone |
Sep. 4, 2007 |
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