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Class Information
Number: 134/26
Name: Cleaning and liquid contact with solids > Processes > Using sequentially applied treating agents
Description: Processes in which two or more treating agents are sequentially applied to the work.










Sub-classes under this class:

Class Number Class Name Patents
134/30 Including steam, gaseous agent or temperature feature 862
134/27 One a neutralizer for another 228
134/29 One a soap or an alkaline agent 575
134/28 One an acid or an acid salt 711


Patents under this class:

Patent Number Title Of Patent Date Issued
8702871 Package assembly cleaning process using vaporized solvent Apr. 22, 2014
8702870 Superimposition of rapid periodic and extensive post multiple substrate UV-ozone clean sequences for high throughput and stable substrate to substrate performance Apr. 22, 2014
8691023 Methods and apparatus for cleaning deposition chamber parts using selective spray etch Apr. 8, 2014
8691022 Method and apparatus for processing wafer-shaped articles Apr. 8, 2014
8691019 Process for cleaning a compound semiconductor wafer Apr. 8, 2014
8685172 Integrated processing and critical point drying systems for semiconductor and MEMS devices Apr. 1, 2014
8685171 Liquid detergent composition Apr. 1, 2014
8679257 Method for adding a multi-component detergent additive in a water leading household appliance Mar. 25, 2014
8673085 Controlling method of dishwasher Mar. 18, 2014
8668779 Method of simultaneously cleaning and disinfecting industrial water systems Mar. 11, 2014
8668778 Method of removing liquid from a barrier structure Mar. 11, 2014
8668777 Process for treating a semiconductor wafer Mar. 11, 2014
8663397 Processing and cleaning substrates Mar. 4, 2014
8658334 Transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device Feb. 25, 2014
8657966 Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications Feb. 25, 2014
8652268 Substrate treating method for treating substrates with treating liquids Feb. 18, 2014
8652267 Coated-type silicon-containing film stripping process Feb. 18, 2014
8652266 Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications Feb. 18, 2014
8647446 Method and system for improving performance and preventing corrosion in multi-module cleaning chamber Feb. 11, 2014
8647445 Process for cleaning semiconductor devices and/or tooling during manufacturing thereof Feb. 11, 2014
8647444 Rinse aid Feb. 11, 2014
8647440 Substrate processing method and substrate processing apparatus Feb. 11, 2014
8641829 Substrate processing system Feb. 4, 2014
8641828 Cleaning method of semiconductor manufacturing process Feb. 4, 2014
8640717 Multipurpose sequential droplet applicator Feb. 4, 2014
8632638 Method for cleaning deposits from an engine fuel delivery system Jan. 21, 2014
8628625 Method of detection/extraction, and related detection/extraction device Jan. 14, 2014
8617656 Liquid processing apparatus, liquid processing method, and storage medium Dec. 31, 2013
8617409 Magnetically levitated gas cell for touchless site-isolated wet processing Dec. 31, 2013
8613287 Apparatus for preventing stiction of MEMS microstructure Dec. 24, 2013
8608864 Substrate treating method Dec. 17, 2013
8608861 Method for the decontamination of an oxide layer-containing surface of a component or a system of a nuclear facility Dec. 17, 2013
8601639 Apparatus for application of two-phase contaminant removal medium Dec. 10, 2013
8591752 Plasma processing method Nov. 26, 2013
8591665 Wafer heating and temperature control by backside fluid injection Nov. 26, 2013
8591663 Corrosion product chemical dissolution process Nov. 26, 2013
8591662 Methods for cleaning a semiconductor substrate Nov. 26, 2013
8591661 Low damage photoresist strip method for low-K dielectrics Nov. 26, 2013
8591659 Plasma clean method for deposition chamber Nov. 26, 2013
8585917 Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods Nov. 19, 2013
8585831 Substrate cleaning method Nov. 19, 2013
8585830 Substrate processing apparatus and substrate processing method Nov. 19, 2013
8585826 Apparatus and method for cleaning flexible webs Nov. 19, 2013
8585825 Acoustic assisted single wafer wet clean for semiconductor wafer process Nov. 19, 2013
8580046 Method for the treatment of a semiconductor wafer Nov. 12, 2013
8580042 Methods and apparatus for cleaning semiconductor wafers Nov. 12, 2013
8580039 Surface treatment method of metal member and cleaning nozzle Nov. 12, 2013
8574371 Method for cleaning containers and cleaning machine Nov. 5, 2013
8574370 Use of alkane sulphonic acid for rust removal Nov. 5, 2013
8562752 Single workpiece processing chamber Oct. 22, 2013











 
 
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