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Class Information
Number: 134/2
Name: Cleaning and liquid contact with solids > Processes > For metallic, siliceous, or calcareous basework, including chemical bleaching, oxidation or reduction
Description: Processes in which the work has a metallic, siliceous or calcareous base, and is subjected to a bleaching, oxidizing or reducing action, usually to remove color, dirt, or impurities or other foreign matter from the base.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7611588 |
Methods and compositions for removing metal oxides |
Nov. 3, 2009 |
| 7604011 |
Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid |
Oct. 20, 2009 |
| 7601227 |
High purification method of jig for semiconductor heat treatment |
Oct. 13, 2009 |
| 7592415 |
Infrared solvent stripping process |
Sep. 22, 2009 |
| 7585438 |
Method for the cleaning of filament and fiber spinning devices |
Sep. 8, 2009 |
| 7578890 |
Method for removing contaminants from silicon wafer surface |
Aug. 25, 2009 |
| 7578889 |
Methodology for cleaning of surface metal contamination from electrode assemblies |
Aug. 25, 2009 |
| 7569487 |
Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices |
Aug. 4, 2009 |
| 7562664 |
Apparatus, products and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions |
Jul. 21, 2009 |
| 7556696 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys |
Jul. 7, 2009 |
| 7556654 |
Methods for cleaning materials |
Jul. 7, 2009 |
| 7553803 |
Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions |
Jun. 30, 2009 |
| 7546840 |
Method for cleaning reaction container and film deposition system |
Jun. 16, 2009 |
| 7544307 |
Metal polishing liquid and polishing method using it |
Jun. 9, 2009 |
| 7541321 |
Water soluble barrier film conformal coating composition |
Jun. 2, 2009 |
| 7540926 |
Method of cleaning contaminated surfaces |
Jun. 2, 2009 |
| 7534469 |
Semiconductor-processing apparatus provided with self-cleaning device |
May. 19, 2009 |
| 7531470 |
Method and apparatus for electronic device manufacture using shadow masks |
May. 12, 2009 |
| 7531047 |
Method of removing residue from a substrate after a DRIE process |
May. 12, 2009 |
| 7527743 |
Apparatus and method for etching insulating film |
May. 5, 2009 |
| 7520946 |
Apparatus and process for the dry removal of the scale found on the surface of metal products |
Apr. 21, 2009 |
| 7507300 |
Method and apparatus for cleaning a photoactive and/or hydrophilic surface |
Mar. 24, 2009 |
| 7503982 |
Method for cleaning semiconductor substrate |
Mar. 17, 2009 |
| 7501026 |
Liquid hard surface cleaning composition |
Mar. 10, 2009 |
| 7482282 |
Use of dilute hydrochloric acid in advanced interconnect contact clean in nickel semiconductor technologies |
Jan. 27, 2009 |
| 7470767 |
Preparation of ultrapure polymeric articles |
Dec. 30, 2008 |
| 7470330 |
Method for dissolving oilfield scale |
Dec. 30, 2008 |
| 7468106 |
Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys |
Dec. 23, 2008 |
| 7468105 |
CMP cleaning composition with microbial inhibitor |
Dec. 23, 2008 |
| 7465431 |
Nanoscalar pyrogenically produced yttrium-zirconium mixed oxide |
Dec. 16, 2008 |
| 7462249 |
Surface treatment process for metal articles |
Dec. 9, 2008 |
| 7462248 |
Method and system for cleaning a photomask |
Dec. 9, 2008 |
| 7459421 |
Cleaning and conditioning composition and method |
Dec. 2, 2008 |
| 7459029 |
Cleaning method, cleaning apparatus and electro optical device |
Dec. 2, 2008 |
| 7452426 |
Process solutions containing surfactants used as post-chemical mechanical planarization treatment |
Nov. 18, 2008 |
| 7448397 |
Apparatus for applying disparate etching solutions to interior and exterior surfaces |
Nov. 11, 2008 |
| 7442675 |
Cleaning composition and method of cleaning semiconductor substrate |
Oct. 28, 2008 |
| 7435355 |
Liquid-based gravity-driven etching-stop technique for controlling structure dimension |
Oct. 14, 2008 |
| 7435301 |
Cleaning solution of silicon germanium layer and cleaning method using the same |
Oct. 14, 2008 |
| 7431860 |
Etching process |
Oct. 7, 2008 |
| 7422639 |
Method of reducing water spotting and oxide growth on a semiconductor structure |
Sep. 9, 2008 |
| 7417018 |
Method of cleaning a solid surface by removing organic and/or mineral soils using a microemulsion |
Aug. 26, 2008 |
| 7416611 |
Process and apparatus for treating a workpiece with gases |
Aug. 26, 2008 |
| 7410543 |
Substrate processing method |
Aug. 12, 2008 |
| 7405189 |
Surface treatment composition and method for removing Si component and reduced metal salt produced on the aluminum die cast material in etching process |
Jul. 29, 2008 |
| 7404863 |
Methods of thinning a silicon wafer using HF and ozone |
Jul. 29, 2008 |
| 7402258 |
Methods of removing metal contaminants from a component for a plasma processing apparatus |
Jul. 22, 2008 |
| 7402213 |
Stripping and removal of organic-containing materials from electronic device substrate surfaces |
Jul. 22, 2008 |
| 7402212 |
Apparatus and method for cleaning a glass substrate before photoresist coating |
Jul. 22, 2008 |
| 7399366 |
Product and processes for preventing the occurrence of rust stains resulting from irrigation systems using water containing iron ions and for cleaning off rust stains resulting from using said |
Jul. 15, 2008 |
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