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Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Browse by Category: Main > Material Science
Class Information
Number: 134/149
Name: Cleaning and liquid contact with solids > Apparatus > With means to movably mount or movably support the work or work support > Axially rotary chuck, mandrel, rod or axle type holder
Description: Apparatus in which the work holder is an axially rotary chuck mandrel, rod or axle that passes into or through the work to mount the same.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8627835 In-situ cleaning assembly Jan. 14, 2014
8613288 High temperature chuck and method of using same Dec. 24, 2013
8578952 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for impleme Nov. 12, 2013
8578953 Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium Nov. 12, 2013
8567420 Cleaning apparatus for semiconductor wafer Oct. 29, 2013
8529707 Liquid processing apparatus, liquid processing method, and storage medium having computer program recorded therein Sep. 10, 2013
8505562 Hands-free cleaning apparatus for roller pads and/or paintbrushes Aug. 13, 2013
8506718 Polymer removing apparatus and method Aug. 13, 2013
8407886 Lead wire implanting apparatus Apr. 2, 2013
8375963 Substrate processing apparatus and substrate processing method Feb. 19, 2013
8277884 Coating and processing apparatus and method Oct. 2, 2012
8211269 Wafer spin chuck and an etcher using the same Jul. 3, 2012
8196594 Apparatus for removing foreign material from substrate and method for removing foreign material from substrate Jun. 12, 2012
8166985 Substrate cleaning and processing apparatus with magnetically controlled spin chuck holding pins May. 1, 2012
8136540 Cleaning system having heated cleaning enclosure for cleaning heat exchanger tube bundles Mar. 20, 2012
8113221 Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium Feb. 14, 2012
8020570 Substrate processing apparatus and substrate processing method Sep. 20, 2011
8007634 Wafer spin chuck and an etcher using the same Aug. 30, 2011
7799141 Method and system for using a two-phases substrate cleaning compound Sep. 21, 2010
7726323 Device and process for liquid treatment of wafer-shaped articles Jun. 1, 2010
7624744 Paint roller tool Dec. 1, 2009
7412982 Cleaning probe and megasonic cleaning apparatus having the same Aug. 19, 2008
7413628 Substrate treatment method and substrate treatment apparatus Aug. 19, 2008
7387131 Processing apparatus and substrate processing method Jun. 17, 2008
7323066 Paint accessory cleaning device and method Jan. 29, 2008
7267129 Device and process for liquid treatment of wafer-shaped articles Sep. 11, 2007
7267132 Methods for removing silicon and silicon-nitride contamination layers from deposition tubes Sep. 11, 2007
7258124 Apparatus and method for treating surfaces of semiconductor wafers using ozone Aug. 21, 2007
7240680 Substrate processing apparatus Jul. 10, 2007
7241362 Substrate treatment method and substrate treatment apparatus Jul. 10, 2007
7229206 Geometric and perforated paint mixer and paint roller cleaner Jun. 12, 2007
7226055 Substrate holding and spinning assembly and methods for making the same Jun. 5, 2007
7172674 Device for liquid treatment of wafer-shaped articles Feb. 6, 2007
7140066 Apparatus and method for inspecting and cleaning semiconductor devices Nov. 28, 2006
7108001 Method and apparatus for rotation of a workpiece in supercritical fluid solutions for removing photo resist, residues and particles therefrom Sep. 19, 2006
7040330 Method and apparatus for megasonic cleaning of patterned substrates May. 9, 2006
7007702 Device and process for liquid treatment of wafer-shaped articles Mar. 7, 2006
6983755 Cleaning method and cleaning apparatus for performing the same Jan. 10, 2006
6880563 Apparatus and method of cleaning a substrate Apr. 19, 2005
6877518 Chemical solution treatment apparatus for semiconductor substrate Apr. 12, 2005
6848455 Method and apparatus for removing photoresist and post-etch residue from semiconductor substrates by in-situ generation of oxidizing species Feb. 1, 2005
6827092 Wafer backside plate for use in a spin, rinse, and dry module and methods for making and implementing the same Dec. 7, 2004
6823876 Methodology of rotational etching tool maintenance Nov. 30, 2004
6821488 Sample holding chuck for use in reactor and reactor using same Nov. 23, 2004
6818071 Method and apparatus for cleaning a roller cover Nov. 16, 2004
6810888 Wafer rotary holding apparatus and wafer surface treatment apparatus with waste liquid recovery mechanism Nov. 2, 2004
6789554 Removing toner from printed material Sep. 14, 2004
6761362 Wafer holding device Jul. 13, 2004
6742279 Apparatus and method for rinsing substrates Jun. 1, 2004
6739347 System for spin-cleaning closed-end filter cartridges May. 25, 2004

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