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Browse by Category: Main > Material Science
Class Information
Number: 134/1.3
Name: Cleaning and liquid contact with solids > Processes > Including application of electrical radiant or wave energy to work > Semiconductor cleaning
Description: Process wherein the work is a semiconductive precursor, substrate, or device.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6265320 Method of minimizing reactive ion etch damage of organic insulating layers in semiconductor fabrication Jul. 24, 2001
6256825 Removal of particulate contamination in loadlocks Jul. 10, 2001
6254689 System and method for flash photolysis cleaning of a semiconductor processing chamber Jul. 3, 2001
6254721 Method and apparatus for processing samples Jul. 3, 2001
6251542 Semiconductor wafer etching method Jun. 26, 2001
6248704 Compositions for cleaning organic and plasma etched residues for semiconductors devices Jun. 19, 2001
6248179 Method of removing polymeric material on a silicon water Jun. 19, 2001
6248180 Method for removing particles from a semiconductor wafer Jun. 19, 2001
6240931 Method for removing particles from a surface of an article Jun. 5, 2001
6240933 Methods for cleaning semiconductor surfaces Jun. 5, 2001
6242165 Supercritical compositions for removal of organic material and methods of using same Jun. 5, 2001
6242400 Method of stripping resists from substrates using hydroxylamine and alkanolamine Jun. 5, 2001
6238487 Method for improving the efficiency of semiconductor chip production May. 29, 2001
6235147 Wet-etching facility for manufacturing semiconductor devices May. 22, 2001
6230720 Single-operation method of cleaning semiconductors after final polishing May. 15, 2001
6230753 Wafer cleaning apparatus May. 15, 2001
6231677 Photoresist stripping liquid composition May. 15, 2001
6232238 Method for preventing corrosion of bonding pad on a surface of a semiconductor wafer May. 15, 2001
6227212 Semiconductor workpiece cleaning method and apparatus May. 8, 2001
6225034 Photoresist stripping liquid compositions and a method of stripping photoresists using the same May. 1, 2001
6221167 Process and system for treatments by fluids Apr. 24, 2001
6221168 HF/IPA based process for removing undesired oxides form a substrate Apr. 24, 2001
6221269 Method of etching molybdenum metal from substrates Apr. 24, 2001
6217665 Method of cleaning substrate using ultraviolet radiation Apr. 17, 2001
6217667 Method for cleaning copper surfaces Apr. 17, 2001
6214128 Method and apparatus for preventing silicon hole defect formation after wet cleaning Apr. 10, 2001
6210748 Method for producing liquid crystal display and method for cleaning substrate Apr. 3, 2001
6211126 Formulations including a 1, 3-dicarbonyl compound chelating agent for stripping residues from semiconductor substrates Apr. 3, 2001
6205676 Method and apparatus for removing particles from surface of article Mar. 27, 2001
6206012 Method of avoiding wall particle contamination in depositing films Mar. 27, 2001
6206970 Semiconductor wafer processor, semiconductor processor gas filtering system and semiconductor processing methods Mar. 27, 2001
6207358 Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide Mar. 27, 2001
6197694 In situ method for cleaning silicon surface and forming layer thereon in same chamber Mar. 6, 2001
6197733 Photoresist ashing residue cleaning agent Mar. 6, 2001
6192899 Etch residue clean with aqueous HF/organic solution Feb. 27, 2001
6189546 Polishing process for manufacturing dopant-striation-free polished silicon wafers Feb. 20, 2001
6191086 Cleaning composition and method for removing residues Feb. 20, 2001
6183942 Thinner composition for removing spin-on-glass and photoresist Feb. 6, 2001
6178972 Method and apparatus for manufacturing a semiconductor integrated circuit Jan. 30, 2001
6178973 Method and apparatus for ozone generation and surface treatment Jan. 30, 2001
6178974 Cleaning apparatus and method Jan. 30, 2001
6173720 Process for treating a semiconductor substrate Jan. 16, 2001
6171436 Apparatus for removing slurry particles Jan. 9, 2001
6167891 Temperature controlled degassification of deionized water for megasonic cleaning of semiconductor wafers Jan. 2, 2001
6168910 Method for removing residue and method for production of printed board having hole Jan. 2, 2001
6169034 Chemically removable Cu CMP slurry abrasive Jan. 2, 2001
6169036 Method for cleaning via openings in integrated circuit manufacturing Jan. 2, 2001
6164133 Method and apparatus for pre-processing of semiconductor substrate surface analysis Dec. 26, 2000
6165694 Method for preventing the formation of recesses in borophosphosilicate glass Dec. 26, 2000
6165819 Semiconductor device, method of producing semiconductor device and semiconductor device mounting structure Dec. 26, 2000

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