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Browse by Category: Main > Material Science
Class Information
Number: 134/1.3
Name: Cleaning and liquid contact with solids > Processes > Including application of electrical radiant or wave energy to work > Semiconductor cleaning
Description: Process wherein the work is a semiconductive precursor, substrate, or device.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6451707 Method of removing reaction product due to plasma ashing of a resist pattern Sep. 17, 2002
6446641 Method of manufacturing semiconductor device, and semiconductor device manufactured thereby Sep. 10, 2002
6447634 Method and apparatus for selective removal of material from wafer alignment marks Sep. 10, 2002
6449521 Decontamination of a plasma reactor using a plasma after a chamber clean Sep. 10, 2002
6444255 Method for producing liquid crystal display and method for cleaning substrate Sep. 3, 2002
6440647 Resist stripping process Aug. 27, 2002
6435249 Method of recycling disk recording medium and apparatus for recovering metal reflective film Aug. 20, 2002
6431183 Method for treating semiconductor substrates Aug. 13, 2002
6431184 Apparatus and method for washing substrate Aug. 13, 2002
6431185 Apparatus and method for cleaning a semiconductor substrate Aug. 13, 2002
6431186 Method of cleaning electronic components Aug. 13, 2002
6432826 Planarized Cu cleaning for reduced defects Aug. 13, 2002
6422246 Method removing residual photoresist Jul. 23, 2002
6418942 Solvent and aqueous decompression processing system Jul. 16, 2002
6419757 Method for cleaning sintered silicon carbide in wet condition Jul. 16, 2002
6420076 Method and apparatus of inspecting foreign substance on substrate surface Jul. 16, 2002
6416586 Cleaning method Jul. 9, 2002
6416676 Deionized water degasification for semiconductor fabrication Jul. 9, 2002
6412498 Low temperature plasma strip process Jul. 2, 2002
6412499 Continuous cleaning megasonic tank with reduced duty cycle transducers Jul. 2, 2002
6413923 Non-corrosive cleaning composition for removing plasma etching residues Jul. 2, 2002
6410494 Cleaning agent Jun. 25, 2002
6406551 Method for treating a substrate with heat sensitive agents Jun. 18, 2002
6403544 Composition and method for removing photoresist materials from electronic components Jun. 11, 2002
6398874 Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same Jun. 4, 2002
6399500 Mechano-chemical polishing of crystals and epitaxial layers of GaN and Ga1-x-yA1xInyN Jun. 4, 2002
6399551 Alkanolamine semiconductor process residue removal process Jun. 4, 2002
6394105 Integrated laser cleaning and inspection system for rigid thin film media for magnetic recording application May. 28, 2002
6394106 Cleaning solutions and methods for semiconductor wafers May. 28, 2002
6395100 Method of improving vacuum quality in semiconductor processing chambers May. 28, 2002
6395102 Method and apparatus for in-situ reticle cleaning at photolithography tool May. 28, 2002
6395693 Cleaning solution for semiconductor surfaces following chemical-mechanical polishing May. 28, 2002
6396023 Airtight sealing method and airtight sealing apparatus for semiconductor laser element May. 28, 2002
6392417 Arrangement and method for detecting the end of life of an aqueous bath utilized in semiconductor processing May. 21, 2002
6391117 Method of washing substrate with UV radiation and ultrasonic cleaning May. 21, 2002
6391118 Method for removing particles from surface of article May. 21, 2002
6386212 Method of cleaning mixed material surfaces May. 14, 2002
6383723 Method to clean substrate and improve photoresist profile May. 7, 2002
6383724 Organic removal process May. 7, 2002
6378534 Semiconductor wafer cleaning system Apr. 30, 2002
6379469 Apparatus and method for washing substrate Apr. 30, 2002
6374834 Substrate processing method and processing apparatus Apr. 23, 2002
6375756 Method for removing a deposited film Apr. 23, 2002
6371134 Ozone cleaning of wafers Apr. 16, 2002
6371135 Method and apparatus for removing a particle from a surface of a semiconductor wafer Apr. 16, 2002
6372657 Method for selective etching of oxides Apr. 16, 2002
6367486 Ethylenediaminetetraacetic acid or its ammonium salt semiconductor process residue removal process Apr. 9, 2002
6360755 Method for processing semiconductor material Mar. 26, 2002
6357142 Method and apparatus for high-pressure wafer processing and drying Mar. 19, 2002
6358899 Cleaning compositions and use thereof containing ammonium hydroxide and fluorosurfactant Mar. 19, 2002

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