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Class Information
Number: 134/1.3
Name: Cleaning and liquid contact with solids > Processes > Including application of electrical radiant or wave energy to work > Semiconductor cleaning
Description: Process wherein the work is a semiconductive precursor, substrate, or device.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7621281 |
Cleaning solution for cleaning substrate for semiconductor devices and cleaning method using the same |
Nov. 24, 2009 |
| 7622244 |
Method for contaminant removal |
Nov. 24, 2009 |
| 7614406 |
Method of cleaning substrates utilizing megasonic energy |
Nov. 10, 2009 |
| 7615163 |
Film formation apparatus and method of using the same |
Nov. 10, 2009 |
| 7604011 |
Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid |
Oct. 20, 2009 |
| 7605113 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
Oct. 20, 2009 |
| 7598181 |
Process for enhancing solubility and reaction rates in supercritical fluids |
Oct. 6, 2009 |
| 7598654 |
Megasonic processing apparatus with frequency sweeping of thickness mode transducers |
Oct. 6, 2009 |
| 7591270 |
Process solutions containing surfactants |
Sep. 22, 2009 |
| 7583196 |
Method and system for detecting a body in a zone located proximate an interface |
Sep. 1, 2009 |
| 7582168 |
Method and apparatus for cleaning semiconductor wafer |
Sep. 1, 2009 |
| 7579309 |
Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor |
Aug. 25, 2009 |
| 7579307 |
Cleaner for semiconductor devices |
Aug. 25, 2009 |
| 7579253 |
Method for cleaning a semiconductor wafer |
Aug. 25, 2009 |
| 7578890 |
Method for removing contaminants from silicon wafer surface |
Aug. 25, 2009 |
| 7578886 |
Substrate processing apparatus, substrate processing method, and substrate holding apparatus |
Aug. 25, 2009 |
| 7578302 |
Megasonic cleaning using supersaturated solution |
Aug. 25, 2009 |
| 7575007 |
Chamber recovery after opening barrier over copper |
Aug. 18, 2009 |
| 7576046 |
Cleaning liquid for lithography and method of cleaning therewith |
Aug. 18, 2009 |
| 7571732 |
Ignition control of remote plasma unit |
Aug. 11, 2009 |
| 7569111 |
Method of cleaning deposition chamber |
Aug. 4, 2009 |
| 7568489 |
Method of and apparatus for eluting impurities |
Aug. 4, 2009 |
| 7566370 |
Wafer clamping apparatus and method for operating the same |
Jul. 28, 2009 |
| 7562662 |
Cleaning solution and cleaning method of a semiconductor device |
Jul. 21, 2009 |
| 7563753 |
Cleaning solution for removing photoresist |
Jul. 21, 2009 |
| 7563754 |
Composition for removing photoresist residue and polymer residue |
Jul. 21, 2009 |
| 7556697 |
System and method for carrying out liquid and subsequent drying treatments on one or more wafers |
Jul. 7, 2009 |
| 7556048 |
In-situ removal of surface impurities prior to arsenic-doped polysilicon deposition in the fabrication of a heterojunction bipolar transistor |
Jul. 7, 2009 |
| 7547669 |
Remover compositions for dual damascene system |
Jun. 16, 2009 |
| 7543593 |
Substrate processing apparatus |
Jun. 9, 2009 |
| 7543592 |
Compositions and processes for photoresist stripping and residue removal in wafer level packaging |
Jun. 9, 2009 |
| 7544622 |
Passivation for cleaning a material |
Jun. 9, 2009 |
| 7541322 |
Cleaning solution for substrate for semiconductor device and cleaning method |
Jun. 2, 2009 |
| 7534469 |
Semiconductor-processing apparatus provided with self-cleaning device |
May. 19, 2009 |
| 7534753 |
pH buffered aqueous cleaning composition and method for removing photoresist residue |
May. 19, 2009 |
| 7531047 |
Method of removing residue from a substrate after a DRIE process |
May. 12, 2009 |
| 7531059 |
Cleaning of semiconductor wafers by contaminate encapsulation |
May. 12, 2009 |
| 7531492 |
Composition for the removal of sidewall residues |
May. 12, 2009 |
| 7527695 |
Apparatus and method for cleaning substrate |
May. 5, 2009 |
| 7521407 |
Remover composition |
Apr. 21, 2009 |
| 7521374 |
Method and apparatus for cleaning semiconductor substrates |
Apr. 21, 2009 |
| 7521406 |
Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof |
Apr. 21, 2009 |
| 7517430 |
Method and apparatus for the controlled formation of cavitation bubbles |
Apr. 14, 2009 |
| 7513265 |
High pressure processing method and apparatus |
Apr. 7, 2009 |
| 7498295 |
Alkaline chemistry for post-CMP cleaning comprising tetra alkyl ammonium hydroxide |
Mar. 3, 2009 |
| 7493904 |
Liquid processing apparatus and liquid processing method |
Feb. 24, 2009 |
| 7494597 |
Method and apparatus for etching disk-like member |
Feb. 24, 2009 |
| 7479474 |
Reducing oxide loss when using fluoride chemistries to remove post-etch residues in semiconductor processing |
Jan. 20, 2009 |
| 7478454 |
Manipulating device for photomasks that provides possibilities for cleaning and inspection of photomasks |
Jan. 20, 2009 |
| 7470919 |
Substrate support assembly with thermal isolating plate |
Dec. 30, 2008 |
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