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Class Information
Number: 134/1.3
Name: Cleaning and liquid contact with solids > Processes > Including application of electrical radiant or wave energy to work > Semiconductor cleaning
Description: Process wherein the work is a semiconductive precursor, substrate, or device.

Patents under this class:

Patent Number Title Of Patent Date Issued
8702826 Abrasive agent, method for producing abrasive agents, and electronic device Apr. 22, 2014
8685168 Method for removing micro-debris and device of the same Apr. 1, 2014
8679734 Photoresist removal Mar. 25, 2014
8673764 Method and system for making and cleaning semiconductor device Mar. 18, 2014
8658540 Methods for low temperature conditioning of process chambers Feb. 25, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652262 Ultrasonic cleaning method for generating ultrasonic vibrations by a frequency modulated signal Feb. 18, 2014
8647440 Substrate processing method and substrate processing apparatus Feb. 11, 2014
8647439 Method of epitaxial germanium tin alloy surface preparation Feb. 11, 2014
8642526 Composition and method for recycling semiconductor wafers having low-k dielectric materials thereon Feb. 4, 2014
8613803 Apparatus and method for indirect surface cleaning Dec. 24, 2013
8608864 Substrate treating method Dec. 17, 2013
8608858 Substrate cleaning apparatus and method for determining timing of replacement of cleaning member Dec. 17, 2013
8608857 Rheological fluids for particle removal Dec. 17, 2013
8603253 Photovoltaic back contact Dec. 10, 2013
8601639 Apparatus for application of two-phase contaminant removal medium Dec. 10, 2013
8585825 Acoustic assisted single wafer wet clean for semiconductor wafer process Nov. 19, 2013
8574369 Method of removing resist and apparatus therefor Nov. 5, 2013
8568534 Method for washing device substrate Oct. 29, 2013
8562749 Wafer fabrication process Oct. 22, 2013
8551928 Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element Oct. 8, 2013
8551251 Ultrasonic treatment method and apparatus Oct. 8, 2013
8545634 System and method for cleaning a conditioning device Oct. 1, 2013
8534302 Prober cleaning block assembly Sep. 17, 2013
8506718 Polymer removing apparatus and method Aug. 13, 2013
8486880 Composition for removing a photoresist and method of manufacturing semiconductor device using the composition Jul. 16, 2013
8486199 Ultrasonic cleaning method and apparatus Jul. 16, 2013
8486198 Method of processing substrates Jul. 16, 2013
8480809 Methods for application of two-phase contaminant removal medium Jul. 9, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8475602 Substrate cleaning method and apparatus Jul. 2, 2013
8455419 Photoresist stripping agent composition Jun. 4, 2013
8454752 Foreign substance removing apparatus, foreign substance removing method, and storage medium Jun. 4, 2013
8449684 Substrate cleaning method, substrate cleaning system and program storage medium May. 28, 2013
8449681 Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate May. 28, 2013
8448655 Ultrasonic cleaning device May. 28, 2013
8444868 Method for removing copper oxide layer May. 21, 2013
8444768 Compositions and methods for removing organic substances May. 21, 2013
8440599 Composition for stripping and cleaning and use thereof May. 14, 2013
8440573 Method and apparatus for pattern collapse free wet processing of semiconductor devices May. 14, 2013
8431516 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid Apr. 30, 2013
8430969 Method for exposing and cleaning insulating coats from metal contact surfaces Apr. 30, 2013
8419964 Apparatus and method for edge bevel removal of copper from silicon wafers Apr. 16, 2013
8415254 Method for removing dummy poly in a gate last process Apr. 9, 2013
8389454 Manufacturing and cleansing of thin film transistor panels Mar. 5, 2013
8388758 Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid Mar. 5, 2013
8377217 Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates Feb. 19, 2013
8372651 Method of monitoring a surfactant in a microelectronic process by absorbance Feb. 12, 2013
8367594 Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles Feb. 5, 2013
8367312 Detergent for lithography and method of forming resist pattern with the same Feb. 5, 2013

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