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Class Information
Number: 134/1.2
Name: Cleaning and liquid contact with solids > Processes > Including application of electrical radiant or wave energy to work > Plasma cleaning > Semiconductor cleaning
Description: Process wherein the work is a semiconductive precursor, substrate, or device.

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652970 Vacuum processing method and vacuum processing apparatus Feb. 18, 2014
8647439 Method of epitaxial germanium tin alloy surface preparation Feb. 11, 2014
8641828 Cleaning method of semiconductor manufacturing process Feb. 4, 2014
8591661 Low damage photoresist strip method for low-K dielectrics Nov. 26, 2013
8574369 Method of removing resist and apparatus therefor Nov. 5, 2013
8562750 Method and apparatus for processing bevel edge Oct. 22, 2013
8557709 Plasma processing apparatus and plasma processing method Oct. 15, 2013
8534302 Prober cleaning block assembly Sep. 17, 2013
8529783 Method for backside polymer reduction in dry-etch process Sep. 10, 2013
8500913 Methods for treating surfaces, and methods for removing one or more materials from surfaces Aug. 6, 2013
8486198 Method of processing substrates Jul. 16, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8444869 Simultaneous front side ash and backside clean May. 21, 2013
8440573 Method and apparatus for pattern collapse free wet processing of semiconductor devices May. 14, 2013
8431516 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid Apr. 30, 2013
8431333 Method for removing an uncured photosensitive composition Apr. 30, 2013
8404052 Method for cleaning the surface of a silicon substrate Mar. 26, 2013
8398778 Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameter Mar. 19, 2013
8377216 Vacuum processing apparatus and vacuum processing method Feb. 19, 2013
8367594 Damage free, high-efficiency, particle removal cleaner comprising polyvinyl alcohol particles Feb. 5, 2013
8361237 Wet clean compositions for CoWP and porous dielectrics Jan. 29, 2013
8354365 Cleaning liquid for lithography and method for forming wiring Jan. 15, 2013
8349087 Semiconductor device manufacturing method, wafer treatment system, and recording medium Jan. 8, 2013
8337623 Methods for plasma cleaning an internal peripheral region of a plasma processing chamber Dec. 25, 2012
8324114 Method and apparatus for silicon oxide residue removal Dec. 4, 2012
8317929 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus Nov. 27, 2012
8309465 System and method for producing devices including a semiconductor part and a non-semiconductor part Nov. 13, 2012
8288291 Method for removal of bulk metal contamination from III-V semiconductor substrates Oct. 16, 2012
8277564 Method for removing a hardened photoresist Oct. 2, 2012
8278186 Wafer cleaning method and wafer bonding method using the same Oct. 2, 2012
8262801 Vacuum processing method Sep. 11, 2012
8257504 Surface treatment composition, surface treatment method, and method for manufacturing semiconductor device Sep. 4, 2012
8241426 CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device Aug. 14, 2012
8231732 Cleaning method and substrate processing apparatus Jul. 31, 2012
8216382 Foreign matter removal method and storage medium Jul. 10, 2012
8211238 System, method and apparatus for self-cleaning dry etch Jul. 3, 2012
8197603 Method and apparatus for treating a substrate with dense fluid and plasma Jun. 12, 2012
8187389 Method of removing resist and apparatus therefor May. 29, 2012
8182610 Cleaning equipment and cleaning method of deposition mask May. 22, 2012
8163094 Method to improve indium bump bonding via indium oxide removal using a multi-step plasma process Apr. 24, 2012
8158568 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith Apr. 17, 2012
8148310 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid Apr. 3, 2012
8148311 Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid Apr. 3, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8114220 Formulations for cleaning ion-implanted photoresist layers from microelectronic devices Feb. 14, 2012
8101025 Method for controlling corrosion of a substrate Jan. 24, 2012
8101934 Methods and apparatus for detecting a substrate notch or flat Jan. 24, 2012

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