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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6506291 |
Substrate support with multilevel heat transfer mechanism |
Jan. 14, 2003 |
| 6506994 |
Low profile thick film heaters in multi-slot bake chamber |
Jan. 14, 2003 |
| 6502530 |
Design of gas injection for the electrode in a capacitively coupled RF plasma reactor |
Jan. 7, 2003 |
| 6503368 |
Substrate support having bonded sections and method |
Jan. 7, 2003 |
| 6503579 |
Plasma CVD method, plasma CVD apparatus, and electrode |
Jan. 7, 2003 |
| 6499777 |
End-effector with integrated cooling mechanism |
Dec. 31, 2002 |
| 6500265 |
Apparatus for electrostatically maintaining subtrate flatness |
Dec. 31, 2002 |
| 6500299 |
Chamber having improved gas feed-through and method |
Dec. 31, 2002 |
| 6494955 |
Ceramic substrate support |
Dec. 17, 2002 |
| 6494958 |
Plasma chamber support with coupled electrode |
Dec. 17, 2002 |
| 6491518 |
Apparatus for high-temperature and high-pressure treatment |
Dec. 10, 2002 |
| 6488776 |
Method and apparatus for forming insitu boron doped polycrystalline and amorphous silicon films |
Dec. 3, 2002 |
| 6488820 |
Method and apparatus for reducing migration of conductive material on a component |
Dec. 3, 2002 |
| 6485616 |
System and method for coating substrates with improved capacity and uniformity |
Nov. 26, 2002 |
| 6483989 |
Substrate processing apparatus and semiconductor device producing method |
Nov. 19, 2002 |
| 6478924 |
Plasma chamber support having dual electrodes |
Nov. 12, 2002 |
| 6474986 |
Hot plate cooling method and heat processing apparatus |
Nov. 5, 2002 |
| 6475336 |
Electrostatically clamped edge ring for plasma processing |
Nov. 5, 2002 |
| 6475432 |
Carrier and support for work pieces |
Nov. 5, 2002 |
| 6471779 |
Gas feed ceramic structure for semiconductor-producing apparatus |
Oct. 29, 2002 |
| 6468354 |
Semiconductor wafer support |
Oct. 22, 2002 |
| 6464445 |
System and method for improved throughput of semiconductor wafer processing |
Oct. 15, 2002 |
| 6464794 |
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
Oct. 15, 2002 |
| 6464795 |
Substrate support member for a processing chamber |
Oct. 15, 2002 |
| 6461155 |
Method and apparatus for heating substrates in supercritical fluid reactor |
Oct. 8, 2002 |
| 6461436 |
Apparatus and process of improving atomic layer deposition chamber performance |
Oct. 8, 2002 |
| 6461439 |
Apparatus for supporting a semiconductor wafer during processing |
Oct. 8, 2002 |
| 6458239 |
Plasma processing apparatus |
Oct. 1, 2002 |
| 6454864 |
Two-piece chuck |
Sep. 24, 2002 |
| 6454865 |
Low mass wafer support system |
Sep. 24, 2002 |
| 6454866 |
Wafer support system |
Sep. 24, 2002 |
| 6454898 |
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners |
Sep. 24, 2002 |
| 6450346 |
Silicon fixtures for supporting wafers during thermal processing |
Sep. 17, 2002 |
| 6450805 |
Hot plate cooling method and heat processing apparatus |
Sep. 17, 2002 |
| 6452195 |
Wafer holding pin |
Sep. 17, 2002 |
| 6446948 |
Vacuum chuck for reducing distortion of semiconductor and GMR head wafers during processing |
Sep. 10, 2002 |
| 6447613 |
Substrate dechucking device and substrate dechucking method |
Sep. 10, 2002 |
| 6447853 |
Method and apparatus for processing semiconductor substrates |
Sep. 10, 2002 |
| 6444087 |
Plasma etching system |
Sep. 3, 2002 |
| 6435798 |
Semiconductor processing apparatus with substrate-supporting mechanism |
Aug. 20, 2002 |
| 6436192 |
Apparatus for aligning a wafer |
Aug. 20, 2002 |
| 6432207 |
Method and structure for baking a wafer |
Aug. 13, 2002 |
| 6432208 |
Plasma processing apparatus |
Aug. 13, 2002 |
| 6432256 |
Implanatation process for improving ceramic resistance to corrosion |
Aug. 13, 2002 |
| 6425168 |
Quartz glass jig for heat-treating semiconductor wafers and method for producing same |
Jul. 30, 2002 |
| 6425994 |
Process chamber including stage having improved base and substrate mounting member |
Jul. 30, 2002 |
| 6423178 |
Apparatus for plasma process |
Jul. 23, 2002 |
| 6419753 |
Apparatus and method for masking multiple turbine components |
Jul. 16, 2002 |
| 6416618 |
Wafer processing apparatus |
Jul. 9, 2002 |
| 6406544 |
Parylene deposition chamber and method of use |
Jun. 18, 2002 |
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