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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6902682 |
Method and apparatus for electrostatically maintaining substrate flatness |
Jun. 7, 2005 |
| 6899765 |
Chamber elements defining a movable internal chamber |
May. 31, 2005 |
| 6899788 |
Article holders that use gas vortices to hold an article in a desired position |
May. 31, 2005 |
| 6899789 |
Method of holding substrate and substrate holding system |
May. 31, 2005 |
| 6896738 |
Induction heating devices and methods for controllably heating an article |
May. 24, 2005 |
| 6896765 |
Method and apparatus for the compensation of edge ring wear in a plasma processing chamber |
May. 24, 2005 |
| 6896929 |
Susceptor shaft vacuum pumping |
May. 24, 2005 |
| 6893507 |
Self-centering wafer support system |
May. 17, 2005 |
| 6895179 |
Wafer stage for wafer processing apparatus |
May. 17, 2005 |
| 6887315 |
Vacuum plate having a symmetrical air-load block |
May. 3, 2005 |
| 6887317 |
Reduced friction lift pin |
May. 3, 2005 |
| 6888153 |
Capacitive shield for containing radiofrequency magnetic fields |
May. 3, 2005 |
| 6883250 |
Non-contact cool-down station for wafers |
Apr. 26, 2005 |
| 6884066 |
Thermal process station with heated lid |
Apr. 26, 2005 |
| 6884319 |
Susceptor of apparatus for manufacturing semiconductor device |
Apr. 26, 2005 |
| 6881268 |
Method and apparatus for forming required gas atmosphere |
Apr. 19, 2005 |
| 6879109 |
Thin magnetron structures for plasma generation in ion implantation systems |
Apr. 12, 2005 |
| 6878206 |
Lid assembly for a processing system to facilitate sequential deposition techniques |
Apr. 12, 2005 |
| 6878210 |
Surface-treating holder having tubular structure and method using the same |
Apr. 12, 2005 |
| 6878211 |
Supporting structure for a ceramic susceptor |
Apr. 12, 2005 |
| 6878233 |
Workpiece holding mechanism |
Apr. 12, 2005 |
| 6869483 |
Coating process and apparatus |
Mar. 22, 2005 |
| 6866889 |
Method and means for drill production |
Mar. 15, 2005 |
| 6863734 |
Substrate processing apparatus and method for manufacturing semiconductor device |
Mar. 8, 2005 |
| 6863735 |
Epitaxial growth furnace |
Mar. 8, 2005 |
| 6858088 |
Method and apparatus for treating substrates |
Feb. 22, 2005 |
| 6859616 |
Apparatus for and method of heat treatment by light irradiation |
Feb. 22, 2005 |
| 6855236 |
Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus |
Feb. 15, 2005 |
| 6851939 |
System for chemical vapor deposition at ambient temperature using electron cyclotron resonance and method for depositing metal composite film using the same |
Feb. 8, 2005 |
| 6852195 |
Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment |
Feb. 8, 2005 |
| 6846364 |
Heater block having catalyst spray means |
Jan. 25, 2005 |
| 6843892 |
Apparatus and method for selectively and controllably electrically biasing a plurality of substrates on a pallet |
Jan. 18, 2005 |
| 6844528 |
Hot wall rapid thermal processor |
Jan. 18, 2005 |
| 6841049 |
OPTICAL DEVICE SUBSTRATE FILM-FORMATION APPARATUS, OPTICAL DISK SUBSTRATE FILM-FORMATION METHOD, SUBSTRATE HOLDER MANUFACTURE METHOD, SUBSTRATE HOLDER, OPTICAL DISK AND A PHASE-CHANGE RECORDIN |
Jan. 11, 2005 |
| 6837963 |
Semiconductor device, method of producing a semiconductor device, and semiconductor substrate cleaning apparatus used for the production method |
Jan. 4, 2005 |
| 6837967 |
Method and apparatus for cleaning deposited films from the edge of a wafer |
Jan. 4, 2005 |
| 6837968 |
Lower pedestal shield |
Jan. 4, 2005 |
| 6830622 |
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof |
Dec. 14, 2004 |
| 6829022 |
Chuck for exposure apparatus |
Dec. 7, 2004 |
| 6829056 |
Monitoring dimensions of features at different locations in the processing of substrates |
Dec. 7, 2004 |
| 6824618 |
Substrate receiving apparatus and method thereof |
Nov. 30, 2004 |
| 6824619 |
Method and device for rotating a wafer |
Nov. 30, 2004 |
| 6821380 |
Temperature adjustment apparatus |
Nov. 23, 2004 |
| 6818066 |
Method and apparatus for treating a substrate |
Nov. 16, 2004 |
| 6818067 |
Processing chamber for atomic layer deposition processes |
Nov. 16, 2004 |
| 6814808 |
Carrier for semiconductor wafers |
Nov. 9, 2004 |
| 6815072 |
Method to solve particle performance of FSG layer by using UFU season film for FSG process |
Nov. 9, 2004 |
| 6815316 |
Apparatus for fabricating compound semiconductor device |
Nov. 9, 2004 |
| 6805749 |
Method and apparatus for supporting a semiconductor wafer during processing |
Oct. 19, 2004 |
| 6800173 |
Variable gas conductance control for a process chamber |
Oct. 5, 2004 |
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