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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7220319 |
Electrostatic chucking stage and substrate processing apparatus |
May. 22, 2007 |
| 7211154 |
Electrode-built-in susceptor |
May. 1, 2007 |
| 7211153 |
Ceramic joined body, substrate holding structure and substrate processing apparatus |
May. 1, 2007 |
| 7208065 |
Structure for measuring the etching speed |
Apr. 24, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7204912 |
Method and apparatus for an improved bellows shield in a plasma processing system |
Apr. 17, 2007 |
| 7204888 |
Lift pin assembly for substrate processing |
Apr. 17, 2007 |
| 7204887 |
Wafer holding, wafer support member, wafer boat and heat treatment furnace |
Apr. 17, 2007 |
| 7201942 |
Coating method |
Apr. 10, 2007 |
| 7198819 |
Substrate supporting frame |
Apr. 3, 2007 |
| 7195673 |
Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same |
Mar. 27, 2007 |
| 7186298 |
Wafer support system |
Mar. 6, 2007 |
| 7186297 |
Wafer holding apparatus |
Mar. 6, 2007 |
| 7184858 |
Apparatus and method for controlling elastic actuator |
Feb. 27, 2007 |
| 7175737 |
Electrostatic chucking stage and substrate processing apparatus |
Feb. 13, 2007 |
| 7175714 |
Electrode-built-in susceptor and a manufacturing method therefor |
Feb. 13, 2007 |
| 7169703 |
Method of forming metallic wiring layer, method of selective metallization, apparatus for selective metallization and substrate apparatus |
Jan. 30, 2007 |
| 7169234 |
Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder |
Jan. 30, 2007 |
| 7166336 |
DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container |
Jan. 23, 2007 |
| 7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Jan. 23, 2007 |
| 7166168 |
Substrate-coating system and an associated substrate-heating method |
Jan. 23, 2007 |
| 7166166 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Jan. 23, 2007 |
| 7163607 |
Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system |
Jan. 16, 2007 |
| 7160417 |
Cassette for a load-lock |
Jan. 9, 2007 |
| 7160392 |
Method for dechucking a substrate |
Jan. 9, 2007 |
| 7153368 |
Susceptor with epitaxial growth control devices and epitaxial reactor using the same |
Dec. 26, 2006 |
| 7153367 |
Drive mechanism for a vacuum treatment apparatus |
Dec. 26, 2006 |
| 7153362 |
System and method for real time deposition process control based on resulting product detection |
Dec. 26, 2006 |
| 7147720 |
Non-contact cool-down station for wafers |
Dec. 12, 2006 |
| 7147719 |
Double slit-valve doors for plasma processing |
Dec. 12, 2006 |
| 7141763 |
Method and apparatus for rapid temperature change and control |
Nov. 28, 2006 |
| 7138607 |
Determining method of thermal processing condition |
Nov. 21, 2006 |
| 7138606 |
Wafer processing method |
Nov. 21, 2006 |
| 7137352 |
Plasma processing system in which wafer is retained by electrostatic chuck |
Nov. 21, 2006 |
| 7126092 |
Heater for wafer processing and methods of operating and manufacturing the same |
Oct. 24, 2006 |
| 7125587 |
Ion beam for enhancing optical properties of materials |
Oct. 24, 2006 |
| 7115837 |
Selective reflectivity process chamber with customized wavelength response and method |
Oct. 3, 2006 |
| 7115304 |
High throughput surface treatment on coiled flexible substrates |
Oct. 3, 2006 |
| 7112544 |
Method of atomic layer deposition on plural semiconductor substrates simultaneously |
Sep. 26, 2006 |
| 7093560 |
Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system |
Aug. 22, 2006 |
| 7081165 |
Chemical vapor deposition apparatus having a susceptor with a grounded lift pin |
Jul. 25, 2006 |
| 7081166 |
Planetary system workpiece support and method for surface treatment of workpieces |
Jul. 25, 2006 |
| 7077913 |
Apparatus for fabricating a semiconductor device |
Jul. 18, 2006 |
| 7070660 |
Wafer holder with stiffening rib |
Jul. 4, 2006 |
| 7070661 |
Uniform gas cushion wafer support |
Jul. 4, 2006 |
| 7066191 |
Installation for making available highly pure fine chemicals |
Jun. 27, 2006 |
| 7067178 |
Substrate table, production method therefor and plasma treating device |
Jun. 27, 2006 |
| 7060134 |
One piece shim |
Jun. 13, 2006 |
| 7060939 |
Substrate heating method, substrate heating system, and applying developing system |
Jun. 13, 2006 |
| 7060945 |
Substrate heater and fabrication method for the same |
Jun. 13, 2006 |
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