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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.


Sub-classes under this class:

Class Number Class Name Patents
118/729 Moving work support 718


Patents under this class:

Patent Number Title Of Patent Date Issued
7220319 Electrostatic chucking stage and substrate processing apparatus May. 22, 2007
7211154 Electrode-built-in susceptor May. 1, 2007
7211153 Ceramic joined body, substrate holding structure and substrate processing apparatus May. 1, 2007
7208065 Structure for measuring the etching speed Apr. 24, 2007
7204913 In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control Apr. 17, 2007
7204912 Method and apparatus for an improved bellows shield in a plasma processing system Apr. 17, 2007
7204888 Lift pin assembly for substrate processing Apr. 17, 2007
7204887 Wafer holding, wafer support member, wafer boat and heat treatment furnace Apr. 17, 2007
7201942 Coating method Apr. 10, 2007
7198819 Substrate supporting frame Apr. 3, 2007
7195673 Plasma CVD apparatus, and method for forming film and method for forming semiconductor device using the same Mar. 27, 2007
7186298 Wafer support system Mar. 6, 2007
7186297 Wafer holding apparatus Mar. 6, 2007
7184858 Apparatus and method for controlling elastic actuator Feb. 27, 2007
7175737 Electrostatic chucking stage and substrate processing apparatus Feb. 13, 2007
7175714 Electrode-built-in susceptor and a manufacturing method therefor Feb. 13, 2007
7169703 Method of forming metallic wiring layer, method of selective metallization, apparatus for selective metallization and substrate apparatus Jan. 30, 2007
7169234 Apparatus and methods for preventing rotational slippage between a vertical shaft and a support structure for a semiconductor wafer holder Jan. 30, 2007
7166336 DLC film, DLC-coated plastic container, and method and apparatus for manufacturing DLC-coated plastic container Jan. 23, 2007
7166187 Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling Jan. 23, 2007
7166168 Substrate-coating system and an associated substrate-heating method Jan. 23, 2007
7166166 Method and apparatus for an improved baffle plate in a plasma processing system Jan. 23, 2007
7163607 Process kit for improved power coupling through a workpiece in a semiconductor wafer processing system Jan. 16, 2007
7160417 Cassette for a load-lock Jan. 9, 2007
7160392 Method for dechucking a substrate Jan. 9, 2007
7153368 Susceptor with epitaxial growth control devices and epitaxial reactor using the same Dec. 26, 2006
7153367 Drive mechanism for a vacuum treatment apparatus Dec. 26, 2006
7153362 System and method for real time deposition process control based on resulting product detection Dec. 26, 2006
7147720 Non-contact cool-down station for wafers Dec. 12, 2006
7147719 Double slit-valve doors for plasma processing Dec. 12, 2006
7141763 Method and apparatus for rapid temperature change and control Nov. 28, 2006
7138607 Determining method of thermal processing condition Nov. 21, 2006
7138606 Wafer processing method Nov. 21, 2006
7137352 Plasma processing system in which wafer is retained by electrostatic chuck Nov. 21, 2006
7126092 Heater for wafer processing and methods of operating and manufacturing the same Oct. 24, 2006
7125587 Ion beam for enhancing optical properties of materials Oct. 24, 2006
7115837 Selective reflectivity process chamber with customized wavelength response and method Oct. 3, 2006
7115304 High throughput surface treatment on coiled flexible substrates Oct. 3, 2006
7112544 Method of atomic layer deposition on plural semiconductor substrates simultaneously Sep. 26, 2006
7093560 Techniques for reducing arcing-related damage in a clamping ring of a plasma processing system Aug. 22, 2006
7081165 Chemical vapor deposition apparatus having a susceptor with a grounded lift pin Jul. 25, 2006
7081166 Planetary system workpiece support and method for surface treatment of workpieces Jul. 25, 2006
7077913 Apparatus for fabricating a semiconductor device Jul. 18, 2006
7070660 Wafer holder with stiffening rib Jul. 4, 2006
7070661 Uniform gas cushion wafer support Jul. 4, 2006
7066191 Installation for making available highly pure fine chemicals Jun. 27, 2006
7067178 Substrate table, production method therefor and plasma treating device Jun. 27, 2006
7060134 One piece shim Jun. 13, 2006
7060939 Substrate heating method, substrate heating system, and applying developing system Jun. 13, 2006
7060945 Substrate heater and fabrication method for the same Jun. 13, 2006



 
 
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