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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7413767 |
Gas supply method in a CVD coating system for precursors with a low vapor pressure |
Aug. 19, 2008 |
| 7413628 |
Substrate treatment method and substrate treatment apparatus |
Aug. 19, 2008 |
| 7413610 |
Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines |
Aug. 19, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7396415 |
Apparatus and methods for isolating chemical vapor reactions at a substrate surface |
Jul. 8, 2008 |
| 7393433 |
Plasma processing apparatus, semiconductor manufacturing apparatus and electrostatic chucking unit used thereof |
Jul. 1, 2008 |
| 7393418 |
Susceptor |
Jul. 1, 2008 |
| 7393417 |
Semiconductor-manufacturing apparatus |
Jul. 1, 2008 |
| 7393207 |
Wafer support tool for heat treatment and heat treatment apparatus |
Jul. 1, 2008 |
| 7390367 |
Housing assembly for an induction heating device including liner or susceptor coating |
Jun. 24, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7381276 |
Susceptor pocket with beveled projection sidewall |
Jun. 3, 2008 |
| 7371287 |
Substrate handling system |
May. 13, 2008 |
| 7364624 |
Wafer handling apparatus and method of manufacturing thereof |
Apr. 29, 2008 |
| 7361230 |
Substrate processing apparatus |
Apr. 22, 2008 |
| 7354288 |
Substrate support with clamping electrical connector |
Apr. 8, 2008 |
| 7351936 |
Method and apparatus for preventing baking chamber exhaust line clog |
Apr. 1, 2008 |
| 7351293 |
Method and device for rotating a wafer |
Apr. 1, 2008 |
| 7338699 |
Island projection-modified part, method for producing the same, and apparatus comprising the same |
Mar. 4, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7335394 |
Substrate supporting frame |
Feb. 26, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7332038 |
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
Feb. 19, 2008 |
| 7331307 |
Thermally sprayed member, electrode and plasma processing apparatus using the electrode |
Feb. 19, 2008 |
| 7325692 |
Cassette having separation plates for storing a plurality of semiconductor wafers |
Feb. 5, 2008 |
| 7314526 |
Reaction chamber for an epitaxial reactor |
Jan. 1, 2008 |
| 7311784 |
Plasma processing device |
Dec. 25, 2007 |
| 7311783 |
Multiple axis tumbler coating apparatus |
Dec. 25, 2007 |
| 7299104 |
Substrate processing apparatus and substrate transferring method |
Nov. 20, 2007 |
| 7288492 |
Method for forming interconnects on thin wafers |
Oct. 30, 2007 |
| 7288166 |
Plasma processing apparatus |
Oct. 30, 2007 |
| 7282096 |
Arrangement comprising a support body and a substrate holder which is driven in rotation and gas-supported thereon |
Oct. 16, 2007 |
| 7279049 |
Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support |
Oct. 9, 2007 |
| 7276125 |
Barrel type susceptor |
Oct. 2, 2007 |
| 7276123 |
Semiconductor-processing apparatus provided with susceptor and placing block |
Oct. 2, 2007 |
| 7274006 |
Heater |
Sep. 25, 2007 |
| 7264699 |
Workpiece holder for processing apparatus, and processing apparatus using the same |
Sep. 4, 2007 |
| 7264676 |
Plasma apparatus and method capable of adaptive impedance matching |
Sep. 4, 2007 |
| 7256370 |
Vacuum thermal annealer |
Aug. 14, 2007 |
| 7255775 |
Semiconductor wafer treatment member |
Aug. 14, 2007 |
| 7252738 |
Apparatus for reducing polymer deposition on a substrate and substrate support |
Aug. 7, 2007 |
| 7252737 |
Pedestal with integral shield |
Aug. 7, 2007 |
| 7250084 |
Downward mechanism for support pins |
Jul. 31, 2007 |
| 7244336 |
Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
Jul. 17, 2007 |
| 7241346 |
Apparatus for vapor deposition |
Jul. 10, 2007 |
| 7238241 |
Method of producing high aspect ratio domes by vapor deposition |
Jul. 3, 2007 |
| 7235139 |
Wafer carrier for growing GaN wafers |
Jun. 26, 2007 |
| 7235138 |
Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
Jun. 26, 2007 |
| 7232591 |
Method of using an adhesive for temperature control during plasma processing |
Jun. 19, 2007 |
| 7232502 |
Sheet-fed treating device |
Jun. 19, 2007 |
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