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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5624499 |
CVD apparatus |
Apr. 29, 1997 |
| 5620525 |
Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate |
Apr. 15, 1997 |
| 5618350 |
Processing apparatus |
Apr. 8, 1997 |
| 5618351 |
Thermal processing apparatus and process |
Apr. 8, 1997 |
| 5611862 |
Method and apparatus for manufacturing head drums coated with diamond-like carbon coating film using high-frequency plasma |
Mar. 18, 1997 |
| 5611865 |
Alignment of a shadow frame and large flat substrates on a heated support |
Mar. 18, 1997 |
| 5609688 |
Apparatus for producing semiconductor device |
Mar. 11, 1997 |
| 5609691 |
Plasma CVD apparatus for forming a thin film of uniform thickness |
Mar. 11, 1997 |
| 5607510 |
Vacuum processing apparatus |
Mar. 4, 1997 |
| 5605574 |
Semiconductor wafer support apparatus and method |
Feb. 25, 1997 |
| 5605866 |
Clamp with wafer release for semiconductor wafer processing equipment |
Feb. 25, 1997 |
| 5603772 |
Furnace equipped with independently controllable heater elements for uniformly heating semiconductor wafers |
Feb. 18, 1997 |
| 5599397 |
Semiconductor wafer process chamber with suspector back coating |
Feb. 4, 1997 |
| 5595604 |
Wafer supporting boat |
Jan. 21, 1997 |
| 5591269 |
Vacuum processing apparatus |
Jan. 7, 1997 |
| 5591485 |
Method and apparatus for producing nickel shell molds |
Jan. 7, 1997 |
| 5589003 |
Shielded substrate support for processing chamber |
Dec. 31, 1996 |
| 5589224 |
Apparatus for full wafer deposition |
Dec. 31, 1996 |
| 5587019 |
Apparatus for use in epitaxial crystal growth |
Dec. 24, 1996 |
| 5584936 |
Susceptor for semiconductor wafer processing |
Dec. 17, 1996 |
| 5582649 |
Wafer transfer apparatus for use in a film deposition furnace |
Dec. 10, 1996 |
| 5582866 |
Single substrate vacuum processing apparatus having improved exhaust system |
Dec. 10, 1996 |
| 5580384 |
Method and apparatus for chemical coating on opposite surfaces of workpieces |
Dec. 3, 1996 |
| 5580388 |
Multi-layer susceptor for rapid thermal process reactors |
Dec. 3, 1996 |
| 5578532 |
Wafer surface protection in a gas deposition process |
Nov. 26, 1996 |
| 5576058 |
Batch loading system for CVD |
Nov. 19, 1996 |
| 5576059 |
Depositing polysilicon films having improved uniformity and apparatus therefor |
Nov. 19, 1996 |
| 5573981 |
Method of removing residual charges of an electrostatic chuck used in a layer deposition process |
Nov. 12, 1996 |
| 5574247 |
CVD reactor apparatus |
Nov. 12, 1996 |
| 5569350 |
Mechanism and method for mechanically removing a substrate |
Oct. 29, 1996 |
| 5566744 |
Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing |
Oct. 22, 1996 |
| 5567242 |
Apparatus for depositing diamond coating in reactor equipped with a bowl-shaped substrate |
Oct. 22, 1996 |
| 5565382 |
Process for forming tungsten silicide on semiconductor wafer using dichlorosilane gas |
Oct. 15, 1996 |
| 5562774 |
Coated quartz glass component |
Oct. 8, 1996 |
| 5562947 |
Method and apparatus for isolating a susceptor heating element from a chemical vapor deposition environment |
Oct. 8, 1996 |
| 5560775 |
Quartz marking system |
Oct. 1, 1996 |
| 5560780 |
Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same |
Oct. 1, 1996 |
| 5558717 |
CVD Processing chamber |
Sep. 24, 1996 |
| 5556472 |
Film deposition apparatus |
Sep. 17, 1996 |
| 5556476 |
Controlling edge deposition on semiconductor substrates |
Sep. 17, 1996 |
| 5556477 |
Transport device for substrates to be coated in a vacuum coating system |
Sep. 17, 1996 |
| 5551983 |
Method and apparatus for depositing a substance with temperature control |
Sep. 3, 1996 |
| 5549756 |
Optical pyrometer for a thin film deposition system |
Aug. 27, 1996 |
| 5542559 |
Plasma treatment apparatus |
Aug. 6, 1996 |
| 5543022 |
Disc-handling apparatus |
Aug. 6, 1996 |
| 5540821 |
Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing |
Jul. 30, 1996 |
| 5536317 |
Parylene deposition apparatus including a quartz crystal thickness/rate controller |
Jul. 16, 1996 |
| 5536319 |
Parylene deposition apparatus including an atmospheric shroud and inert gas source |
Jul. 16, 1996 |
| 5536321 |
Parylene deposition apparatus including a post-pyrolysis filtering chamber and a deposition chamber inlet filter |
Jul. 16, 1996 |
| 5536322 |
Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device |
Jul. 16, 1996 |
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