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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.


Sub-classes under this class:

Class Number Class Name Patents
118/729 Moving work support 716


Patents under this class:
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Patent Number Title Of Patent Date Issued
5855687 Substrate support shield in wafer processing reactors Jan. 5, 1999
5853485 Pressure gradient CVI/CVD apparatus process and product Dec. 29, 1998
5851298 Susceptor structure for mounting processing object thereon Dec. 22, 1998
5851299 Passive shield for CVD wafer processing which provides frontside edge exclusion and prevents backside depositions Dec. 22, 1998
5848670 Lift pin guidance apparatus Dec. 15, 1998
5849228 Segmented substrate for improved arc-jet diamond deposition Dec. 15, 1998
5850071 Substrate heating equipment for use in a semiconductor fabricating apparatus Dec. 15, 1998
5846332 Thermally floating pedestal collar in a chemical vapor deposition chamber Dec. 8, 1998
5846375 Area specific temperature control for electrode plates and chucks used in semiconductor processing equipment Dec. 8, 1998
5843233 Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus Dec. 1, 1998
5843237 Apparatus for manufacturing a semiconductor device having a wafer loading stage with an annular slope Dec. 1, 1998
5840125 Rapid thermal heating apparatus including a substrate support and an external drive to rotate the same Nov. 24, 1998
5837058 High temperature susceptor Nov. 17, 1998
5830277 Thermal processing system with supplemental resistive heater and shielded optical pyrometry Nov. 3, 1998
5830808 Plasma reactor with magnet for protecting an electroacoustic chuck from the plasma Nov. 3, 1998
5820683 Object-supporting boat Oct. 13, 1998
5820684 Substrate support for an evaporation installation Oct. 13, 1998
5820685 Wafer support device Oct. 13, 1998
5820686 Multi-layer susceptor for rapid thermal process reactors Oct. 13, 1998
5820723 Universal vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support Oct. 13, 1998
5817179 GaAs anneal boat design and method for use Oct. 6, 1998
5814196 Apparatus and method for high throughput sputtering Sep. 29, 1998
5814561 Substrate carrier having a streamlined shape and method for thin film formation Sep. 29, 1998
5810931 High aspect ratio clamp ring Sep. 22, 1998
5810933 Wafer cooling device Sep. 22, 1998
5810935 Apparatus for transferring a wafer Sep. 22, 1998
5810936 Plasma-inert cover and plasma cleaning process and apparatus employing same Sep. 22, 1998
5811762 Heater assembly with dual temperature control for use in PVD/CVD system Sep. 22, 1998
5809211 Ramping susceptor-wafer temperature using a single temperature input Sep. 15, 1998
5803977 Apparatus for full wafer deposition Sep. 8, 1998
5804042 Wafer support structure for a wafer backplane with a curved surface Sep. 8, 1998
5804089 Plasma processing apparatus and method Sep. 8, 1998
5800622 Vapor-phase growth apparatus and compound semiconductor device fabricated thereby Sep. 1, 1998
5800623 Semiconductor wafer support platform Sep. 1, 1998
5796066 Cable actuated drive assembly for vacuum chamber Aug. 18, 1998
5792267 Coating fixture for a turbine engine blade Aug. 11, 1998
5792304 Method of holding substrate and substrate holding system Aug. 11, 1998
5788304 Wafer carrier having both a rigid structure and resistance to corrosive environments Aug. 4, 1998
5785763 Electron-gun evaporation system having evaporation-source stream regulator Jul. 28, 1998
5785764 Susceptor for a gas phase growth apparatus Jul. 28, 1998
5782979 Substrate holder for MOCVD Jul. 21, 1998
5779797 Wafer boat for vertical diffusion and vapor growth furnace Jul. 14, 1998
5769951 Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus Jun. 23, 1998
5767002 Method of manufacturing a multi-layer film each layer having single-layer area Jun. 16, 1998
5766362 Apparatus for depositing barrier film on three-dimensional articles Jun. 16, 1998
5766363 Heater for CVD apparatus Jun. 16, 1998
5766365 Removable ring for controlling edge deposition in substrate processing apparatus Jun. 16, 1998
5762714 Plasma guard for chamber equipped with electrostatic chuck Jun. 9, 1998
5762715 Segmented substrate for improved ARC-JET diamond deposition Jun. 9, 1998
5756964 Thermal processing apparatus May. 26, 1998

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