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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| RE36328 |
Semiconductor manufacturing apparatus including temperature control mechanism |
Oct. 5, 1999 |
| 5961774 |
Method of holding substrate and substrate holding system |
Oct. 5, 1999 |
| 5958139 |
Plasma etch system |
Sep. 28, 1999 |
| 5958198 |
Clamp ring for domed heated pedestal in wafer processing |
Sep. 28, 1999 |
| 5960159 |
Heat treatment of semiconductor wafers where upper heater directly heats upper wafer in its entirety and lower heater directly heats lower wafer in its entirety |
Sep. 28, 1999 |
| 5953630 |
Suppression of tungsten film deposition on a semiconductor wafer bevel edge with a halogenide purge gas |
Sep. 14, 1999 |
| 5951769 |
Method and apparatus for making high refractive index (HRI) film |
Sep. 14, 1999 |
| 5951774 |
Cold-wall operated vapor-phase growth system |
Sep. 14, 1999 |
| 5951775 |
Apparatus for full wafer deposition |
Sep. 14, 1999 |
| 5948704 |
High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support |
Sep. 7, 1999 |
| 5944904 |
Substrate carrier having a streamlined shape and method for thin film formation |
Aug. 31, 1999 |
| 5942041 |
Non-sticking semi-conductor wafer clamp and method of making same |
Aug. 24, 1999 |
| 5942042 |
Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system |
Aug. 24, 1999 |
| 5938850 |
Single wafer heat treatment apparatus |
Aug. 17, 1999 |
| 5935338 |
Chemical vapor deposition chamber |
Aug. 10, 1999 |
| 5935396 |
Method for depositing metal |
Aug. 10, 1999 |
| 5931662 |
Silicon single crystal wafer annealing method and equipment and silicon single crystal wafer and manufacturing method related thereto |
Aug. 3, 1999 |
| 5930661 |
Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers |
Jul. 27, 1999 |
| 5925226 |
Apparatus and method for clamping a substrate |
Jul. 20, 1999 |
| 5926615 |
Temperature compensation method for semiconductor wafers in rapid thermal processor using separated heat conducting rings as susceptors |
Jul. 20, 1999 |
| 5922133 |
Multiple edge deposition exclusion rings |
Jul. 13, 1999 |
| 5916370 |
Semiconductor processing chamber having diamond coated components |
Jun. 29, 1999 |
| 5913653 |
Device for transporting substrates |
Jun. 22, 1999 |
| 5911830 |
Method and fixture for laser bar facet coating |
Jun. 15, 1999 |
| 5911896 |
Substrate heating apparatus with glass-ceramic panels and thin film ribbon heater element |
Jun. 15, 1999 |
| 5910218 |
Systems for forming films having high dielectric constants |
Jun. 8, 1999 |
| 5906684 |
Method of holding substrate and substrate holding system |
May. 25, 1999 |
| 5904776 |
Conduits for flow of heat transfer fluid to the surface of an electrostatic chuck |
May. 18, 1999 |
| 5904779 |
Wafer electrical discharge control by wafer lifter system |
May. 18, 1999 |
| 5900064 |
Plasma process chamber |
May. 4, 1999 |
| 5895549 |
Method and apparatus for etching film layers on large substrates |
Apr. 20, 1999 |
| 5895551 |
Plasma etching apparatus |
Apr. 20, 1999 |
| 5891251 |
CVD reactor having heated process chamber within isolation chamber |
Apr. 6, 1999 |
| 5888304 |
Heater with shadow ring and purge above wafer surface |
Mar. 30, 1999 |
| 5885353 |
Thermal conditioning apparatus |
Mar. 23, 1999 |
| 5885356 |
Method of reducing residue accumulation in CVD chamber using ceramic lining |
Mar. 23, 1999 |
| 5885404 |
Pedestal with self retaining sealing ring for semiconductor device etching system |
Mar. 23, 1999 |
| 5885423 |
Cammed nut for ceramics fastening |
Mar. 23, 1999 |
| 5885428 |
Method and apparatus for both mechanically and electrostatically clamping a wafer to a pedestal within a semiconductor wafer processing system |
Mar. 23, 1999 |
| 5882417 |
Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus |
Mar. 16, 1999 |
| 5882418 |
Jig for use in CVD and method of manufacturing jig for use in CVD |
Mar. 16, 1999 |
| 5882419 |
Chemical vapor deposition chamber |
Mar. 16, 1999 |
| 5874127 |
Method and apparatus for gaseous treatment |
Feb. 23, 1999 |
| 5863334 |
Strength-enhanced quartz boat |
Jan. 26, 1999 |
| 5863340 |
Deposition ring anti-rotation apparatus |
Jan. 26, 1999 |
| 5863843 |
Wafer holder for thermal processing apparatus |
Jan. 26, 1999 |
| 5858100 |
Substrate holder and reaction apparatus |
Jan. 12, 1999 |
| 5858103 |
Vertical wafer boat |
Jan. 12, 1999 |
| 5859408 |
Apparatus for uniformly heating a substrate |
Jan. 12, 1999 |
| 5855675 |
Multipurpose processing chamber for chemical vapor deposition processes |
Jan. 5, 1999 |
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