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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6063203 |
Susceptor for plasma CVD equipment and process for producing the same |
May. 16, 2000 |
| 6056825 |
Rotary chuck including pins for lifting wafers |
May. 2, 2000 |
| 6056849 |
Apparatus for the surface treatment of workpieces by means of a plasma |
May. 2, 2000 |
| 6053982 |
Wafer support system |
Apr. 25, 2000 |
| 6053983 |
Wafer for carrying semiconductor wafers and method detecting wafers on carrier |
Apr. 25, 2000 |
| 6051074 |
Thermal conditioning apparatus |
Apr. 18, 2000 |
| 6051122 |
Deposition shield assembly for a semiconductor wafer processing system |
Apr. 18, 2000 |
| 6051815 |
Apparatus for heat-treating substrate and method for separating the substrate from the apparatus |
Apr. 18, 2000 |
| 6048403 |
Multi-ledge substrate support for a thermal processing chamber |
Apr. 11, 2000 |
| 6048434 |
Substrate holding system including an electrostatic chuck |
Apr. 11, 2000 |
| 6042653 |
Susceptor for bearing an object to be processed thereon |
Mar. 28, 2000 |
| 6040011 |
Substrate support member with a purge gas channel and pumping system |
Mar. 21, 2000 |
| 6035804 |
Process chamber apparatus |
Mar. 14, 2000 |
| 6036426 |
Wafer handling method and apparatus |
Mar. 14, 2000 |
| 6036784 |
Apparatus for holding substrates |
Mar. 14, 2000 |
| 6037006 |
Method and fixture for laser bar facet coating |
Mar. 14, 2000 |
| 6033478 |
Wafer support with improved temperature control |
Mar. 7, 2000 |
| 6033482 |
Method for igniting a plasma in a plasma processing chamber |
Mar. 7, 2000 |
| 6033521 |
Tilt mechanism for wafer cassette |
Mar. 7, 2000 |
| 6035101 |
High temperature multi-layered alloy heater assembly and related methods |
Mar. 7, 2000 |
| 6030455 |
Substrate holder |
Feb. 29, 2000 |
| 6031205 |
Thermal treatment apparatus with thermal protection members intercepting thermal radiation at or above a predetermined angle |
Feb. 29, 2000 |
| 6027569 |
Gas injection systems for a LPCVD furnace |
Feb. 22, 2000 |
| 6027605 |
Plasma etching apparatus and method and apparatus for verifying a wafer |
Feb. 22, 2000 |
| 6022417 |
Support for wafer-shaped objects, in particular silicon wafers |
Feb. 8, 2000 |
| 6022418 |
Vacuum processing method |
Feb. 8, 2000 |
| 6019164 |
Workpiece chuck |
Feb. 1, 2000 |
| 6019166 |
Pickup chuck with an integral heatsink |
Feb. 1, 2000 |
| 6017581 |
Method for coating lenticular articles |
Jan. 25, 2000 |
| 6012509 |
Mechanism and method for holding a substrate on a substrate stage of a substrate treatment apparatus |
Jan. 11, 2000 |
| 6013136 |
Apparatus for plasma-supported back etching of a semiconductor wafer |
Jan. 11, 2000 |
| 6013319 |
Method and apparatus for increasing deposition quality of a chemical vapor deposition system |
Jan. 11, 2000 |
| 6007633 |
Single-substrate-processing apparatus in semiconductor processing system |
Dec. 28, 1999 |
| 6007634 |
Vapor deposition apparatus |
Dec. 28, 1999 |
| 6007635 |
Platform for supporting a semiconductor substrate and method of supporting a substrate during rapid high temperature processing |
Dec. 28, 1999 |
| 6005226 |
Rapid thermal processing (RTP) system with gas driven rotating substrate |
Dec. 21, 1999 |
| 6001180 |
Semiconductor wafer holder with CVD silicon carbide film coating |
Dec. 14, 1999 |
| 5997651 |
Heat treatment apparatus |
Dec. 7, 1999 |
| 5997685 |
Corrosion-resistant apparatus |
Dec. 7, 1999 |
| 5998767 |
Apparatus for processing a substrate wafer and method for operating same |
Dec. 7, 1999 |
| 5998932 |
Focus ring arrangement for substantially eliminating unconfined plasma in a plasma processing chamber |
Dec. 7, 1999 |
| 5989932 |
Method and apparatus for retaining and releasing laser bars during a facet coating operation |
Nov. 23, 1999 |
| 5989349 |
Diagnostic pedestal assembly for a semiconductor wafer processing system |
Nov. 23, 1999 |
| 5985031 |
Spin coating spindle and chuck assembly |
Nov. 16, 1999 |
| 5985033 |
Apparatus and method for delivering a gas |
Nov. 16, 1999 |
| 5985035 |
Method of holding substrate and substrate holding system |
Nov. 16, 1999 |
| 5976255 |
Substrate holder for reducing non-uniform film characteristics resulting from support structures |
Nov. 2, 1999 |
| 5976260 |
Semiconductor producing apparatus, and wafer vacuum chucking device, gas cleaning method and nitride film forming method in semiconductor producing apparatus |
Nov. 2, 1999 |
| 5977519 |
Heating element with a diamond sealing material |
Nov. 2, 1999 |
| 5972114 |
Film deposition apparatus with anti-adhesion film and chamber cooling means |
Oct. 26, 1999 |
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