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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6120610 |
Plasma etch system |
Sep. 19, 2000 |
| 6120640 |
Boron carbide parts and coatings in a plasma reactor |
Sep. 19, 2000 |
| 6120660 |
Removable liner design for plasma immersion ion implantation |
Sep. 19, 2000 |
| 6120661 |
Apparatus for processing glass substrate |
Sep. 19, 2000 |
| 6117246 |
Conductive polymer pad for supporting a workpiece upon a workpiece support surface of an electrostatic chuck |
Sep. 12, 2000 |
| 6118100 |
Susceptor hold-down mechanism |
Sep. 12, 2000 |
| 6113702 |
Wafer support system |
Sep. 5, 2000 |
| 6113704 |
Substrate-supporting device for semiconductor processing |
Sep. 5, 2000 |
| 6113736 |
Gas ring apparatus for semiconductor etching |
Sep. 5, 2000 |
| 6109209 |
Apparatus for use with CVI/CVD processes |
Aug. 29, 2000 |
| 6110284 |
Apparatus and a method for shielding light emanating from a light source heating a semicondutor processing chamber |
Aug. 29, 2000 |
| 6110285 |
Vertical wafer boat |
Aug. 29, 2000 |
| 6110286 |
Vertical processing unit |
Aug. 29, 2000 |
| 6110289 |
Rapid thermal processing barrel reactor for processing substrates |
Aug. 29, 2000 |
| 6110541 |
Chemical vapor deposition method and apparatus for highly textured diamond film formation |
Aug. 29, 2000 |
| 6110556 |
Lid assembly for a process chamber employing asymmetric flow geometries |
Aug. 29, 2000 |
| 6106628 |
Heater unit for chemical vapor deposition systems |
Aug. 22, 2000 |
| 6106630 |
Ceramic-coated heating assembly for high temperature processing chamber |
Aug. 22, 2000 |
| 6106682 |
Thin-film processing electromagnet for low-skew magnetic orientation |
Aug. 22, 2000 |
| 6099645 |
Vertical semiconductor wafer carrier with slats |
Aug. 8, 2000 |
| 6099652 |
Apparatus and method for depositing a substance with temperature control |
Aug. 8, 2000 |
| 6099697 |
Method of and apparatus for restoring a support surface in a semiconductor wafer processing system |
Aug. 8, 2000 |
| 6099705 |
Physical vapor deposition device for forming a uniform metal layer on a semiconductor wafer |
Aug. 8, 2000 |
| 6099706 |
Magnetic film forming apparatus which applies a parallel magnetic field across a substrate |
Aug. 8, 2000 |
| 6096135 |
Method and apparatus for reducing contamination of a substrate in a substrate processing system |
Aug. 1, 2000 |
| 6092851 |
Wafer carrier having both a rigid structure and resistance to corrosive environments |
Jul. 25, 2000 |
| 6093253 |
Method and a device for epitaxial growth of objects by chemical vapor deposition |
Jul. 25, 2000 |
| 6089184 |
CVD apparatus and CVD method |
Jul. 18, 2000 |
| 6089185 |
Thin film forming apparatus |
Jul. 18, 2000 |
| 6090209 |
Thermal conditioning apparatus |
Jul. 18, 2000 |
| 6090211 |
Apparatus and method for forming semiconductor thin layer |
Jul. 18, 2000 |
| 6090212 |
Substrate platform for a semiconductor substrate during rapid high temperature processing and method of supporting a substrate |
Jul. 18, 2000 |
| 6091889 |
Rapid thermal processor for heating a substrate |
Jul. 18, 2000 |
| 6086127 |
Method of making a carrier for at least one wafer |
Jul. 11, 2000 |
| 6086680 |
Low-mass susceptor |
Jul. 11, 2000 |
| 6082298 |
Substrate carrier for a vacuum coating apparatus |
Jul. 4, 2000 |
| 6083360 |
Supplemental heating of deposition tooling shields |
Jul. 4, 2000 |
| 6084215 |
Semiconductor wafer holder with spring-mounted temperature measurement apparatus disposed therein |
Jul. 4, 2000 |
| 6079356 |
Reactor optimized for chemical vapor deposition of titanium |
Jun. 27, 2000 |
| 6077353 |
Pedestal insulator for a pre-clean chamber |
Jun. 20, 2000 |
| 6077357 |
Orientless wafer processing on an electrostatic chuck |
Jun. 20, 2000 |
| 6073576 |
Substrate edge seal and clamp for low-pressure processing equipment |
Jun. 13, 2000 |
| 6073681 |
Workpiece chuck |
Jun. 13, 2000 |
| 6074479 |
Silicon single crystal wafer annealing method and equipment, and silicon single crystal wafer and manufacturing method related thereto |
Jun. 13, 2000 |
| 6074488 |
Plasma chamber support having an electrically coupled collar ring |
Jun. 13, 2000 |
| 6071343 |
Heat treatment jig and method of producing the same |
Jun. 6, 2000 |
| 6068738 |
Method and apparatus for thin film coating an article |
May. 30, 2000 |
| 6063196 |
Semiconductor processing chamber calibration tool |
May. 16, 2000 |
| 6063202 |
Apparatus for backside and edge exclusion of polymer film during chemical vapor deposition |
May. 16, 2000 |
| 6063203 |
Susceptor for plasma CVD equipment and process for producing the same |
May. 16, 2000 |
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