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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6223447 |
Fastening device for a purge ring |
May. 1, 2001 |
| 6224673 |
Apparatus for masking turbine components during vapor phase diffusion coating |
May. 1, 2001 |
| 6224680 |
Wafer transfer system |
May. 1, 2001 |
| 6220203 |
Device for vacuum coating bulk material |
Apr. 24, 2001 |
| 6221201 |
Method of holding substrate and substrate holding system |
Apr. 24, 2001 |
| 6216883 |
Wafer holding hand |
Apr. 17, 2001 |
| 6217655 |
Stand-off pad for supporting a wafer on a substrate support chuck |
Apr. 17, 2001 |
| 6217663 |
Substrate processing apparatus and substrate processing method |
Apr. 17, 2001 |
| 6217705 |
Method of holding substrate and substrate holding system |
Apr. 17, 2001 |
| 6217724 |
Coated platen design for plasma immersion ion implantation |
Apr. 17, 2001 |
| 6214121 |
Pedestal with a thermally controlled platen |
Apr. 10, 2001 |
| 6214122 |
Rapid thermal processing susceptor |
Apr. 10, 2001 |
| 6214123 |
Chemical vapor deposition systems and methods for depositing films on semiconductor wafers |
Apr. 10, 2001 |
| 6214160 |
Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers |
Apr. 10, 2001 |
| 6214184 |
Insulated wafer pedestal |
Apr. 10, 2001 |
| 6210486 |
CVD film forming method in which a film formation preventing gas is supplied in a direction from a rear surface of an object to be processed |
Apr. 3, 2001 |
| 6210546 |
Fixture with at least one trough and method of using the fixture in a plasma or ion beam |
Apr. 3, 2001 |
| 6206976 |
Deposition apparatus and related method with controllable edge exclusion |
Mar. 27, 2001 |
| 6202590 |
Plasma apparatus for fabricating semiconductor devices |
Mar. 20, 2001 |
| 6202592 |
Substrate holder |
Mar. 20, 2001 |
| 6203621 |
Vacuum chuck for holding thin sheet material |
Mar. 20, 2001 |
| 6203622 |
Wafer support system |
Mar. 20, 2001 |
| 6203661 |
Brim and gas escape for non-contact wafer holder |
Mar. 20, 2001 |
| 6200388 |
Substrate support for a thermal processing chamber |
Mar. 13, 2001 |
| 6200412 |
Chemical vapor deposition system including dedicated cleaning gas injection |
Mar. 13, 2001 |
| 6200634 |
Thermal processing system with supplemental resistive heater and shielded optical pyrometry |
Mar. 13, 2001 |
| 6197117 |
Wafer out-of-pocket detector and susceptor leveling tool |
Mar. 6, 2001 |
| 6193801 |
Apparatus for coating lenticular articles |
Feb. 27, 2001 |
| 6193803 |
Substrate holding apparatus for processing semiconductors |
Feb. 27, 2001 |
| 6189483 |
Process kit |
Feb. 20, 2001 |
| 6190460 |
Apparatus for low pressure chemical vapor depostion |
Feb. 20, 2001 |
| 6191390 |
Heating element with a diamond sealing material |
Feb. 20, 2001 |
| 6186091 |
Shielded platen design for plasma immersion ion implantation |
Feb. 13, 2001 |
| 6186092 |
Apparatus and method for aligning and controlling edge deposition on a substrate |
Feb. 13, 2001 |
| 6187103 |
Apparatus and method for transporting wafers |
Feb. 13, 2001 |
| 6187159 |
Mechanism for setting optical lens base material on holder |
Feb. 13, 2001 |
| 6182602 |
Inductively coupled HDP-CVD reactor |
Feb. 6, 2001 |
| 6183523 |
Apparatus for thermal control of variously sized articles in vacuum |
Feb. 6, 2001 |
| 6183565 |
Method and apparatus for supporting a semiconductor wafer during processing |
Feb. 6, 2001 |
| 6184157 |
Stress-loaded film and method for same |
Feb. 6, 2001 |
| 6179924 |
Heater for use in substrate processing apparatus to deposit tungsten |
Jan. 30, 2001 |
| 6180170 |
Device and method for preparing and/or coating the surfaces of hollow construction elements |
Jan. 30, 2001 |
| 6176987 |
System for and method of providing a controlled deposition of wafers |
Jan. 23, 2001 |
| 6177023 |
Method and apparatus for electrostatically maintaining substrate flatness |
Jan. 23, 2001 |
| 6177661 |
Heated stage for holding wafers during semiconductor device fabrication |
Jan. 23, 2001 |
| 6174370 |
Semiconductor wafer chucking device and method for stripping semiconductor wafer |
Jan. 16, 2001 |
| 6174371 |
Substrate treating method and apparatus |
Jan. 16, 2001 |
| 6174377 |
Processing chamber for atomic layer deposition processes |
Jan. 16, 2001 |
| 6170433 |
Method and apparatus for processing a wafer |
Jan. 9, 2001 |
| 6171400 |
Vertical semiconductor wafer carrier |
Jan. 9, 2001 |
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