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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6299691 |
Method of and apparatus for processing a substrate under a reduced pressure |
Oct. 9, 2001 |
| 6299693 |
Method and apparatus for aligning a wafer chuck in a semiconductor wafer processing procedure |
Oct. 9, 2001 |
| 6296705 |
Masking fixture and method |
Oct. 2, 2001 |
| 6296712 |
Chemical vapor deposition hardware and process |
Oct. 2, 2001 |
| 6296735 |
Plasma treatment apparatus and method for operation same |
Oct. 2, 2001 |
| 6293789 |
Semiconductor processing apparatuses |
Sep. 25, 2001 |
| 6294025 |
Device for producing oxidic thin films |
Sep. 25, 2001 |
| 6291800 |
Heat treatment apparatus and substrate processing system |
Sep. 18, 2001 |
| 6287112 |
Wafer boat |
Sep. 11, 2001 |
| 6287385 |
Spring clip for sensitive substrates |
Sep. 11, 2001 |
| 6284048 |
Method of processing wafers with low mass support |
Sep. 4, 2001 |
| 6280584 |
Compliant bond structure for joining ceramic to metal |
Aug. 28, 2001 |
| 6277235 |
In situ plasma clean gas injection |
Aug. 21, 2001 |
| 6273958 |
Substrate support for plasma processing |
Aug. 14, 2001 |
| 6267075 |
Apparatus for cleaning items using gas plasma |
Jul. 31, 2001 |
| 6267821 |
Substrate clamp design for minimizing substrate to clamp sticking during thermal processing of thermally flowable layers |
Jul. 31, 2001 |
| 6267839 |
Electrostatic chuck with improved RF power distribution |
Jul. 31, 2001 |
| 6263904 |
Corrosion resistant gas cylinder and gas delivery system |
Jul. 24, 2001 |
| 6264788 |
Plasma treatment method and apparatus |
Jul. 24, 2001 |
| 6264804 |
System and method for handling and masking a substrate in a sputter deposition system |
Jul. 24, 2001 |
| 6261373 |
Method and apparatus for metal oxide chemical vapor deposition on a substrate surface |
Jul. 17, 2001 |
| 6261407 |
Method and apparatus for removal of thin films from wafers |
Jul. 17, 2001 |
| 6257168 |
Elevated stationary uniformity ring design |
Jul. 10, 2001 |
| 6258170 |
Vaporization and deposition apparatus |
Jul. 10, 2001 |
| 6258228 |
Wafer holder and clamping ring therefor for use in a deposition chamber |
Jul. 10, 2001 |
| 6254683 |
Substrate temperature control method and device |
Jul. 3, 2001 |
| 6254686 |
Vented lower liner for heating exhaust gas from a single substrate reactor |
Jul. 3, 2001 |
| 6255223 |
Substrate handling method and apparatus, and attractive force inspection method and apparatus used therewith |
Jul. 3, 2001 |
| 6251191 |
Processing apparatus and processing system |
Jun. 26, 2001 |
| 6251216 |
Apparatus and method for plasma processing |
Jun. 26, 2001 |
| 6251217 |
Reticle adapter for a reactive ion etch system |
Jun. 26, 2001 |
| 6251218 |
Ion beam processing apparatus |
Jun. 26, 2001 |
| 6248176 |
Apparatus and method for delivering a gas |
Jun. 19, 2001 |
| 6245147 |
Thermal processing jig for use in manufacturing semiconductor devices and method of manufacturing the same |
Jun. 12, 2001 |
| 6245152 |
Method and apparatus for producing epitaxial wafer |
Jun. 12, 2001 |
| 6240875 |
Vertical oven with a boat for the uniform treatment of wafers |
Jun. 5, 2001 |
| 6241825 |
Compliant wafer chuck |
Jun. 5, 2001 |
| 6237527 |
System for improving energy purity and implant consistency, and for minimizing charge accumulation of an implanted substrate |
May. 29, 2001 |
| 6237979 |
Wafer carrier |
May. 29, 2001 |
| 6234107 |
Auxiliary vacuum chamber and vacuum processing unit using same |
May. 22, 2001 |
| 6235146 |
Vacuum treatment system and its stage |
May. 22, 2001 |
| 6235634 |
Modular substrate processing system |
May. 22, 2001 |
| 6231674 |
Wafer edge deposition elimination |
May. 15, 2001 |
| 6231716 |
Processing chamber with rapid wafer exchange |
May. 15, 2001 |
| 6232247 |
Substrate coating apparatus and semiconductor processing method of improving uniformity of liquid deposition |
May. 15, 2001 |
| 6227590 |
Method of constructing a wafer carrier |
May. 8, 2001 |
| 6228174 |
Heat treatment system using ring-shaped radiation heater elements |
May. 8, 2001 |
| 6228176 |
Contoured platen design for plasma immerson ion implantation |
May. 8, 2001 |
| 6229116 |
Heat treatment apparatus |
May. 8, 2001 |
| 6225594 |
Method and apparatus for securing components of wafer processing fixtures |
May. 1, 2001 |
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