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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6406545 |
Semiconductor workpiece processing apparatus and method |
Jun. 18, 2002 |
| 6406590 |
Method and apparatus for surface treatment using plasma |
Jun. 18, 2002 |
| 6402843 |
Non-contact workpiece holder |
Jun. 11, 2002 |
| 6402850 |
Depositing polysilicon films having improved uniformity and apparatus therefor |
Jun. 11, 2002 |
| 6402886 |
Use of a chemically active reticle carrier for photomask etching |
Jun. 11, 2002 |
| 6403925 |
System and method for thermal processing of a semiconductor substrate |
Jun. 11, 2002 |
| 6397883 |
Equipment skid |
Jun. 4, 2002 |
| 6398873 |
Method and apparatus for forming an HSG-Si layer on a wafer |
Jun. 4, 2002 |
| 6394797 |
Substrate temperature control system and method for controlling temperature of substrate |
May. 28, 2002 |
| 6395095 |
Process apparatus and method for improved plasma processing of a substrate |
May. 28, 2002 |
| 6395363 |
Sloped substrate support |
May. 28, 2002 |
| 6386139 |
Wafer load/unload apparatus for E-Gun evaporation process |
May. 14, 2002 |
| 6387185 |
Processing chamber for atomic layer deposition processes |
May. 14, 2002 |
| 6382129 |
Semiconductor wafer processor, plasma generating apparatus, magnetic field generator, and method of generating a magnetic field |
May. 7, 2002 |
| 6378600 |
Thermally conductive chuck with thermally separated sealing structures |
Apr. 30, 2002 |
| 6379492 |
Corrosion resistant coating |
Apr. 30, 2002 |
| 6380518 |
Heat treatment apparatus and substrate processing system |
Apr. 30, 2002 |
| 6375176 |
Workpiece chuck with guard layer having vacuum distribution pattern |
Apr. 23, 2002 |
| 6375748 |
Method and apparatus for preventing edge deposition |
Apr. 23, 2002 |
| 6375749 |
Susceptorless semiconductor wafer support and reactor system for epitaxial layer growth |
Apr. 23, 2002 |
| 6375750 |
Plasma enhanced chemical processing reactor and method |
Apr. 23, 2002 |
| 6372048 |
Gas processing apparatus for object to be processed |
Apr. 16, 2002 |
| 6367413 |
Apparatus for monitoring substrate biasing during plasma processing of a substrate |
Apr. 9, 2002 |
| 6368450 |
Processing apparatus |
Apr. 9, 2002 |
| 6364954 |
High temperature chemical vapor deposition chamber |
Apr. 2, 2002 |
| 6364957 |
Support assembly with thermal expansion compensation |
Apr. 2, 2002 |
| 6364958 |
Plasma assisted semiconductor substrate processing chamber having a plurality of ground path bridges |
Apr. 2, 2002 |
| 6361645 |
Method and device for compensating wafer bias in a plasma processing chamber |
Mar. 26, 2002 |
| 6358324 |
Microwave plasma processing apparatus having a vacuum pump located under a susceptor |
Mar. 19, 2002 |
| 6354832 |
Substrate processing apparatus and substrate processing method |
Mar. 12, 2002 |
| 6355108 |
Film deposition using a finger type shadow frame |
Mar. 12, 2002 |
| 6349668 |
Method and apparatus for thin film deposition on large area substrates |
Feb. 26, 2002 |
| 6350319 |
Micro-environment reactor for processing a workpiece |
Feb. 26, 2002 |
| 6350320 |
Heater for processing chamber |
Feb. 26, 2002 |
| 6347601 |
Film forming apparatus |
Feb. 19, 2002 |
| 6348099 |
Methods and apparatus for depositing premetal dielectric layer at sub-atmospheric and high temperature conditions |
Feb. 19, 2002 |
| 6340501 |
Device and method for manufacturing an optical recording medium |
Jan. 22, 2002 |
| 6336975 |
Thin film forming equipment and method |
Jan. 8, 2002 |
| 6336991 |
Method of holding substrate and substrate holding system |
Jan. 8, 2002 |
| 6337003 |
Vacuum apparatus and driving mechanism therefor |
Jan. 8, 2002 |
| 6328096 |
Workpiece chuck |
Dec. 11, 2001 |
| 6328807 |
Chuck heater for improved planar deposition process |
Dec. 11, 2001 |
| 6328808 |
Apparatus and method for aligning and controlling edge deposition on a substrate |
Dec. 11, 2001 |
| 6328846 |
Device for an etch treatment of a disk-like object |
Dec. 11, 2001 |
| 6325858 |
Long life high temperature process chamber |
Dec. 4, 2001 |
| 6324341 |
Lot-to-lot rapid thermal processing (RTP) chamber preheat optimization |
Nov. 27, 2001 |
| 6323129 |
Process for maintaining a semiconductor substrate layer deposition equipment chamber in a preconditioned and low particulate state |
Nov. 27, 2001 |
| 6315833 |
Silicon carbide sleeve for substrate support assembly |
Nov. 13, 2001 |
| 6310328 |
Rapid thermal processing chamber for processing multiple wafers |
Oct. 30, 2001 |
| 6306244 |
Apparatus for reducing polymer deposition on substrate support |
Oct. 23, 2001 |
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