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Class Information
Number: 118/728
Name: Coating apparatus > Gas or vapor deposition > Work support
Description: Apparatus wherein significance is attributable to a means which holds the base to be coated.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7608163 |
Substrate processing apparatus and method |
Oct. 27, 2009 |
| 7603962 |
Rotary type CVD film forming apparatus for mass production |
Oct. 20, 2009 |
| 7601224 |
Method of supporting a substrate in a gas cushion susceptor system |
Oct. 13, 2009 |
| 7591908 |
Vapor deposition apparatus and vapor deposition method |
Sep. 22, 2009 |
| 7585386 |
Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
Sep. 8, 2009 |
| 7585371 |
Substrate susceptors for receiving semiconductor substrates to be deposited upon |
Sep. 8, 2009 |
| 7582186 |
Method and apparatus for an improved focus ring in a plasma processing system |
Sep. 1, 2009 |
| 7582167 |
Apparatus for reducing entrapment of foreign matter along a moveable shaft of a substrate support |
Sep. 1, 2009 |
| 7582166 |
Holder for supporting wafers during semiconductor manufacture |
Sep. 1, 2009 |
| 7571698 |
Low-frequency bias power in HDP-CVD processes |
Aug. 11, 2009 |
| 7563042 |
Substrate carrying apparatus, substrate carrying method, and coating and developing apparatus |
Jul. 21, 2009 |
| 7554059 |
Heater unit and semiconductor manufacturing apparatus including the same |
Jun. 30, 2009 |
| 7553516 |
System and method of reducing particle contamination of semiconductor substrates |
Jun. 30, 2009 |
| 7547860 |
Microwave plasma processing apparatus for semiconductor element production |
Jun. 16, 2009 |
| 7537673 |
Plasma processing apparatus |
May. 26, 2009 |
| 7534301 |
RF grounding of cathode in process chamber |
May. 19, 2009 |
| 7527694 |
Substrate gripping apparatus |
May. 5, 2009 |
| 7525071 |
Power-supplying member and heating apparatus using the same |
Apr. 28, 2009 |
| 7524397 |
Lower electrode design for higher uniformity |
Apr. 28, 2009 |
| 7520969 |
Notched deposition ring |
Apr. 21, 2009 |
| 7513954 |
Plasma processing apparatus and substrate mounting table employed therein |
Apr. 7, 2009 |
| 7503980 |
Substrate supporting apparatus |
Mar. 17, 2009 |
| 7501161 |
Methods and apparatus for reducing arcing during plasma processing |
Mar. 10, 2009 |
| 7491913 |
Bake apparatus for use in spin-coating equipment |
Feb. 17, 2009 |
| 7481888 |
Heat treatment jig and heat treatment method for silicon wafer |
Jan. 27, 2009 |
| 7470919 |
Substrate support assembly with thermal isolating plate |
Dec. 30, 2008 |
| 7468104 |
Chemical vapor deposition apparatus and deposition method |
Dec. 23, 2008 |
| 7466907 |
Annealing process and device of semiconductor wafer |
Dec. 16, 2008 |
| 7462246 |
Modified susceptor for barrel reactor |
Dec. 9, 2008 |
| 7456429 |
Apparatus for atomic layer deposition |
Nov. 25, 2008 |
| 7455735 |
Width adjustable substrate support for plasma processing |
Nov. 25, 2008 |
| 7455734 |
Substrate processing apparatus, substrate holder, and manufacturing method of semiconductor device |
Nov. 25, 2008 |
| 7449071 |
Wafer holder with peripheral lift ring |
Nov. 11, 2008 |
| 7446284 |
Etch resistant wafer processing apparatus and method for producing the same |
Nov. 4, 2008 |
| 7444955 |
Apparatus for directing plasma flow to coat internal passageways |
Nov. 4, 2008 |
| 7429718 |
Heating and cooling of substrate support |
Sep. 30, 2008 |
| 7427329 |
Temperature control for single substrate semiconductor processing reactor |
Sep. 23, 2008 |
| 7425238 |
Substrate holding device |
Sep. 16, 2008 |
| 7422656 |
Dry etching method and apparatus for use in the LCD device |
Sep. 9, 2008 |
| 7422655 |
Apparatus for performing semiconductor processing on target substrate |
Sep. 9, 2008 |
| 7422637 |
Processing chamber configured for uniform gas flow |
Sep. 9, 2008 |
| 7420143 |
Durable graphite connector and method for manufacturing thereof |
Sep. 2, 2008 |
| 7418921 |
Plasma CVD apparatus for forming uniform film |
Sep. 2, 2008 |
| 7414823 |
Holder for use in semiconductor or liquid-crystal manufacturing device and semiconductor or liquid-crystal manufacturing device in which the holder is installed |
Aug. 19, 2008 |
| 7413982 |
Process for atomic layer deposition |
Aug. 19, 2008 |
| 7413767 |
Gas supply method in a CVD coating system for precursors with a low vapor pressure |
Aug. 19, 2008 |
| 7413628 |
Substrate treatment method and substrate treatment apparatus |
Aug. 19, 2008 |
| 7413610 |
Method and apparatus for coating or heat treatment of blisks for aircraft gas turbines |
Aug. 19, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7396415 |
Apparatus and methods for isolating chemical vapor reactions at a substrate surface |
Jul. 8, 2008 |
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