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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6770851 |
Method and apparatus for the treatment of substrates |
Aug. 3, 2004 |
| 6770852 |
Critical dimension variation compensation across a wafer by means of local wafer temperature control |
Aug. 3, 2004 |
| 6768084 |
Advanced rapid thermal processing (RTP) using a linearly-moving heating assembly with an axisymmetric and radially-tunable thermal radiation profile |
Jul. 27, 2004 |
| 6765178 |
Chamber for uniform substrate heating |
Jul. 20, 2004 |
| 6761771 |
Semiconductor substrate-supporting apparatus |
Jul. 13, 2004 |
| 6762396 |
Deposited resistive coatings |
Jul. 13, 2004 |
| 6758909 |
Gas port sealing for CVD/CVI furnace hearth plates |
Jul. 6, 2004 |
| 6759633 |
Heat treating device |
Jul. 6, 2004 |
| 6756074 |
Methods for the deposition and curing of coating compositions |
Jun. 29, 2004 |
| 6756566 |
Convection heating system for vacuum furnaces |
Jun. 29, 2004 |
| 6753506 |
System and method of fast ambient switching for rapid thermal processing |
Jun. 22, 2004 |
| 6753507 |
Wafer heating apparatus |
Jun. 22, 2004 |
| 6749906 |
Thermal physical vapor deposition apparatus with detachable vapor source(s) and method |
Jun. 15, 2004 |
| 6744017 |
Wafer heating devices for use in ion implantation systems |
Jun. 1, 2004 |
| 6744018 |
Substrate processing apparatus and method for manufacturing semiconductor device |
Jun. 1, 2004 |
| 6744023 |
Method and apparatus for cooling a CVI/CVD furnace |
Jun. 1, 2004 |
| 6740166 |
Thin film deposition apparatus for semiconductor |
May. 25, 2004 |
| 6741804 |
Apparatus and method for rapid thermal processing |
May. 25, 2004 |
| 6737613 |
Heat treatment apparatus and method for processing substrates |
May. 18, 2004 |
| 6736206 |
Thermal processor |
May. 18, 2004 |
| 6736901 |
Vertical chemical vapor deposition system |
May. 18, 2004 |
| 6733592 |
High-temperature and high-pressure treatment device |
May. 11, 2004 |
| 6733593 |
Film forming device |
May. 11, 2004 |
| 6735378 |
Pressure controlled heat source and method for using such for RTP |
May. 11, 2004 |
| 6729261 |
Plasma processing apparatus |
May. 4, 2004 |
| 6727191 |
High temperature hydrogen anneal of silicon wafers supported on a silicon fixture |
Apr. 27, 2004 |
| 6727474 |
Rapid thermal processing chamber for processing multiple wafers |
Apr. 27, 2004 |
| 6723202 |
Worktable device and plasma processing apparatus for semiconductor process |
Apr. 20, 2004 |
| 6720531 |
Light scattering process chamber walls |
Apr. 13, 2004 |
| 6720533 |
Heater assembly for heating a wafer |
Apr. 13, 2004 |
| 6717112 |
Apparatus for annealing a multi-layer body, and such a multi-layer body |
Apr. 6, 2004 |
| 6717113 |
Method for substrate thermal management |
Apr. 6, 2004 |
| 6717115 |
Semiconductor handler for rapid testing |
Apr. 6, 2004 |
| 6718127 |
Heating device of the light irradiation type |
Apr. 6, 2004 |
| 6709520 |
Reactor and method for chemical vapor deposition |
Mar. 23, 2004 |
| 6709523 |
Silylation treatment unit and method |
Mar. 23, 2004 |
| 6709525 |
Low pressure chemical vapor deposition apparatus of vertical type for fabricating semiconductor devices |
Mar. 23, 2004 |
| 6707011 |
Rapid thermal processing system for integrated circuits |
Mar. 16, 2004 |
| 6705394 |
Rapid cycle chuck for low-pressure processing |
Mar. 16, 2004 |
| 6702897 |
Optical transmission systems and apparatuses including bragg gratings and methods of making |
Mar. 9, 2004 |
| 6703592 |
System of controlling the temperature of a processing chamber |
Mar. 9, 2004 |
| 6704496 |
High temperature drop-off of a substrate |
Mar. 9, 2004 |
| 6700099 |
Wafer chuck having thermal plate with interleaved heating and cooling elements, interchangeable top surface assemblies and hard coated layer surfaces |
Mar. 2, 2004 |
| 6692575 |
Apparatus for supporting a substrate in a reaction chamber |
Feb. 17, 2004 |
| 6688254 |
Vapor deposition temperature control apparatus and method |
Feb. 10, 2004 |
| 6688375 |
Vacuum processing system having improved substrate heating and cooling |
Feb. 10, 2004 |
| 6689221 |
Cooling gas delivery system for a rotatable semiconductor substrate support assembly |
Feb. 10, 2004 |
| 6686571 |
Heat treatment unit, cooling unit and cooling treatment method |
Feb. 3, 2004 |
| 6676804 |
Method and apparatus for plasma processing |
Jan. 13, 2004 |
| 6676805 |
Method of holding substrate and substrate holding system |
Jan. 13, 2004 |
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