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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6863732 |
Heat treatment system and method |
Mar. 8, 2005 |
| 6860965 |
High throughput architecture for semiconductor processing |
Mar. 1, 2005 |
| 6861321 |
Method of loading a wafer onto a wafer holder to reduce thermal shock |
Mar. 1, 2005 |
| 6861620 |
Ceramic heater |
Mar. 1, 2005 |
| 6862404 |
Focused photon energy heating chamber |
Mar. 1, 2005 |
| 6858087 |
Vacuum-processing method using a movable cooling plate during processing |
Feb. 22, 2005 |
| 6859616 |
Apparatus for and method of heat treatment by light irradiation |
Feb. 22, 2005 |
| 6855207 |
Apparatus and system for eliminating contaminants on a substrate surface |
Feb. 15, 2005 |
| 6855916 |
Wafer temperature trajectory control method for high temperature ramp rate applications using dynamic predictive thermal modeling |
Feb. 15, 2005 |
| 6853802 |
Heat treatment for edges of multilayer semiconductor wafers |
Feb. 8, 2005 |
| 6849131 |
Truncated dummy plate for process furnace |
Feb. 1, 2005 |
| 6849134 |
Minimum volume oven for producing uniform pyrolytic oxide coatings on capacitor anodes |
Feb. 1, 2005 |
| 6849831 |
Pulsed processing semiconductor heating methods using combinations of heating sources |
Feb. 1, 2005 |
| 6845732 |
Gas heating apparatus for chemical vapor deposition process and semiconductor device fabrication method using same |
Jan. 25, 2005 |
| 6847012 |
Apparatus and method for measuring the temperature of substrates |
Jan. 25, 2005 |
| 6843201 |
Temperature control for single substrate semiconductor processing reactor |
Jan. 18, 2005 |
| 6843202 |
Thermal processing apparatus for substrate employing photoirradiation |
Jan. 18, 2005 |
| 6844527 |
Multi-thermal zone shielding apparatus |
Jan. 18, 2005 |
| 6844528 |
Hot wall rapid thermal processor |
Jan. 18, 2005 |
| 6842582 |
Light heating apparatus and method therefor |
Jan. 11, 2005 |
| 6840763 |
Wafer processing apparatus |
Jan. 11, 2005 |
| 6841049 |
OPTICAL DEVICE SUBSTRATE FILM-FORMATION APPARATUS, OPTICAL DISK SUBSTRATE FILM-FORMATION METHOD, SUBSTRATE HOLDER MANUFACTURE METHOD, SUBSTRATE HOLDER, OPTICAL DISK AND A PHASE-CHANGE RECORDIN |
Jan. 11, 2005 |
| 6838643 |
Method and apparatus for performing baking treatment to semiconductor wafer |
Jan. 4, 2005 |
| 6838645 |
Heater assembly for manufacturing a semiconductor device |
Jan. 4, 2005 |
| 6838646 |
Susceptor device |
Jan. 4, 2005 |
| 6835914 |
Apparatus and method for reducing stray light in substrate processing chambers |
Dec. 28, 2004 |
| 6834158 |
Pinhole defect repair by resist flow |
Dec. 21, 2004 |
| 6833031 |
Method and device for coating a substrate |
Dec. 21, 2004 |
| 6830622 |
Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof |
Dec. 14, 2004 |
| 6830626 |
Method and apparatus for coating a substrate in a vacuum |
Dec. 14, 2004 |
| 6825447 |
Apparatus and method for uniform substrate heating and contaminate collection |
Nov. 30, 2004 |
| 6821378 |
Pump baffle and screen to improve etch uniformity |
Nov. 23, 2004 |
| 6821380 |
Temperature adjustment apparatus |
Nov. 23, 2004 |
| 6818864 |
LED heat lamp arrays for CVD heating |
Nov. 16, 2004 |
| 6808567 |
Gas treatment apparatus |
Oct. 26, 2004 |
| 6808758 |
Pulse precursor deposition process for forming layers in semiconductor devices |
Oct. 26, 2004 |
| 6805749 |
Method and apparatus for supporting a semiconductor wafer during processing |
Oct. 19, 2004 |
| 6802942 |
Storage plate support for receiving disk-shaped storage plates |
Oct. 12, 2004 |
| 6803546 |
Thermally processing a substrate |
Oct. 12, 2004 |
| 6797109 |
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates |
Sep. 28, 2004 |
| 6793734 |
Heating furnace and semiconductor wafer-holding jig assembly and process of manufacturing semiconductor devices |
Sep. 21, 2004 |
| 6786974 |
Insulating film forming method and insulating film forming apparatus |
Sep. 7, 2004 |
| 6782843 |
Actively-cooled distribution plate for reducing reactive gas temperature in a plasma processing system |
Aug. 31, 2004 |
| 6783630 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Aug. 31, 2004 |
| 6776847 |
Film formation apparatus and film formation method and cleaning method |
Aug. 17, 2004 |
| 6776849 |
Wafer holder with peripheral lift ring |
Aug. 17, 2004 |
| 6776874 |
Processing method and apparatus for removing oxide film |
Aug. 17, 2004 |
| 6778762 |
Sloped chamber top for substrate processing |
Aug. 17, 2004 |
| 6775471 |
Method and device for thermally treating objects |
Aug. 10, 2004 |
| 6769908 |
Wafer heat-treatment system and wafer heat-treatment method |
Aug. 3, 2004 |
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