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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.


Sub-classes under this class:

Class Number Class Name Patents
118/725 Substrate heater 1,692


Patents under this class:

Patent Number Title Of Patent Date Issued
7018479 Rotating semiconductor processing apparatus Mar. 28, 2006
7019263 Substrate heating apparatus and multi-chamber substrate processing system Mar. 28, 2006
7019268 Wafer processing apparatus and method of use Mar. 28, 2006
7017658 Heat processing device Mar. 28, 2006
7015422 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy Mar. 21, 2006
7015426 Purged heater-susceptor for an ALD/CVD reactor Mar. 21, 2006
7011710 Concentration profile on demand gas delivery system (individual divert delivery system) Mar. 14, 2006
7011711 Chemical vapor deposition reactor Mar. 14, 2006
7009148 Method of processing a substrate, heating apparatus, and method of forming a pattern Mar. 7, 2006
7000418 Capacitance sensing for substrate cooling Feb. 21, 2006
7003219 Substrate processing method Feb. 21, 2006
6998579 Chamber for uniform substrate heating Feb. 14, 2006
6998580 Thermal processing apparatus and thermal processing method Feb. 14, 2006
6991684 Heat-treating apparatus and heat-treating method Jan. 31, 2006
6991701 Plasma treatment method and apparatus Jan. 31, 2006
6992270 Wafer bake system and method for operating the same Jan. 31, 2006
6992876 Electrostatic chuck and its manufacturing method Jan. 31, 2006
6984267 Manufacture system for semiconductor device with thin gate insulating film Jan. 10, 2006
6981465 Chemical vapor deposition process and apparatus thereof Jan. 3, 2006
6979659 Silicon fixture supporting silicon wafers during high temperature processing Dec. 27, 2005
6970644 Heating configuration for use in thermal processing chambers Nov. 29, 2005
6969829 Substrate processing apparatus Nov. 29, 2005
6969830 Wafer chuck having thermal plate with interleaved heating and cooling elements Nov. 29, 2005
6965092 Ultra fast rapid thermal processing chamber and method of use Nov. 15, 2005
6965093 Device for thermally treating substrates Nov. 15, 2005
6963052 Heater module for semiconductor manufacturing equipment Nov. 8, 2005
6963692 Heat-treating methods and systems Nov. 8, 2005
6957690 Apparatus for thermal treatment of substrates Oct. 25, 2005
6958098 Semiconductor wafer support lift-pin assembly Oct. 25, 2005
6955720 Plasma deposition of spin chucks to reduce contamination of Silicon wafers Oct. 18, 2005
6955741 Semiconductor-processing reaction chamber Oct. 18, 2005
6955925 Annealing Oct. 18, 2005
6956186 Ceramic heater Oct. 18, 2005
6954585 Substrate processing method and apparatus Oct. 11, 2005
6952889 Forced convection assisted rapid thermal furnace Oct. 11, 2005
6951821 Processing system and method for chemically treating a substrate Oct. 4, 2005
6951996 Pulsed processing semiconductor heating methods using combinations of heating sources Oct. 4, 2005
6949143 Dual substrate loadlock process equipment Sep. 27, 2005
6949474 Method of manufacturing a semiconductor device and a semiconductor manufacture system Sep. 27, 2005
6949719 Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator Sep. 27, 2005
6946033 Heated gas distribution plate for a processing chamber Sep. 20, 2005
6939579 ALD reactor and method with controlled wall temperature Sep. 6, 2005
6940047 Heat treatment apparatus with temperature control system Sep. 6, 2005
6941063 Heat-treating methods and systems Sep. 6, 2005
6935269 Apparatus for treating the surface with neutral particle beams Aug. 30, 2005
6935466 Lift pin alignment and operation methods and apparatus Aug. 30, 2005
6936108 Heat treatment device Aug. 30, 2005
6936797 Thermal processing method and thermal processing apparatus for substrate employing photoirradiation Aug. 30, 2005
6932871 Multi-station deposition apparatus and method Aug. 23, 2005
6932873 Managing work-piece deflection Aug. 23, 2005



 
 
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