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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7268322 |
Semiconductor heating apparatus |
Sep. 11, 2007 |
| 7268321 |
Wafer holder and semiconductor manufacturing apparatus |
Sep. 11, 2007 |
| 7256370 |
Vacuum thermal annealer |
Aug. 14, 2007 |
| 7252738 |
Apparatus for reducing polymer deposition on a substrate and substrate support |
Aug. 7, 2007 |
| 7241346 |
Apparatus for vapor deposition |
Jul. 10, 2007 |
| 7235139 |
Wafer carrier for growing GaN wafers |
Jun. 26, 2007 |
| 7235137 |
Conductor treating single-wafer type treating device and method for semi-conductor treating |
Jun. 26, 2007 |
| 7230204 |
Method and system for temperature control of a substrate |
Jun. 12, 2007 |
| 7220319 |
Electrostatic chucking stage and substrate processing apparatus |
May. 22, 2007 |
| 7211769 |
Heating chamber and method of heating a wafer |
May. 1, 2007 |
| 7211152 |
Heating element CVD system and connection structure between heating element and electric power supply mechanism in the heating element CVD system |
May. 1, 2007 |
| 7204913 |
In-situ pre-coating of plasma etch chamber for improved productivity and chamber condition control |
Apr. 17, 2007 |
| 7204887 |
Wafer holding, wafer support member, wafer boat and heat treatment furnace |
Apr. 17, 2007 |
| 7204885 |
Deposition system to provide preheating of chemical vapor deposition precursors |
Apr. 17, 2007 |
| 7201942 |
Coating method |
Apr. 10, 2007 |
| 7195693 |
Lateral temperature equalizing system for large area surfaces during processing |
Mar. 27, 2007 |
| 7194821 |
Vacuum processing apparatus and vacuum processing method |
Mar. 27, 2007 |
| 7194199 |
Stacked annealing system |
Mar. 20, 2007 |
| 7186313 |
Plasma chamber wall segment temperature control |
Mar. 6, 2007 |
| 7184657 |
Enhanced rapid thermal processing apparatus and method |
Feb. 27, 2007 |
| 7182122 |
Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus |
Feb. 27, 2007 |
| 7175737 |
Electrostatic chucking stage and substrate processing apparatus |
Feb. 13, 2007 |
| 7169233 |
Reactor chamber |
Jan. 30, 2007 |
| 7166187 |
Segmented cold plate for rapid thermal processing (RTP) tool for conduction cooling |
Jan. 23, 2007 |
| 7166166 |
Method and apparatus for an improved baffle plate in a plasma processing system |
Jan. 23, 2007 |
| 7163587 |
Reactor assembly and processing method |
Jan. 16, 2007 |
| 7156951 |
Multiple zone gas distribution apparatus for thermal control of semiconductor wafer |
Jan. 2, 2007 |
| 7156924 |
System and method for heating and cooling wafer at accelerated rates |
Jan. 2, 2007 |
| 7147720 |
Non-contact cool-down station for wafers |
Dec. 12, 2006 |
| 7147719 |
Double slit-valve doors for plasma processing |
Dec. 12, 2006 |
| 7147718 |
Device and method for the deposition of, in particular, crystalline layers on, in particular, crystalline substrates |
Dec. 12, 2006 |
| 7145106 |
Heater module for semiconductor manufacturing equipment |
Dec. 5, 2006 |
| 7141763 |
Method and apparatus for rapid temperature change and control |
Nov. 28, 2006 |
| 7141095 |
Precursor material delivery system for atomic layer deposition |
Nov. 28, 2006 |
| 7138607 |
Determining method of thermal processing condition |
Nov. 21, 2006 |
| 7138606 |
Wafer processing method |
Nov. 21, 2006 |
| 7135656 |
Apparatus and method for reducing stray light in substrate processing chambers |
Nov. 14, 2006 |
| 7126093 |
Heating systems |
Oct. 24, 2006 |
| 7126090 |
Ceramic heaters, a method for producing the same and articles having metal members |
Oct. 24, 2006 |
| 7126087 |
Method of effecting heating and cooling in reduced pressure atmosphere |
Oct. 24, 2006 |
| 7115840 |
Wafer bake apparatus |
Oct. 3, 2006 |
| 7115839 |
Heaters |
Oct. 3, 2006 |
| 7115838 |
Unit for varying a temperature of a test piece and testing instrument incorporating same |
Oct. 3, 2006 |
| 7115837 |
Selective reflectivity process chamber with customized wavelength response and method |
Oct. 3, 2006 |
| 7115168 |
Patterned thin-film deposition using collimating heated masked assembly |
Oct. 3, 2006 |
| 7112763 |
Method and apparatus for low temperature pyrometry useful for thermally processing silicon wafers |
Sep. 26, 2006 |
| 7110665 |
Thermal treatment equipment, thermal treatment method and manufacturing method of image display apparatus |
Sep. 19, 2006 |
| 7109131 |
System and method for hydrogen-rich selective oxidation |
Sep. 19, 2006 |
| 7108753 |
Staggered ribs on process chamber to reduce thermal effects |
Sep. 19, 2006 |
| 7102104 |
Heat treatment system |
Sep. 5, 2006 |
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