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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5480678 |
Apparatus for use with CVI/CVD processes |
Jan. 2, 1996 |
| 5478397 |
Heat treating device |
Dec. 26, 1995 |
| 5478429 |
Plasma process apparatus |
Dec. 26, 1995 |
| 5478609 |
Substrate heating mechanism |
Dec. 26, 1995 |
| 5476693 |
Method for the deposition of diamond film by high density direct current glow discharge |
Dec. 19, 1995 |
| 5472550 |
Method and apparatus for protecting a substrate surface from contamination using the photophoretic effect |
Dec. 5, 1995 |
| 5462602 |
Apparatus for continuous reactive metal deposition in vacuum with web looping over upper and lower rollers |
Oct. 31, 1995 |
| 5462603 |
Semiconductor processing apparatus |
Oct. 31, 1995 |
| 5458685 |
Vertical heat treatment apparatus |
Oct. 17, 1995 |
| 5458687 |
Method of and apparatus for securing and cooling/heating a wafer |
Oct. 17, 1995 |
| 5458688 |
Heat treatment boat |
Oct. 17, 1995 |
| 5458689 |
Apparatus and method for growing semiconductor crystal |
Oct. 17, 1995 |
| 5456945 |
Method and apparatus for material deposition |
Oct. 10, 1995 |
| 5453125 |
ECR plasma source for gas abatement |
Sep. 26, 1995 |
| 5451258 |
Apparatus and method for improved delivery of vaporized reactant gases to a reaction chamber |
Sep. 19, 1995 |
| 5451259 |
ECR plasma source for remote processing |
Sep. 19, 1995 |
| 5452396 |
Optical processing furnace with quartz muffle and diffuser plate |
Sep. 19, 1995 |
| 5449444 |
Method and apparatus for forming a film by sputtering process |
Sep. 12, 1995 |
| 5447568 |
Chemical vapor deposition method and apparatus making use of liquid starting material |
Sep. 5, 1995 |
| 5446824 |
Lamp-heated chuck for uniform wafer processing |
Aug. 29, 1995 |
| 5446825 |
High performance multi-zone illuminator module for semiconductor wafer processing |
Aug. 29, 1995 |
| 5445677 |
Apparatus for manufacturing semiconductor and method of manufacturing semiconductor |
Aug. 29, 1995 |
| 5445699 |
Processing apparatus with a gas distributor having back and forth parallel movement relative to a workpiece support surface |
Aug. 29, 1995 |
| 5443648 |
Vertical heat treatment apparatus with a rotary holder turning independently of a liner plate |
Aug. 22, 1995 |
| 5443686 |
Plasma CVD apparatus and processes |
Aug. 22, 1995 |
| 5444815 |
Multi-zone lamp interference correction system |
Aug. 22, 1995 |
| 5442727 |
Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies |
Aug. 15, 1995 |
| 5439715 |
Process and apparatus for microwave plasma chemical vapor deposition |
Aug. 8, 1995 |
| 5437728 |
Apparatus and method for chemical vapor deposition of diamond |
Aug. 1, 1995 |
| 5433791 |
MBE apparatus with photo-cracker cell |
Jul. 18, 1995 |
| 5431735 |
Phosphorus effusion cell for molecular beam epitaxy |
Jul. 11, 1995 |
| 5430271 |
Method of heat treating a substrate with standby and treatment time periods |
Jul. 4, 1995 |
| 5421288 |
Process for growing silicon epitaxial layer |
Jun. 6, 1995 |
| 5421888 |
Low pressure CVD apparatus comprising gas distribution collimator |
Jun. 6, 1995 |
| 5421892 |
Vertical heat treating apparatus |
Jun. 6, 1995 |
| 5418885 |
Three-zone rapid thermal processing system utilizing wafer edge heating means |
May. 23, 1995 |
| 5411076 |
Substrate cooling device and substrate heat-treating apparatus |
May. 2, 1995 |
| 5411591 |
Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones |
May. 2, 1995 |
| 5409539 |
Slotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector system |
Apr. 25, 1995 |
| 5407485 |
Apparatus for producing semiconductor device and method for producing semiconductor device |
Apr. 18, 1995 |
| 5405444 |
Process chamber purge module for semiconductor processing equipment |
Apr. 11, 1995 |
| 5405445 |
Vacuum extraction system for chemical vapor deposition reactor vessel and trapping device incorporated therein |
Apr. 11, 1995 |
| 5397396 |
Apparatus for chemical vapor deposition of diamond including thermal spreader |
Mar. 14, 1995 |
| 5395445 |
Method and apparatus for detecting fingerprints on skin |
Mar. 7, 1995 |
| 5395647 |
Apparatus and method for cooling films coated in a vacuum |
Mar. 7, 1995 |
| 5387288 |
Apparatus for depositing diamond and refractory materials comprising rotating antenna |
Feb. 7, 1995 |
| 5383969 |
Process and apparatus for supplying zinc vapor continuously to a chemical vapor deposition process from a continuous supply of solid zinc |
Jan. 24, 1995 |
| 5383971 |
Differential pressure CVD chuck |
Jan. 24, 1995 |
| 5378284 |
Apparatus for coating substrates using a microwave ECR plasma source |
Jan. 3, 1995 |
| 5374314 |
Methods and apparatus for externally treating a container with application of internal bias gas |
Dec. 20, 1994 |
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