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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.


Sub-classes under this class:

Class Number Class Name Patents
118/725 Substrate heater 1,692


Patents under this class:
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Patent Number Title Of Patent Date Issued
5595606 Shower head and film forming apparatus using the same Jan. 21, 1997
5593740 Method and apparatus for making carbon-encapsulated ultrafine metal particles Jan. 14, 1997
5591267 Reduced pressure device Jan. 7, 1997
5591485 Method and apparatus for producing nickel shell molds Jan. 7, 1997
5584934 Method and apparatus for preventing distortion of horizontal quartz tube caused by high temperature Dec. 17, 1996
5584971 Treatment apparatus control method Dec. 17, 1996
5582649 Wafer transfer apparatus for use in a film deposition furnace Dec. 10, 1996
5580822 Chemical vapor deposition method Dec. 3, 1996
5578132 Apparatus for heat treating semiconductors at normal pressure and low pressure Nov. 26, 1996
5577157 Optical processing furnace with quartz muffle and diffuser plate Nov. 19, 1996
5571330 Load lock chamber for vertical type heat treatment apparatus Nov. 5, 1996
5571333 Heat treatment furnace with an exhaust baffle Nov. 5, 1996
5571749 Method and apparatus for forming deposited film Nov. 5, 1996
5566744 Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing Oct. 22, 1996
5567237 Continuous drier for board-shaped piece material and coating installation comprising such a continuous drier Oct. 22, 1996
5567267 Method of controlling temperature of susceptor Oct. 22, 1996
5558736 Electron cyclotron resonance apparatus Sep. 24, 1996
5554222 Ionization deposition apparatus Sep. 10, 1996
5554226 Heat treatment processing apparatus and cleaning method thereof Sep. 10, 1996
5551984 Vertical heat treatment apparatus with a circulation gas passage Sep. 3, 1996
5551985 Method and apparatus for cold wall chemical vapor deposition Sep. 3, 1996
5542559 Plasma treatment apparatus Aug. 6, 1996
5540780 Molecular beam epitaxy effusion cell Jul. 30, 1996
5540782 Heat treating apparatus having heat transmission-preventing plates Jul. 30, 1996
5539855 Apparatus for measuring the temperature of a substrate Jul. 23, 1996
5536317 Parylene deposition apparatus including a quartz crystal thickness/rate controller Jul. 16, 1996
5536319 Parylene deposition apparatus including an atmospheric shroud and inert gas source Jul. 16, 1996
5536322 Parylene deposition apparatus including a heated and cooled support platen and an electrostatic clamping device Jul. 16, 1996
5536918 Heat treatment apparatus utilizing flat heating elements for treating semiconductor wafers Jul. 16, 1996
5534068 Parylene deposition apparatus including a tapered deposition chamber and dual vacuum outlet pumping arrangement Jul. 9, 1996
5529633 Apparatus for depositing a substance on a rotating surface Jun. 25, 1996
5527392 Substrate temperature control apparatus for CVD reactors Jun. 18, 1996
5520742 Thermal processing apparatus with heat shielding member May. 28, 1996
5518593 Shield configuration for vacuum chamber May. 21, 1996
5514414 Solvent-less vapor deposition apparatus and process for application of soldering fluxes May. 7, 1996
5511608 Clampless vacuum heat transfer station Apr. 30, 1996
5509967 Heat treatment apparatus Apr. 23, 1996
5508071 CVD diamond coating annulus components and method of their fabrication Apr. 16, 1996
5505544 Chamber temperature uniformity test fixture Apr. 9, 1996
5503678 Vertical low pressure CVD apparatus with an adjustable nozzle Apr. 2, 1996
5504831 System for compensating against wafer edge heat loss in rapid thermal processing Apr. 2, 1996
5500047 Apparatus for adsorbing atomic hydrogen on surface Mar. 19, 1996
5498292 Heating device used for a gas phase growing mechanism or heat treatment mechanism Mar. 12, 1996
5496410 Plasma processing apparatus and method of processing substrates by using same apparatus Mar. 5, 1996
5489446 Device for forming silicon oxide film Feb. 6, 1996
5487786 Plasma chemical vapor deposition device capable of suppressing generation of polysilane powder Jan. 30, 1996
5482558 Heat treatment boat support Jan. 9, 1996
5482559 Heat treatment boat Jan. 9, 1996
5479874 CVD diamond production using preheating Jan. 2, 1996
5480488 Apparatus for supplying CVD coating devices Jan. 2, 1996

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