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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7411161 |
Susceptor for deposition process equipment and method of fabricating a heater therein |
Aug. 12, 2008 |
| 7408131 |
Wafer holder and semiconductor manufacturing apparatus |
Aug. 5, 2008 |
| 7402778 |
Oven for controlled heating of compounds at varying temperatures |
Jul. 22, 2008 |
| 7396432 |
Composite shadow ring assembled with dowel pins and method of using |
Jul. 8, 2008 |
| 7396411 |
Apparatus for manufacturing single crystal |
Jul. 8, 2008 |
| 7393418 |
Susceptor |
Jul. 1, 2008 |
| 7387686 |
Film formation apparatus |
Jun. 17, 2008 |
| 7381928 |
Thermal processing apparatus and thermal processing method |
Jun. 3, 2008 |
| 7381293 |
Convex insert ring for etch chamber |
Jun. 3, 2008 |
| 7381276 |
Susceptor pocket with beveled projection sidewall |
Jun. 3, 2008 |
| 7381275 |
Apparatus and method for manufacturing semiconductor |
Jun. 3, 2008 |
| 7381052 |
Apparatus and method for heating substrates |
Jun. 3, 2008 |
| 7378618 |
Rapid conductive cooling using a secondary process plane |
May. 27, 2008 |
| 7371998 |
Thermal wafer processor |
May. 13, 2008 |
| 7371997 |
Thermal processing apparatus and thermal processing method |
May. 13, 2008 |
| 7361230 |
Substrate processing apparatus |
Apr. 22, 2008 |
| 7361229 |
Device for deposition with chamber cleaner and method for cleaning chamber |
Apr. 22, 2008 |
| 7358462 |
Apparatus and method for reducing stray light in substrate processing chambers |
Apr. 15, 2008 |
| 7354622 |
Method for forming thin film and apparatus for forming thin film |
Apr. 8, 2008 |
| 7351936 |
Method and apparatus for preventing baking chamber exhaust line clog |
Apr. 1, 2008 |
| 7347901 |
Thermally zoned substrate holder assembly |
Mar. 25, 2008 |
| 7338578 |
Step edge insert ring for etch chamber |
Mar. 4, 2008 |
| 7337745 |
Electrode, susceptor, plasma processing apparatus and method of making the electrode and the susceptor |
Mar. 4, 2008 |
| 7335278 |
Plasma processing apparatus and plasma processing method |
Feb. 26, 2008 |
| 7335267 |
Heat treating apparatus having rotatable heating unit |
Feb. 26, 2008 |
| 7332691 |
Cooling plate, bake unit, and substrate treating apparatus |
Feb. 19, 2008 |
| 7332039 |
Plasma processing apparatus and method thereof |
Feb. 19, 2008 |
| 7332038 |
Device for depositing in particular crystalline layers on one or more, in particular likewise crystalline substrates |
Feb. 19, 2008 |
| 7327948 |
Cast pedestal with heating element and coaxial heat exchanger |
Feb. 5, 2008 |
| 7326303 |
Single-pass growth of multilayer patterned electronic and photonic devices using a scanning localized evaporation methodology (SLEM) |
Feb. 5, 2008 |
| 7321722 |
Method for thermal processing a semiconductor wafer |
Jan. 22, 2008 |
| 7313931 |
Method and device for heat treatment |
Jan. 1, 2008 |
| 7312422 |
Semiconductor batch heating assembly |
Dec. 25, 2007 |
| 7311797 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Dec. 25, 2007 |
| 7311782 |
Apparatus for active temperature control of susceptors |
Dec. 25, 2007 |
| 7300537 |
Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
Nov. 27, 2007 |
| 7297906 |
Integrated thermal unit having a shuttle with two-axis movement |
Nov. 20, 2007 |
| 7297894 |
Method for multi-step temperature control of a substrate |
Nov. 20, 2007 |
| 7288746 |
Integrated thermal unit having laterally adjacent bake and chill plates on different planes |
Oct. 30, 2007 |
| 7279068 |
Temperature control assembly for use in etching processes |
Oct. 9, 2007 |
| 7279048 |
Semiconductor manufacturing apparatus |
Oct. 9, 2007 |
| 7279047 |
Reactor for extended duration growth of gallium containing single crystals |
Oct. 9, 2007 |
| 7276124 |
Reactor having a movable shutter |
Oct. 2, 2007 |
| 7275749 |
Substrate supporting apparatus |
Oct. 2, 2007 |
| 7274867 |
System and method for determining the temperature of a semiconductor wafer |
Sep. 25, 2007 |
| 7274006 |
Heater |
Sep. 25, 2007 |
| 7274005 |
Bake plate having engageable thermal mass |
Sep. 25, 2007 |
| 7274004 |
Method and apparatus for controlling the spatial temperature distribution across the surface of a workpiece support |
Sep. 25, 2007 |
| 7273819 |
Method and apparatus for processing semiconductor substrates |
Sep. 25, 2007 |
| 7269343 |
Heating configuration for use in thermal processing chambers |
Sep. 11, 2007 |
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