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Class Information
Number: 118/724
Name: Coating apparatus > Gas or vapor deposition > With treating means (e.g., jarring) > By means to heat or cool
Description: Apparatus wherein a means is provided which alters the temperature which means is other than and in addition to any temperature altering means associated with a source of the coating material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5810933 |
Wafer cooling device |
Sep. 22, 1998 |
| 5802856 |
Multizone bake/chill thermal cycling module |
Sep. 8, 1998 |
| 5795396 |
Apparatus for forming crystalline film |
Aug. 18, 1998 |
| 5792304 |
Method of holding substrate and substrate holding system |
Aug. 11, 1998 |
| 5788776 |
Molecular beam epitaxy isolation tube system |
Aug. 4, 1998 |
| 5782980 |
Low pressure chemical vapor deposition apparatus including a process gas heating subsystem |
Jul. 21, 1998 |
| 5779797 |
Wafer boat for vertical diffusion and vapor growth furnace |
Jul. 14, 1998 |
| 5781692 |
Quartz lamp heater assembly for thin film deposition apparatus |
Jul. 14, 1998 |
| 5781693 |
Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween |
Jul. 14, 1998 |
| 5777300 |
Processing furnace for oxidizing objects |
Jul. 7, 1998 |
| 5766364 |
Plasma processing apparatus |
Jun. 16, 1998 |
| 5759263 |
Device and a method for epitaxially growing objects by cvd |
Jun. 2, 1998 |
| 5753046 |
Vertical diffusion furnace and cap therefor |
May. 19, 1998 |
| 5749974 |
Method of chemical vapor deposition and reactor therefor |
May. 12, 1998 |
| 5750207 |
System and method for depositing coating of modulated composition |
May. 12, 1998 |
| 5743967 |
Low pressure CVD apparatus |
Apr. 28, 1998 |
| 5738751 |
Substrate support having improved heat transfer |
Apr. 14, 1998 |
| 5736431 |
Method for producing thin film solar battery |
Apr. 7, 1998 |
| 5735961 |
Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide |
Apr. 7, 1998 |
| 5730803 |
Apparatus and method for transferring heat from a hot electrostatic chuck to an underlying cold body |
Mar. 24, 1998 |
| 5709753 |
Parylene deposition apparatus including a heated and cooled dimer crucible |
Jan. 20, 1998 |
| 5707500 |
Vacuum processing equipment, film coating equipment and deposition method |
Jan. 13, 1998 |
| 5704984 |
Chemical vapor deposition apparatus with a heat radiation structure |
Jan. 6, 1998 |
| 5702531 |
Apparatus for forming a thin film |
Dec. 30, 1997 |
| 5698472 |
Method and a device for oxidation of a semiconductor layer of SIC |
Dec. 16, 1997 |
| 5693173 |
Thermal gas cracking source technology |
Dec. 2, 1997 |
| 5690050 |
Plasma treating apparatus and plasma treating method |
Nov. 25, 1997 |
| 5685363 |
Substrate holding device and manufacturing method therefor |
Nov. 11, 1997 |
| 5685963 |
In situ getter pump system and method |
Nov. 11, 1997 |
| 5683518 |
Rapid thermal processing apparatus for processing semiconductor wafers |
Nov. 4, 1997 |
| 5679165 |
Apparatus for manufacturing semiconductor device |
Oct. 21, 1997 |
| 5679410 |
Continuous fabrication of thin film magnetic recording medium with vacuum deposition |
Oct. 21, 1997 |
| 5673750 |
Vacuum processing method and apparatus |
Oct. 7, 1997 |
| 5665166 |
Plasma processing apparatus |
Sep. 9, 1997 |
| 5660740 |
Treatment apparatus control method |
Aug. 26, 1997 |
| 5658833 |
Method and dummy disc for uniformly depositing silicon nitride |
Aug. 19, 1997 |
| 5653806 |
Showerhead-type discharge assembly for delivery of source reagent vapor to a substrate, and CVD process utilizing same |
Aug. 5, 1997 |
| 5653810 |
Apparatus for forming metal film and process for forming metal film |
Aug. 5, 1997 |
| 5651826 |
Plasma processing apparatus |
Jul. 29, 1997 |
| 5652022 |
Method and apparatus for the production of metal-free areas during metal vapor deposition |
Jul. 29, 1997 |
| 5648006 |
Heater for chemical vapor deposition equipment |
Jul. 15, 1997 |
| 5636320 |
Sealed chamber with heating lamps provided within transparent tubes |
Jun. 3, 1997 |
| 5632820 |
Thermal treatment furnace in a system for manufacturing semiconductors |
May. 27, 1997 |
| 5630880 |
Method and apparatus for a large volume plasma processor that can utilize any feedstock material |
May. 20, 1997 |
| 5624590 |
Semiconductor processing technique, including pyrometric measurement of radiantly heated bodies and an apparatus for practicing this technique |
Apr. 29, 1997 |
| 5620525 |
Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate |
Apr. 15, 1997 |
| 5611898 |
Reaction chamber having in situ oxygen generation |
Mar. 18, 1997 |
| 5609689 |
Vacuum process apparaus |
Mar. 11, 1997 |
| 5603772 |
Furnace equipped with independently controllable heater elements for uniformly heating semiconductor wafers |
Feb. 18, 1997 |
| 5595603 |
Apparatus for the controlled delivery of vaporized chemical precursor to an LPCVD reactor |
Jan. 21, 1997 |
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